| 1. |
- Hu, W., et al.
(författare)
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Electron transport in self-assembled polymer molecular junctions
- 2006
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Ingår i: Physical Review Letters. - 0031-9007 .- 1079-7114. ; 96:2, s. 027801-
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Tidskriftsartikel (refereegranskat)abstract
- A molecular junction of a poly(p-phenyleneethynylene)s derivative with thioacetate end groups (TA-PPE) was fabricated by self-assembling. Nanogap electrodes made by electroplating technique was used to couple thiol end groups of TA-PPE molecules. Room temperature current-voltage characteristics of the molecular junction exhibited highly periodic, repeatable, and identical stepwise features. First-principles calculations suggest that one possibility for the equidistant step is due to the opening of different conducting channels that corresponds to the unoccupied molecular orbitals of the polymer in the junction. It is interesting to see that an 18 nm long polymer is of quantized electronic structures and behaves like a quantum transport device.
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| 2. |
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| 3. |
- Thinh, N.Q., et al.
(författare)
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Properties of Ga-interstitial defects in AlxGa 1-xNyP1-y
- 2005
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Ingår i: Physical Review B. Condensed Matter and Materials Physics. - 1098-0121 .- 1550-235X. ; 71:12
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Tidskriftsartikel (refereegranskat)abstract
- A detailed account of the experimental results from optically detected magnetic resonance (ODMR) studies of grown-in defects in (Al)GaNP alloys, prepared by molecular beam epitaxy, is presented. The experimental procedure and an in-depth analysis by a spin Hamiltonian lead to the identification of two Gai defects (Gai-A and Gai-B). New information on the electronic properties of these defects and the recombination processes leading to the observation of the ODMR signals will be provided. These defects are deep-level defects. In conditions when the defect is directly involved in radiative recombination of the near-infrared photoluminescence band, the energy level of the Gai-B defect was estimated to be deeper than ~1.2 eV from either the conduction or valence band edge. In most cases, however, these defects act as nonradiative recombination centers, reducing the efficiency of light emission from the alloys. They can thus undermine the performance of potential photonic devices. High thermal stability is observed for these defects. ©2005 The American Physical Society.
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| 4. |
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| 5. |
- Dagnelund, Daniel, 1980-, et al.
(författare)
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Effect of growth conditions on grown-in defect formation and luminescence efficiency in GaInNP epilayers grown by molecular-beam epitaxy.
- 2008
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Ingår i: Physica status solidi (c)Special Issue: E-MRS 2007 Spring Meeting – Symposium F and Conference on Photonic Materials. - Weinheim : Wiley-VCH Verlagsgesellschaft. ; , s. 460-463
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Konferensbidrag (refereegranskat)abstract
- A detailed study of the impact of different growth conditions (i.e. ion bombardment, nitrogen flow and In content) on the defect formation in Ga(In)NP epilayers grown on GaP substrates by solid-source molecular beam epitaxy is performed. Reduced nitrogen ion bombardment during the growth is shown to significantly reduce formation of defects acting as competing recombination centers, such as a Ga interstitial defect and other unidentified defects revealed by optically detected magnetic resonance. Further, high nitrogen flow is found to be even more effective than the ion bombardment in introducing the defects. The incorporation of In by 5.1% is, on the other hand, found not to affect the introduction of defects. The results provide a useful insight into the formation mechanism of the defects that will hopefully shed light on a control of the defect introduction in the alloys by optimizing growth conditions.
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| 6. |
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| 7. |
- Dagnelund, Daniel, 1980-, et al.
(författare)
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Effect of nitrogen ion bombardment on defect formation and luminescence efficiency of GaNP epilayers grown by molecular-beam epitaxy
- 2006
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Ingår i: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 88:10, s. 101904-
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Tidskriftsartikel (refereegranskat)abstract
- Radiative efficiency of GaNP epilayers grown on GaP substrates by solid-source molecular beam epitaxy is significantly improved by reduced nitrogen ion bombardment during the growth. Based on the results of temperature-dependent photoluminescence (PL) and optically detected magnetic resonance studies (ODMR), the observed improvements are attributed to reduced formation of defects, such as a Ga interstitial related defect and an unidentified defect revealed by ODMR. We demonstrate that these defects act as competing recombination centers, which promote thermal quenching of the PL intensity and result in a substantial (34×) decrease in room-temperature PL intensity. © 2006 American Institute of Physics.
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| 8. |
- Dagnelund, Daniel, 1980-, et al.
(författare)
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Formation of grown-in defects in molecular beam epitaxial Ga(In)NP : effects of growth conditions and post-growth treatments
- 2008
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Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 103, s. 063519-
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Tidskriftsartikel (refereegranskat)abstract
- Effects of growth conditions and post-growth treatments, such as presence of N ions, N2 flow, growth temperature, In alloying, and postgrowth rapid thermal annealing (RTA), on formation of grown-in defects in Ga(In)NP prepared by molecular beam epitaxy are studied in detail by the optically detected magnetic resonance (ODMR) technique. Several common residual defects, such as two Ga-interstitial defects (i.e., Gai-A and Gai-B) and two unidentified defects with a g factor around 2 (denoted by S1 and S2), are closely monitored. Bombardment of impinging N ions on grown sample surface is found to facilitate formation of these defects. Higher N2 flow is shown to have an even more profound effect than a higher number of ions in introducing these defects. Incorporation of a small amount of In (e.g., 5.1%) in GaNP seems to play a minor role in the formation of the defects. In GaInNP with 45% of In; however, the defects were found to be abundant. Effect of RTA on the defects is found to depend on initial configurations of Gai-related defects formed during the growth. In the alloys where the Gai-A and Gai-B defects are absent in the as-grown samples (i.e., GaNP grown at a low temperature of 460 °C), the concentrations of the two Gai defects are found to increase after postgrowth RTA. This indicates that the defects originally introduced in the as-grown alloys have been transformed into the more thermally stable Gai-A and Gai-B during RTA. On the other hand, when the Gai-A and Gai-B are readily abundant (e.g., at higher growth temperatures (>=500 °C), RTA leads to a slight reduction of the Gai-A and Gai-B ODMR signals. The S2 defect is also shown to be thermally stable upon the RTA treatment.
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| 9. |
- Dagnelund, Daniel, 1980-, et al.
(författare)
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Spin resonance spectroscopy of grown-in defects in Ga(In)NP alloys
- 2008
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Ingår i: 7th International Conference on Physics of Light-Matter Coupling in Nanostructures, 2007. - : Elsevier Ltd.. ; , s. 620-625
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Konferensbidrag (refereegranskat)abstract
- We employ the optically detected magnetic resonance (ODMR) technique to study and identify important grown-in defects in Ga(In)NP grown by molecular-beam epitaxy (MBE). Several types of defects were revealed from ODMR studies. The dominant defects were found to be related to Ga interstitials, evident form their characteristic hyperfine interaction arising from the spin interaction between the electron and the Ga nucleus. Some other as yet unidentified intrinsic defects were also found to be commonly present in the alloys. The effects of growth conditions (ion bombardment, N2 gas flow, etc.) and post-growth rapid thermal annealing on the formation of these defects were studied in detail, shedding light on the formation mechanism of defects.
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| 10. |
- Izadifard, Morteza, 1965-, et al.
(författare)
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Effects of rapid thermal annealing on optical properties of GaNxP1−x alloys grown by solid source molecular beam epitaxy
- 2005
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Ingår i: Semiconductor Science and Technology. - : IOP Publishing. - 0268-1242 .- 1361-6641. ; 20:5, s. 353-356
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Tidskriftsartikel (refereegranskat)abstract
- Temperature-dependent photoluminescence (PL), PL excitation and time-resolved PL measurements were employed to study the effects of rapid thermal annealing (RTA) on optical properties of GaNxP1−x alloys grown by solid source molecular beam epitaxy. A substantial increase in radiative efficiency of GaNP epilayers, which is especially pronounced for the high-energy PL component, was achieved after RTA and is attributed to annealing out of competing non-radiative centres. The latter is evident from reduced quenching of the PL intensity with increasing measurement temperature, which results in a strong increase (up to 18 times) in the PL intensity at room temperature (RT), as well as from a substantial increase in carrier lifetime at RT deduced from time-resolved PL measurements.
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