| 1. |
- Pfeiffer, K, et al.
(författare)
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Polymer stamps for nanoimprinting
- 2002
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Ingår i: Microelectronic Engineering. - 1873-5568. ; 61-2, s. 393-398
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Tidskriftsartikel (refereegranskat)abstract
- Stamp fabrication for nanoimprinting can be significantly simplified, when specialized crosslinking polymers are applied to pattern definition. The polymer patterns can be used as stamps themselves. Two possibilities are reported: (1) An e-beam sensitive resist was developed, which enables the fabrication of polymer-on-silicon stamps. Patterns with a feature size of 70 nm could be created. (2) Full plastic stamps were obtained by a casting-moulding technique, which enable pattern transfer from any conventional mould. The quality of the two stamp variants were proved by imprinting experiments. (C) 2002 Elsevier Science B.V. All rights reserved.
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| 2. |
- Koitzsch, A., et al.
(författare)
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Core-hole screening response in two-dimensional cuprates : A high-resolution x-ray photoemission study
- 2002
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Ingår i: Physical Review B Condensed Matter. - : American Physical Society. - 0163-1829 .- 1095-3795. ; 66:2
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Tidskriftsartikel (refereegranskat)abstract
- We have studied the core level photoemission spectra of the two-dimensional cuprates Sr2CuO2Cl2, Sr2CuO2Br2, Ca2CuO2Cl2, Bi2Sr2CaCu2O8+δ, and Nd2CuO4, with particular focus on the screening response to core-hole creation in the Cu−2p3/2 level. The influence of the apex positions on the shape of the so-called main line is investigated, and found to be weak. Additionally, an Anderson impurity model was used to fit the shape of the main lines, obtaining good agreement with the data from Nd2CuO4. For the other compounds, while the energy spread of the two screening channels (local and nonlocal) is well reproduced, the theory underestimates the width of the nonlocally screened feature. The shapes of the main lines are discussed in detail.
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| 3. |
- Pfeiffer, K, et al.
(författare)
-
A comparison of thermally and photochemically cross-linked polymers for nanoimprinting
- 2003
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Ingår i: Microelectronic Engineering. - 1873-5568. ; 67-8, s. 266-273
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Tidskriftsartikel (refereegranskat)abstract
- The characteristics and benefits of two types of cross-linking prepolymers with low glass transition temperature (T-g) for nanoimprinting are reported. They are soluble in organic solvents and their solutions can be processed like those of common thermoplastics. The imprinted patterns receive high thermal and mechanical stability through cross-linking polymerization. The course of the polymerization was investigated to determine the appropriate conditions for the imprint process. In thermally cross-linked polymers mr-I 9000, the cross-linking occurs during imprinting. Process time and temperature depend on the polymerization rate. Volume shrinkage during the polymerization does not adversely affect imprinting. Photochemically cross-linked polymers mr-L 6000 make possible imprint temperatures below 100 T and short imprint times. The T-g of the prepolymer determines the imprint temperature. The cross-linking reaction and structural stabilization is performed after imprinting. 50-nm trenches and sub-50-nm dots confirm the successful application of the polymers.
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