Umeå universitet Teknisk-naturvetenskaplig fakultet. Fysik.
1990
Engelska.
Serie: High Pressure Research, 0895-7959 ; Volume 3
Ingår i: High Pressure Research, volumes 3 to 5 : High Pressure Science and Technology: Proceedings of the 12. AIRAPT and 27. EHPRG Conference, University Paderborn 1989. - London : Gordon and Breach. - 2-88124-746-6 ; s. 123-126
The electrical resistance of dense YBa2Cu3Ox and YBa2Cu4Oy produced by hot isostatic pressing has been measured vs. T and p. At 295 K we find d (ln R)/dp ≃ -0.12 and -0.09 GPa-1, respectively, with no systematic dependence on initial density. For 1-2-4, dTC/dp ≃ 5.1 K/GPa, which is ten times that of 1-2-3.