| 1. |
- He, Liang, et al.
(författare)
-
Discrete element simulation of porous asphalt mixture clogging law
- 2023
-
Ingår i: Jiaotong Yunshu Gongcheng Xuebao/Journal of Traffic and Transportation Engineering. - : Chang'an University. - 1671-1637. ; 23:2, s. 78-91
-
Tidskriftsartikel (refereegranskat)abstract
- To reveal the pore clogging law of porous asphalt mixture, the combination study of model experiment and simulation of porous asphalt mixture clogging was conducted. The pore characteristics of the porous asphalt mixture were analyzed based on the CT-scanning and discrete element software PFC3D V5. 0, and the pore data of the porous asphalt mixture were obtained. The aggregates of different particle sizes were put into PFC3D V5. 0, and the compacted virtual specimens were generated according to the pore characteristics. The accuracy of the model was verified by comparing the pore images of actual specimens with the MATLAB slices. In the self-weight condition, the simulation was set with the porous asphalt mixture specimen being intruded by clogging particles with specific gradation composition. The data of indoor experiments were compared and verified. The particle sizes of clogging particles were changed, and the pore decay rates of the specimen were analyzed. The clogging-sensitive particles were identified. In the self-weight condition, the fluid simulation experiment was introduced, and the change law of specimen clogging was analyzed by changing the seepage rate of fluid. Analysis results show that the virtual specimen generated by PFC3D V5. 0 has high accuracy, and the simulation reveals the clogging law of the specimen. The small particles not only accumulate at the throat position causing clogging, but also congregate and interlock with the particles of larger sizes resulting in clogging too. In the self-weight condition, the clogging is mainly concentrated at the upper 30 mm of the mixture specimen, and the size distribution of corresponding clogging-sensitive particles is 0. 150-0. 600 mm. The size distribution of clogging particles has a great impact on the clogging results. In the conditions of gravity and fluid, with the seepage rate increasing from 0. 005 m • s-1 to 0. 030 m • s-1, the changing rate of pore decay rate increases. In addition, the clogging particles remaining in the mixture decrease, accompanied by the reduction of the pore decay rate. Therefore, the local rainfall conditions should also be considered in the design and maintenance of drainage asphalt pavement. 2 tabs, 20 figs, 30 refs. © 2023 Chang'an University. All rights reserved.
|
|
| 2. |
- Hudson, Thomas J., et al.
(författare)
-
International network of cancer genome projects
- 2010
-
Ingår i: Nature. - : Springer Science and Business Media LLC. - 0028-0836 .- 1476-4687. ; 464:7291, s. 993-998
-
Tidskriftsartikel (refereegranskat)abstract
- The International Cancer Genome Consortium (ICGC) was launched to coordinate large-scale cancer genome studies in tumours from 50 different cancer types and/or subtypes that are of clinical and societal importance across the globe. Systematic studies of more than 25,000 cancer genomes at the genomic, epigenomic and transcriptomic levels will reveal the repertoire of oncogenic mutations, uncover traces of the mutagenic influences, define clinically relevant subtypes for prognosis and therapeutic management, and enable the development of new cancer therapies.
|
|
| 3. |
- Jaskorzynska, Bozena, et al.
(författare)
-
Dielectric and Plasmon Slot Waveguides for Photonic Integration
- 2009
-
Ingår i: ICTON 2009: 11th International Conference on Transparent Optical Networks. - NEW YORK : IEEE. ; , s. 653-656
-
Konferensbidrag (refereegranskat)abstract
- Slot waveguides formed either in high-index dielectrics or in metals attract great interest because they provide sub-wavelength confinement in the slot region. While this feature is very attractive for devices relying on stimulated emission or nonlinear effects, it does not necessarily improve the integration density. The spacing between dielectric slot waveguides is still limited by diffraction. Although for metal (plasmon) waveguides the total field can be shrunk far beyond the diffraction limit, the associated increase in propagation loss will set practical limits on both the minimum waveguide width and edge-to-edge separation. Here we compare the packing densities for 3D slot waveguides in silicon and plasmon waveguides in gold with a silicon slot. As a reference we also consider silicon photonic wire. We calculate center-to-center waveguide separations (pitch) versus cross-talk level. We show that at ca 24 dB/mu m cross-talk and requiring the attenuation length of at least 5 mu m, plasmon slot waveguides can be packed ca 3.5 times denser than silicon slot waveguides, and ca 2.5 times denser than photonic wires. We also show examples of the fabricated devices.
|
|
| 4. |
- Kawakita, Satoru, et al.
(författare)
-
Rapid integration of screen-printed electrodes into thermoplastic organ-on-a-chip devices for real-time monitoring of trans-endothelial electrical resistance
- 2023
-
Ingår i: Biomedical microdevices (Print). - : Springer Nature. - 1387-2176 .- 1572-8781. ; 25:4
-
Tidskriftsartikel (refereegranskat)abstract
- Trans-endothelial electrical resistance (TEER) is one of the most widely used indicators to quantify the barrier integrity of endothelial layers. Over the last decade, the integration of TEER sensors into organ-on-a-chip (OOC) platforms has gained increasing interest for its efficient and effective measurement of TEER in OOCs. To date, microfabricated electrodes or direct insertion of wires has been used to integrate TEER sensors into OOCs, with each method having advantages and disadvantages. In this study, we developed a TEER-SPE chip consisting of carbon-based screen-printed electrodes (SPEs) embedded in a poly(methyl methacrylate) (PMMA)-based multi-layered microfluidic device with a porous poly(ethylene terephthalate) membrane in-between. As proof of concept, we demonstrated the successful cultures of hCMEC/D3 cells and the formation of confluent monolayers in the TEER-SPE chip and obtained TEER measurements for 4 days. Additionally, the TEER-SPE chip could detect changes in the barrier integrity due to shear stress or an inflammatory cytokine (i.e., tumor necrosis factor-& alpha;). The novel approach enables a low-cost and facile fabrication of carbon-based SPEs on PMMA substrates and the subsequent assembly of PMMA layers for rapid prototyping. Being cost-effective and cleanroom-free, our method lowers the existing logistical and technical barriers presenting itself as another step forward to the broader adoption of OOCs with TEER measurement capability.
|
|
| 5. |
- Song, Jun, et al.
(författare)
-
Analysis method of the effect of fabrication errors on a planar waveguide demultiplexer
- 2006
-
Ingår i: Optical and quantum electronics. - : Springer Science and Business Media LLC. - 0306-8919 .- 1572-817X. ; 38:15, s. 1203-1216
-
Tidskriftsartikel (refereegranskat)abstract
- The impact of fabrication errors on a planar waveguide demultiplexer is analyzed based on an analytical method. The explicit expression of the transfer function taking into account phase and amplitude errors is presented in order to analyze the loss and crosstalk of the demultiplexer caused by fabrication errors. A basic requirement for the demultiplexer with a certain crosstalk criterion can be easily obtained. Using an etched diffraction grating demultiplexer as an example, it is shown that the analytical results have a good agreement with results from a numerical method.
|
|
| 6. |
- Song, Jun, et al.
(författare)
-
Design and fabrication of compact etched diffraction grating demultiplexers based on alpha-Si nanowire technology
- 2008
-
Ingår i: Electronics Letters. - : Institution of Engineering and Technology (IET). - 0013-5194 .- 1350-911X. ; 44:13, s. 816-818
-
Tidskriftsartikel (refereegranskat)abstract
- alpha-Silicon nanowire waveguides and related techniques are studied. An ultra-compact etched diffraction grating demultiplexer with 10 nm spacing is fabricated and characterised. The dimension of the device is around half a millimetre, which is one to two orders of magnitude smaller than conventional silica based devices.
|
|
| 7. |
- Song, Jun, et al.
(författare)
-
Design and fabrication of compact etched diffraction grating demultiplexers based on α-Si nanowire technology
- 2008
-
Ingår i: 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS. - 9781424419180 ; , s. 148-149
-
Konferensbidrag (refereegranskat)abstract
- Silicon nanowire waveguides and related etched diffraction grating (EDG) demultiplexers are studied by α-Si-on-SiO2 technology. Compact EDG demultiplexers with 10 run spacing for both echelle and total-internal- reflection (TIR) facets have been fabricated and characterized.
|
|
| 8. |
- Song, Jun, et al.
(författare)
-
Echelle grating demultiplexers with reduced return loss by using chirped diffraction order design
- 2006
-
Ingår i: IEEE Photonics Technology Letters. - 1041-1135 .- 1941-0174. ; 18:14, s. 1506-1508
-
Tidskriftsartikel (refereegranskat)abstract
- A design for echelle grating demultiplexers is presented to reduce the return loss. The input waveguide is placed on the minimal intensity position of the diffraction envelope. Then, by further chirping the diffraction order for each facet, we minimize the envelope intensity for other adjacent diffraction orders, which can contribute to a negligible return loss for a large spectral width. The present design is appropriate for multifrequency laser or multistage demultiplexer applications.
|
|
| 9. |
- Song, Jun, et al.
(författare)
-
Effects of surface roughness on the performance of an etched diffraction grating demultiplexer
- 2006
-
Ingår i: Journal of the Optical Society of America A: Optics and Image Science, and Vision. - 1084-7529. ; 23:3, s. 646-650
-
Tidskriftsartikel (refereegranskat)abstract
- The fabrication tolerance of surface roughness on the performance [such as the insertion loss, the polarization-dependent loss (PDL), and the chromatic dispersion] of an etched diffraction grating demultiplexer is analyzed by using an accurate method of moments. The results show that both the insertion loss and the chromatic dispersion rapidly increase as the roughness of the grating facets increases. Appropriate residual roughness of the shaded facets can reduce the PDL of the demultiplexer, and the mechanism for the existence of an optimal residual roughness is explained.
|
|
| 10. |
- Song, Jun, et al.
(författare)
-
Etched diffraction grating demultiplexers with large free-spectral range and large grating facets
- 2006
-
Ingår i: IEEE Photonics Technology Letters. - 1041-1135 .- 1941-0174. ; 18:24, s. 2695-2697
-
Tidskriftsartikel (refereegranskat)abstract
- A design for etched diffraction grating demultiplexers is presented to obtain both large grating facets and a larger free-spectral range (FSR) using the optimal chirped diffraction orders for different facets. The large grating facets by using a large diffraction order contribute to lowering the manufacturing difficulty, and can provide lower polarization-dependent loss. However, usually the large diffraction order must lower the FSR of the device by all means. Based on the present design, the FSR can overlay the whole diffraction envelop for a special order, but avoid the influence of the adjacent diffraction envelops. Calculations indicate that the extinction ratio between the operated order and adjacent orders can attain a 35 dB or so, which makes the crosstalk from channels in adjacent envelops to those in the operated diffraction envelop acceptable.
|
|
