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Sökning: WFRF:(Heikkila P)

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51.
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52.
  • Madsen, I. E. H., et al. (författare)
  • Job strain as a risk factor for clinical depression systematic review and meta-analysis with additional individual participant data
  • 2017
  • Ingår i: Psychological Medicine. - 0033-2917 .- 1469-8978. ; 47:8, s. 1342-1356
  • Forskningsöversikt (refereegranskat)abstract
    • <p>Adverse psychosocial working environments characterized by job strain (the combination of high demands and low control at work) are associated with an increased risk of depressive symptoms among employees, but evidence on clinically diagnosed depression is scarce. We examined job strain as a risk factor for clinical depression.</p><p>We identified published cohort studies from a systematic literature search in PubMed and PsycNET and obtained 14 cohort studies with unpublished individual-level data from the Individual-Participant-Data Meta-analysis in Working Populations (IPD-Work) Consortium. Summary estimates of the association were obtained using random-effects models. Individual-level data analyses were based on a pre-published study protocol.</p><p>We included six published studies with a total of 27 461 individuals and 914 incident cases of clinical depression. From unpublished datasets we included 120 221 individuals and 982 first episodes of hospital-treated clinical depression. Job strain was associated with an increased risk of clinical depression in both published [relative risk (RR) = 1.77, 95% confidence interval (CI) 1.47–2.13] and unpublished datasets (RR = 1.27, 95% CI 1.04–1.55). Further individual participant analyses showed a similar association across sociodemographic subgroups and after excluding individuals with baseline somatic disease. The association was unchanged when excluding individuals with baseline depressive symptoms (RR = 1.25, 95% CI 0.94–1.65), but attenuated on adjustment for a continuous depressive symptoms score (RR = 1.03, 95% CI 0.81–1.32).</p><p>Job strain may precipitate clinical depression among employees. Future intervention studies should test whether job strain is a modifiable risk factor for depression.</p>
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53.
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54.
  • Saharil, Farizah, et al. (författare)
  • LOW-TEMPERATURE CMOS-COMPATIBLE 3D-INTEGRATION OF MONOCRYSTALLINE-SILICON BASED PZT RF MEMS SWITCH ACTUATORS ON RF SUBSTRATES
  • 2010
  • Ingår i: MEMS 2010 : 23RD IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST. - New York : Ieee. - 978-1-4244-5764-9 ; s. 47-50
  • Konferensbidrag (refereegranskat)abstract
    • <p>This paper presents a low temperature (200 degrees C) CMOS-compatible fabrication process for integrating high-temperature deposited lead zirconate titanate (PZT) on this film monocrystalline-silicon piezoelectric actuators, onto an RF substrate, and successful demonstration of this process for fabrication of metal-contact RF-MEMS switches. The patterned PZT/silicon multi-layer stack is transfer-bonded from a silicon-on-insulator (SOI) donor wafter to AF-45 glass RF substrate using adhesive wafer transfer bonding. Furthermore, several strategies have been investigate to drastically reduce the post bonding misalignment created by the shear forces between the bonding chucks during wafer bonding.</p>
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