| 1. |
|
|
| 2. |
|
|
| 3. |
|
|
| 4. |
- Darakchieva, Vanya, 1971-, et al.
(författare)
-
Phonon mode behavior in strained wurtzite AlN/GaN superlattices
- 2005
-
Ingår i: Physical Review B. Condensed Matter and Materials Physics. - 1098-0121 .- 1550-235X. ; 71:11, s. 115329-
-
Tidskriftsartikel (refereegranskat)abstract
- We have studied phonons in AlN/GaN superlattices with different periods but a constant well-to-barrier ratio using a combination of infrared spectroscopic ellipsometry and Raman scattering spectroscopy. The strain evolution in the superlattice structures is assessed by high-resolution x-ray diffraction and reciprocal space mapping. We have identified E1(TO), A 1(LO) and E2 localized, and E1(LO) and A 1(TO) delocalized superlattice modes. The dependencies of their frequencies on in-plane strain are analyzed and discussed, and the strain-free frequencies of the superlattice modes are estimated. A good agreement between theory and experiment is found in the case of GaN localized modes, while large deviations between theoretically estimated and experimentally determined frequency shifts are observed for the AlN localized modes. The delocalization effect on the A1(TO) and E1(LO) phonons, as well as the free-carrier effect on the E1(LO) phonon are also discussed. ©2005 The American Physical Society.
|
|
| 5. |
- Darakchieva, Vanya, 1971-, et al.
(författare)
-
Structural characteristics and lattice parameters of hydride vapor phase epitaxial GaN free-standing quasisubstrates
- 2005
-
Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 97:1, s. 013517-
-
Tidskriftsartikel (refereegranskat)abstract
- We have studied the lattice parameters of hydride vapor phase epitaxy (HVPE)-GaN quasisubstrates in relation to their structural properties. Layers grown on single-layer metalorganic vapor phase epitaxy (MOVPE) templates and on epitaxial lateral overgrown MOVPE templates are characterized by Raman scattering, high-resolution x-ray diffraction, and reciprocal space mapping. The strain relaxation in the films versus their thickness was found to proceed similarly in the GaN samples grown using the two types of templates but the strain saturates at different nonzero levels. The lattice parameters of relatively thin HVPE-GaN free-standing quasisubstrates indicate that no total strain relaxation is achieved after the sapphire removal. The lattice parameters of the thick quasisubstrates grown on different templates are not affected by the separation process and are found to have values very close to the reference strain-free lattice parameters of GaN powder. © 2005 American Institute of Physics.
|
|
| 6. |
- Monemar, Bo, 1942-, et al.
(författare)
-
Growth of thick GaN layers by hydride vapor phase epitaxy
- 2005
-
Ingår i: Journal of Ceramic Processing Research. - 1229-9162. ; 6:2, s. 153-162
-
Tidskriftsartikel (refereegranskat)abstract
- In this paper we describe recent experimental work on the growth of thick GaN layers (up to >300 μm) on sapphire with hydride vapour phase epitaxy (HVPE), the removal of the sapphire substrate by the laser liftoff technique, and the properties of these thick GaN layers. Two different growth setups were used, one horizontal and one vertical system. Specific conditions in the growth procedure, like gas flow pattern, growth rate and the use of buffer layers, strongly influence the properties of the grown layers. Important defect problems are cracking (both during and after growth), and the generation of dislocations and surface pits. A large bowing is also observed for thick layers, depending very much on the properties of the initially grown material. For growth of thick layers excessive parasitic growth of GaN upstream of the substrate has to be avoided. Laser liftoff is demonstrated to be a feasible process to remove the sapphire substrate, causing the GaN surface bowing to decrease and revert from convex to concave. The threading dislocation density of 300 μm thick GaN layers is found to be about 107 cm-2, rather independent of the type of buffer layer employed. It reduces further in thicker layers. The pit density varies with growth conditions, it can be reduced if the parasitic growth is avoided. The bowing is a serious problem, since the layers have to be polished to make the surface epi-ready. The XRD rocking curve widths measured seem to correlate with the bowing of the layers, a reduction by about a factor two is often observed when the substrate is removed. Optical characterisation like photoluminescence (PL) and ir spectroscopic ellipsometry (IRSE) is very useful to monitor strain in the layers, as well as impurities and point defects. Residual shallow donors are related to O and Si, shallow acceptors are mainly of intrinsic origin, i.e. complexes with the Ga vacancy.
|
|
| 7. |
|
|
| 8. |
|
|
| 9. |
|
|
