| 1. |
- Alexander-Webber, J. A., et al.
(author)
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Phase Space for the Breakdown of the Quantum Hall Effect in Epitaxial Graphene
- 2013
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In: Physical Review Letters. - : American Physical Society. - 0031-9007 .- 1079-7114. ; 111:9, s. e096601-
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Journal article (peer-reviewed)abstract
- We report the phase space defined by the quantum Hall effect breakdown in polymer gated epitaxial graphene on SiC (SiC/G) as a function of temperature, current, carrier density, and magnetic fields up to 30 T. At 2 K, breakdown currents (Ic) almost 2 orders of magnitude greater than in GaAs devices are observed. The phase boundary of the dissipationless state (ρxx=0) shows a [1-(T/Tc)2] dependence and persists up to Tc>45 K at 29 T. With magnetic field Ic was found to increase ∝B3/2 and Tc∝B2. As the Fermi energy approaches the Dirac point, the ν=2 quantized Hall plateau appears continuously from fields as low as 1 T up to at least 19 T due to a strong magnetic field dependence of the carrier density.
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| 2. |
- Baker, A M R, et al.
(author)
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Energy loss rates of hot Dirac fermions in epitaxial, exfoliated, and CVD graphene
- 2013
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In: Physical Review B. Condensed Matter and Materials Physics. - : American Physical Society. - 1098-0121 .- 1550-235X .- 2469-9950 .- 2469-9969. ; 87:4, s. 045414-
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Journal article (peer-reviewed)abstract
- Energy loss rates for hot carriers in graphene have been measured using graphene produced by epitaxial growth on SiC, exfoliation, and chemical vapor deposition (CVD). It is shown that the temperature dependence of the energy loss rates measured with high-field damped Shubnikov-de Haas oscillations and the temperature dependence of the weak localization peak close to zero field correlate well, with the high-field measurements understating the energy loss rates by similar to 40% compared to the low-field results. The energy loss rates for all graphene samples follow a universal scaling of T-e(4) at low temperatures and depend weakly on carrier density proportional to n(-1/2), evidence for enhancement of the energy loss rate due to disorder in CVD samples.
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| 3. |
- Baker, A M R, et al.
(author)
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Weak localization scattering lengths in epitaxial, and CVD graphene
- 2012
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In: Physical Review B. Condensed Matter and Materials Physics. - : American Physical Society. - 1098-0121 .- 1550-235X .- 2469-9950 .- 2469-9969. ; 86:23, s. 235441-
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Journal article (peer-reviewed)abstract
- Weak localization in graphene is studied as a function of carrier density in the range from 1 x 10(11) cm(-2) to 1.43 x 10(13) cm(-2) using devices produced by epitaxial growth onto SiC and CVD growth on thin metal film. The magnetic field dependent weak localization is found to be well fitted by theory, which is then used to analyze the dependence of the scattering lengths L-phi, L-i, and L-* on carrier density. We find no significant carrier dependence for L-phi, a weak decrease for L-i with increasing carrier density just beyond a large standard error, and a n(-1/4) dependence for L-*. We demonstrate that currents as low as 0.01 nA are required in smaller devices to avoid hot-electron artifacts in measurements of the quantum corrections to conductivity. DOI: 10.1103/PhysRevB.86.235441
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| 4. |
- Beshkova, Milena, et al.
(author)
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Properties of 3C-SiC Grown by Sublimation Epitaxy on Different Type of Substrates
- 2010
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In: Materials Science Forum, Vols. 645-648. - : Transtec Publications; 1999. ; , s. 183-186
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Conference paper (peer-reviewed)abstract
- 3C-SiC layers have been grown by using sublimation epitaxy at a temperature of 2000 degrees C, on different types of on-axis 6H-SiC(0001) substrates. The influence of the type of substrate on the morphology of the layers investigated by Atomic Force Microscopy (AFM) is discussed. Stacking faults are studied by reciprocal space map (RSM) which shows that double positions domains exists.
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| 5. |
- Beshkova, Milena, et al.
(author)
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Properties of AlN layers grown by sublimation epitaxy
- 2003
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In: Materials Science Forum, Vols. 433-436. ; , s. 995-998
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Conference paper (peer-reviewed)abstract
- Epitaxial layers of aluminum nitride (AlN)less than or equal to 80 mum thick have been grown at the temperatures 1900 and 2100 degreesC on 10x10mm(2) 4H-SiC substrates via sublimation recondensation in a RF heated graphite furnace. The source material was polyerystalline sintered AlN. A maximum growth rate of 80 mum/h was achieved at 2100degreesC and seed to source separation of I mm. The surface morphology reflects the hexagonal symmetry of the seed that suggesting an epitaxial growth. All crystals show strong and well defined single crystalline XRD patterns. Only the (002) reflection positioned at around 36.04 was observed in symmetric Theta-2Theta scan. The rocking curves FWHM (full width half maximum) and peak positions arc reported.
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| 6. |
- Beshkova, Milena, et al.
(author)
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Sublimation epitaxy of 3C-SiC grown at Si- and C-rich conditions
- 2012
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In: Vacuum. - : Elsevier. - 0042-207X .- 1879-2715. ; 86:10, s. 1595-1599
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Journal article (peer-reviewed)abstract
- 3C-SiC layers have been grown by using sublimation epitaxy at a source temperature of 2000 degrees C, under vacuum conditions (andlt;10(-5) mbar) on well oriented (on-axis) 6H-SiC (0001) substrates. Close space sublimation growth geometry has been used in a RF-heated furnace employing high-purity graphite crucible with a possibility to change the growth environment from Si vapor-rich to C vapor-rich. The optical microscopy in transmission mode reveals continuous 3C-domains for 3C-SiC with less than 0.4% 6H-inclusions for the layer grown at Si-rich conditions, and separate 3C-SiC domains for the layer grown at C-rich conditions. The type of 6H-inclusions for layers with continuous domain structure investigated by Atomic Force Microscopy (AFM) is discussed. 2Theta-omega scan shows 0006 and 111 peaks coming from the substrate and the layer, respectively with a higher intensity of the 111 peak for 3C-SiC grown at Si-rich conditions which is related with the continuous character of the 3C-SiC domains.
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| 7. |
- Beshkova, Milena, et al.
(author)
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Sublimation epitaxy of AIN layers on 4H-SiC depending on the type of crucible
- 2003
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In: Journal of materials science. Materials in electronics. - 0957-4522 .- 1573-482X. ; 14:10-12, s. 767-768
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Journal article (peer-reviewed)abstract
- Epitaxial layers of aluminum nitride less than or equal to335 mum thick have been grown attemperatures of 1900 and 2100degreesC on 10 x 10 mm(2) (0001)-oriented alpha(4H) silicon carbide (SiC), with growth times of 1 and 4h, via sublimation-recondensation in a RF-heated graphite furnace. The source material was polycrystalline AIN. The sublimation process was performed in three types of graphite (C) crucible: C-1, C-2 with inner diameters of 35 and 51 mm, respectively, and C-3 with the same inner diameter as C-1, but coated with a layer of TaC. The surface morphology reflects the hexagonal symmetry of the substrate, suggesting an epitaxial growth for samples grown in C-1 and C-3 crucibles for all growth conditions. The same symmetry is observed for AIN layers grown in the C-2 crucible, but only at 2100degreesC. X-ray diffraction analyses confirm the epitaxial growth of AIN samples with the expected hexagonal symmetry. A high-resolution X-ray diffractometer was used to assess the quality of the single crystals. A full width at half maximum of 242 arcsec was achieved for an AIN layer grown in the crucible coated with TaC. (C) 2003 Kluwer Academic Publishers.
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| 8. |
- Beshkova, Milena, et al.
(author)
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Sublimation epitaxy of AlN layers grown by different conditions on 4H-SiC substrates
- 2007
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In: Journal of Optoelectronics and Advanced Materials. - 1454-4164 .- 1841-7132. ; 9:1, s. 213-216
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Journal article (peer-reviewed)abstract
- Epitaxial layers of aluminium nitride were grown at temperature 2100 degrees C on 10X10 mm(2) 4H-SiC substrates via a sublimation-recondensation method in an RF heated graphite furnace. The source material was polycrystalline sintered AIN. Growths of AIN layers in vacuum and pure nitrogen at 20 mbar were compared. MA maximum growth rate of 70 mu m/h was achieved in a pure N-2 atmosphere. The surface morphology reveals the hexagonal symmetry of the seeds, suggesting an epitaxial growth. This was confirmed by High-Resolution X-Ray Diffraction. The spectra showed a strong and well defined (0002) reflection positioned at 36.04 degrees in a symmetric theta-2 theta scan for both samples. Micro-Raman spectroscopy revealed that the films had a wurtzite structure. Rutherford Backscattering Spectrometry indicated the quality with a relative chi(min) parameter 0.68.
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| 9. |
- Bikbajevas, V, et al.
(author)
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Impact of phonon drag effect on Seebeck coefficient in p-6H-SiC : Experiment and simulation
- 2003
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In: Materials Science Forum, Vols. 433-436. ; , s. 407-410
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Conference paper (peer-reviewed)abstract
- The temperature dependence of Seebeck coefficient (S) for p-6H-SiC has been obtained. It increases from 2 up to 5.2 mV/K when temperature decreases from 400 down to 240 K. It is shown that phonon drag effect makes critical contribution to the S value. Improved theoretical model involving 4-phonon scattering process has been proposed for the simulation of Seebeck coefficient phonon pail.
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| 10. |
- Boosalis, A., et al.
(author)
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Visible to vacuum ultraviolet dielectric functions of epitaxial graphene on 3C and 4H SiC polytypes determined by spectroscopic ellipsometry
- 2012
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In: Applied Physics Letters. - : American Institute of Physics (AIP). - 0003-6951 .- 1077-3118. ; 101:1
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Journal article (peer-reviewed)abstract
- Spectroscopic ellipsometry measurements in the visible to vacuum-ultraviolet spectra (3.5-9.5 eV) are performed to determine the dielectric function of epitaxial graphene on SiC polytypes, including 4H (C-face and Si-face) and 3C SiC (Si-face). The model dielectric function of graphene is composed of two harmonic oscillators and allows the determination of graphene quality, morphology, and strain. A characteristic van Hove singularity at 4.5 eV is present in the dielectric function of all samples, in agreement with observations on exfoliated as well as chemical vapor deposited graphene in the visible range. Model dielectric function analysis suggests that none of our graphene layers experience a significant degree of strain. Graphene grown on the Si-face of 4H SiC exhibits a dielectric function most similar to theoretical predictions for graphene. The carbon buffer layer common for graphene on Si-faces is found to increase polarizability of graphene in the investigated spectrum.
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