| 31. |
- Bergmann, Michael Alexander, 1989, et al.
(författare)
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Electrochemical etching of AlGaN for the realization of thin-film devices
- 2019
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Ingår i: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 115:18, s. 182103-
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Tidskriftsartikel (refereegranskat)abstract
- Heterogeneously integrated AlGaN epitaxial layers will be essential for future optical and electrical devices like thin-film flip-chip ultraviolet (UV) light-emitting diodes, UV vertical-cavity surface-emitting lasers, and high-electron mobility transistors on efficient heat sinks. Such AlGaN-membranes will also enable flexible and micromechanical devices. However, to develop a method to separate the AlGaN-device membranes from the substrate has proven to be challenging, in particular, for high-quality device materials, which require the use of a lattice-matched AlGaN sacrificial layer. We demonstrate an electrochemical etching method by which it is possible to achieve complete lateral etching of an AlGaN sacrificial layer with up to 50% Al-content. The influence of etching voltage and the Al-content of the sacrificial layer on the etching process is investigated. The etched N-polar surface shows the same macroscopic topography as that of the as-grown epitaxial structure, and the root-mean square roughness is 3.5 nm for 1 µm x 1 µm scan areas. Separated device layers have a well-defined thickness and smooth etched surfaces. Transferred multi-quantum-well structures were fabricated and investigated by time-resolved photoluminescence measurements. The quantum wells showed no sign of degradation caused by the thin-film process.
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| 32. |
- Bergmann, Michael Alexander, 1989, et al.
(författare)
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Increased Light Extraction of Thin-Film Flip-Chip UVB LEDs by Surface Texturing
- 2023
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Ingår i: ACS Photonics. - : American Chemical Society (ACS). - 2330-4022. ; 10:2, s. 368-373
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Tidskriftsartikel (refereegranskat)abstract
- Ultraviolet light-emitting diodes (LEDs) suffer from a low wall-plug efficiency, which is to a large extent limited by the poor light extraction efficiency (LEE). A thin-film flip-chip (TFFC) design with a roughened N-polar AlGaN surface can substantially improve this. We here demonstrate an enabling technology to realize TFFC LEDs emitting in the UVB range (280-320 nm), which includes standard LED processing in combination with electrochemical etching to remove the substrate. The integration of the electrochemical etching is achieved by epitaxial sacrificial and etch block layers in combination with encapsulation of the LED. The LEE was enhanced by around 25% when the N-polar AlGaN side of the TFFC LEDs was chemically roughened, reaching an external quantum efficiency of 2.25%. By further optimizing the surface structure, our ray-tracing simulations predict a higher LEE from the TFFC LEDs than flip-chip LEDs and a resulting higher wall-plug efficiency.
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| 33. |
- Bergmann, Michael Alexander, 1989, et al.
(författare)
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Thin-film flip-chip UVB LEDs realized by electrochemical etching
- 2020
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Ingår i: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 116:12, s. 121101-
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Tidskriftsartikel (refereegranskat)abstract
- We demonstrate a thin-film flip-chip (TFFC) light-emitting diode (LED) emitting in the ultraviolet B (UVB) at 311 nm, where substrate removal has been achieved by electrochemical etching of a sacrificial Al0.37Ga0.63N layer. The electroluminescence spectrum of the TFFC LED corresponds well to the as-grown LED structure, showing no sign of degradation of structural and optical properties by electrochemical etching. This is achieved by a proper epitaxial design of the sacrificial layer and the etch stop layers in relation to the LED structure and the electrochemical etch conditions. Enabling a TFFC UV LED is an important step toward improving the light extraction efficiency that limits the power conversion efficiency in AlGaN-based LEDs.
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| 34. |
- Bergmann, Michael Alexander, 1989, et al.
(författare)
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Thin-film flip-chip UVB LEDs realized by electrochemical etching
- 2022
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Konferensbidrag (övrigt vetenskapligt/konstnärligt)abstract
- We will give an overview of different concepts to increase the light extraction efficiency (LEE) of ultraviolet (UV) light-emitting diodes (LEDs) with a focus on thin-film flip-chip (TFFC) devices. Optical simulations show that a TFFC design can greatly improve the LEE with a transparent p-side, reflective contacts, and optimized surface roughening. We will demonstrate UVB-emitting TFFC LEDs based on our fabrication platform for AlGaN thin films with high aluminum content. The fabrication is compatible with a standard LED process and uses substrate removal based on selective electrochemical etching as the key enabling technology.
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| 35. |
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| 36. |
- Bergmann, Michael Alexander, 1989, et al.
(författare)
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Towards ultraviolet and blue microcavity lasers
- 2018
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Ingår i: Northen Optics and Photonics conference. - 9789163964886 ; 2018
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Konferensbidrag (refereegranskat)abstract
- The development of III-nitride-based (Al,Ga,In(N)) microcavity lasers is a challenging task. Significant progress in recent years has resulted in realizations of electrically pumped devices with optical output power in the mW-range and with threshold current densities below 20 kA/cm2. However, to become practical, the lifetime and power conversion efficiency of these devices must be improved. Among the challenges are achieving transverse optical mode confinement, highreflectivity mirrors and control over the resonator length. We will highlight our theoretical work on transverse optical mode confinement, emphasising the overwhelming risk of ending up with an optically anti-guided cavity, and its consequences such as very high optical losses that easily could double the threshold gain for lasing. We will show some anti-guided cavities with reasonable threshold gain and built-in modal discrimination. However, all anti-guided cavities are very sensitive to temperature effects and small structural changes in the cavity caused by fabrication imperfections. We have explored electrically conductive distributed Bragg reflectors (DBRs) in both AlN/GaN and ZnO/GaN. The AlN/GaN DBRs were grown with different strain-compensating interlayers, and the DBR without interlayers had the lowest vertical resistivity with a specific series resistance of 0.044 cmfor eight DBRpairs. In the ZnO/GaN DBR, the measured resistance was dominated by lateral and contact contributions, setting a lower measurable limit of ~10 for three DBR-pairs. Numerical simulations show the importance of having in-plane strained layers in the ZnO/GaN DBR, since that leads to cancellation of the spontaneous and piezoelectric polarization. This results in a dramatically reduced vertical resistance, potentially three orders of magnitude lower than what could be measured. cm An alternative to an epitaxially grown DBR is a dielectric DBR, which offers high reflectivity over a broader wavelength range, relaxing the requirements on resonator length control. To deposit a dielectric DBR on the bottom side of the cavity, the sample must first be bonded to a carrier wafer before the substrate can be removed. We used thermocompression gold-gold bonding to successfully bond the laser structure to a Si carrier wafer. The subsequent substrate removal is a challenging process due to the chemical inertness of the III-nitride-based materials. A doping-dependent electrochemical etch technique was used, which allows for the selective removal of a sacrificial (n-doped) layer between the cavity and the substrate. This resulted in nm-precise cavity lift-off with a low root-mean-square surface roughness down to 0.3 nm. Thus, the process is suitable for the fabrication of high-quality optical devices such as microcavity lasers. In addition, the technique offers a new alternative to create III-nitridebased optical resonators, mechanical resonators, thin film LEDs and transistors.
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| 37. |
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| 38. |
- Cardinali, G., et al.
(författare)
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Low-Threshold AlGaN-based UVB VCSELs enabled by post-growth cavity detuning
- 2022
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Ingår i: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 121:10
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Tidskriftsartikel (refereegranskat)abstract
- The performance of vertical-cavity surface-emitting lasers (VCSELs) is strongly dependent on the spectral detuning between the gain peak and the resonance wavelength. Here, we use angle-resolved photoluminescence spectroscopy to investigate the emission properties of AlGaN-based VCSELs emitting in the ultraviolet-B spectral range with different detuning between the photoluminescence peak of the quantum-wells and the resonance wavelength. Accurate setting of the cavity length, and thereby the resonance wavelength, is accomplished by using doping-selective electrochemical etching of AlGaN sacrificial layers for substrate removal combined with deposition of dielectric spacer layers. By matching the resonance wavelength to the quantum-wells photoluminescence peak, a threshold power density of 0.4 MW/cm2 was achieved, and this was possible only for smooth etched surfaces with a root mean square roughness below 2 nm. These results demonstrate the importance of accurate cavity length control and surface smoothness to achieve low-Threshold AlGaN-based ultraviolet VCSELs.
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| 39. |
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| 40. |
- Chang, Tsu Chi, et al.
(författare)
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Electrically Injected GaN-Based Vertical-Cavity Surface-Emitting Lasers with TiO2 High-Index-Contrast Grating Reflectors
- 2020
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Ingår i: ACS Photonics. - : American Chemical Society (ACS). - 2330-4022. ; 7:4, s. 861-866
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Tidskriftsartikel (refereegranskat)abstract
- We demonstrate the first electrically injected GaN-based vertical-cavity surface-emitting lasers (VCSELs) with a TiO2 high-index-contrast grating (HCG) as the top mirror. Replacing the top distributed Bragg reflector (DBR) with an HCG offers substantial thickness reduction, polarization-pinning, and setting of the resonance wavelength by the grating parameters. Conventional HCGs are usually suspended in the low refractive index material, such as air, in order to create the largest refractive index contrast. However, the mechanical stability of such structures can be questioned and creating free-hanging GaN-membrane on top of GaN is problematic. We have therefore fabricated TiO2-HCGs resting directly on GaN without an air-gap. No DBR layers are used below the HCG to boost the reflectivity. A VCSEL with an aperture diameter of 10 μm shows a threshold current of 25 mA under pulsed operation at room temperature. The lasing modes locate around 400 nm and are transversely electrically -polarized with a line width of 0.5 nm. The full-width half-maximum beam divergence is 10°. This demonstration of a TiO2-HCG VCSEL offers a new route to achieve polarization pinning and could also allow additional benefits such as postgrowth setting of the resonance wavelength.
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