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In situ characteriz...
In situ characterization of the deposition of anatase TiO2 on rutile TiO2(110)
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- Head, Ashley R. (författare)
- Lund University,Lunds universitet,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH,Lawrence Berkeley National Laboratory
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- Johansson, Niclas (författare)
- Lund University,Lunds universitet,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH
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- Niu, Yuran (författare)
- Lund University,Lunds universitet,MAX IV-laboratoriet,MAX IV Laboratory
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- Snezhkova, Olesia (författare)
- Lund University,Lunds universitet,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH
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- Chaudhary, Shilpi (författare)
- Lund University,Lunds universitet,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH
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- Schnadt, Joachim (författare)
- Lund University,Lunds universitet,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH
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- Bluhm, Hendrik (författare)
- Lawrence Berkeley National Laboratory
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- Chen, Chaoyu (författare)
- University of Paris-Saclay
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- Avila, José (författare)
- University of Paris-Saclay
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- Asensio, Maria Carmen (författare)
- University of Paris-Saclay
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(creator_code:org_t)
- American Vacuum Society, 2018
- 2018
- Engelska.
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Ingår i: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. - : American Vacuum Society. - 0734-2101 .- 1520-8559. ; 36:2
- Relaterad länk:
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http://dx.doi.org/10... (free)
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https://avs.scitatio...
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https://lup.lub.lu.s...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- Growing additional TiO2 thin films on TiO2 supstrates in ultrahigh vacuum (UHV)-compatible chambers have many applications for sample preparation, such as smoothing surface morphologies, templating, and covering impurities. However, there has been little study into how to control the morphology of TiO2 films deposited onto TiO2 supstrates, especially using atomic layer deposition (ALD) precursors. Here, the authors show the growth of a TiO2 film on a rutile TiO2(110) surface using titanium tetraisopropoxide (TTIP) and water as the precursors at pressures well below those used in common ALD reactors. X-ray absorption spectroscopy suggests that the relatively low sample temperature (175 °C) results in an anatase film despite the rutile template of the supstrate. Using ambient pressure x-ray photoelectron spectroscopy, the adsorption of TTIP was found to be self-limiting, even at room temperature. No molecular water was found to adsorb on the surface. The deposited thickness suggests that an alternate chemical vapor deposition growth mechanism may be dominating the growth process. This study highlights the possibility that metal oxide film deposition from molecular precursors is an option for sample preparations in common UHV-compatible chambers.
Ämnesord
- NATURVETENSKAP -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Condensed Matter Physics (hsv//eng)
- NATURVETENSKAP -- Kemi -- Materialkemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences -- Materials Chemistry (hsv//eng)
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- Av författaren/redakt...
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Head, Ashley R.
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Johansson, Nicla ...
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Niu, Yuran
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Snezhkova, Olesi ...
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Chaudhary, Shilp ...
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Schnadt, Joachim
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visa fler...
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Bluhm, Hendrik
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Chen, Chaoyu
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Avila, José
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Asensio, Maria C ...
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visa färre...
- Om ämnet
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- NATURVETENSKAP
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NATURVETENSKAP
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och Fysik
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och Den kondenserade ...
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- NATURVETENSKAP
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NATURVETENSKAP
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och Kemi
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och Materialkemi
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Journal of Vacuu ...
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Lunds universitet