| 91. |
- Claesson, Hans, et al.
(författare)
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Rheological behaviour during UV-curing of a star-branched polyester
- 2002
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Ingår i: Progress in organic coatings. - 0300-9440 .- 1873-331X. ; 44:1, s. 63-67
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Tidskriftsartikel (refereegranskat)abstract
- Using a rheometer coupled with an UV-light generator, the viscoelastic behaviour during the fast cure of star-branched polyester is investigated. The 32 arm star polymers consist of a hyperbranched polyester core, Boltorn(TM) and linear grafts of poly(E-caprolactone) (degree of polymerisation: 20-52) with methacrylate end groups. The resins are crystalline and the melting points range from 34 to 50degreesC; films can be formed and cured below 80degreesC. The crossover of G' and G was used as the gel point. The time to reach the gel point, a few seconds, increases linearly with molecular weight.
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| 92. |
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| 93. |
- de Groot, J., et al.
(författare)
-
Capillary nozzles for liquid-jet laser-plasma x-ray sources
- 2003
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Ingår i: Review of Scientific Instruments. - : AIP Publishing. - 0034-6748 .- 1089-7623. ; 74:8, s. 3881-3882
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Tidskriftsartikel (refereegranskat)abstract
- We describe a method to fabricate tapered glass nozzles suitable for liquid-jet-target generation in laser-plasma soft x-ray and extreme ultraviolet sources. In the method, a tapered nozzle is formed as an integral part of a flexible capillary glass tubing. The method makes use of inert materials, extending the possible choice of target liquids compared to current nozzles. It also provides flexibility as regards nozzle diameter and pressure, thereby allowing optimization of the target size and extending the range of applicability for the liquid-jet-target laser plasmas.
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| 94. |
- de Groot, J., et al.
(författare)
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Improved liquid-jet laser-plasma source for X-ray microscopy
- 2003
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Ingår i: Journal de Physique IV. - : EDP Sciences. - 1155-4339 .- 1764-7177. ; 104, s. 121-122
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Tidskriftsartikel (refereegranskat)abstract
- We increase the x-ray flux from a liquid-jet laser-plasma x-ray source by optimizing the target geometry. A new nozzle fabrication method allows us to produce stable microscopic liquid jets with a wide range of diameters. The improved x-ray flux is demonstrated by optimizing the diameter of an ethanol liquid-jet for our 3 ns, square=532 nm Nd:YAG laser and measuring the flux at the square=3.37 rim C VI emission line. Preliminary data suggest that the x-ray flux can be increased by more than a factor of 4 compared to previous experiments. The goal is to significantly reduce the exposure time of our laser-plasma-based compact x-ray microscope by improving the source.
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| 95. |
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| 96. |
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| 97. |
- Eriksson, Fredrik, et al.
(författare)
-
Enhanced soft x-ray reflectivity of Cr/Sc multilayers by ion-assisted sputter deposition
- 2002
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Ingår i: Optical Engineering. - : SPIE-Intl Soc Optical Eng. - 0091-3286 .- 1560-2303. ; 41:11, s. 2903-2909
-
Tidskriftsartikel (refereegranskat)abstract
- Cr/Sc multilayers have been grown on Si substrates using dc magnetron sputtering. The multilayers are intended as condenser mirrors in a soft x-ray microscope operating at the wavelength 3.374 nm. They were designed for normal reflection of the first and second orders, with multilayer periods of 1.692 and 3.381 nm, and layer thickness ratios of 0,471 and 0.237, respectively. At-wavelength soft-x-ray reflectivity measurements were carried out using a reflectometer with a compact soft-x-ray laser-plasma source. The multilayers were irradiated during growth with Ar ions, varying both in energy (9 to 113 eV) and flux, in order to stimulate the adatom mobility and improve the interface flatness. It was found that to obtain a maximum soft x-ray reflectivity with a low flux (Cr=0.76, Sc=2.5) of Ar ions a rather high energy of 53 eV was required, Such energy also caused intermixing of the layers. By the use of a solenoid surrounding the substrate, the arriving ion-to-metal flux ratio could be increased 10 times and the required ion energy could be decreased. A high flux (Cr=7.1, Sc=23.1) of low-energy (9 eV) Ar ions yielded the most favorable growth condition, limiting the intermixing with a subsistent good surface flatness.
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| 98. |
- Eriksson, Fredrik, et al.
(författare)
-
Enhanced soft x-ray reflectivity of Cr/Sc multilayers by ion assisted sputter deposition
- 2001
-
Ingår i: Proceedings of SPIE, the International Society for Optical Engineering. - : SPIE. - 0277-786X .- 1996-756X. ; 4506, s. 84-92
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Konferensbidrag (övrigt vetenskapligt/konstnärligt)abstract
- Cr/Sc multilayers have been grown on Si substrates using DC magnetron sputtering. The multilayers are intended as condenser mirrors in a soft x-ray microscope operating at the wavelength 3.374 nm. They were designed for normal reflection of the first and second order with multilayer periods of 1.692 nm and 3.381 nm, and layer thickness ratios of 0.471 and 0.237, respectively. At-wavelength soft x-ray reflectivity measurements were carried out using a reflectometer with a compact soft x-ray laser-plasma source. The multilayers were irradiated during growth with Ar ions, varying both in energy (9-113 eV) and flux, in order to stimulate the ad-atom mobility and improve the interface flatness. It was found that to obtain a maximum soft x-ray reflectivity with a low flux (Cr=0.76, Sc=2.5) of Ar ions a rather high energy of 53 eV was required. Such energy also caused intermixing of the layers. By the use of a solenoid surrounding the substrate, the arriving ion-to-metal flux ratio could be increased 10 times and the ion energy could be decreased. A high flux (Cr=7.1, Sc=23.1) of low energy (9 eV) Ar ions founded the most favourable growth condition in order to limit the intermixing with a subsistent surface flatness.
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| 99. |
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| 100. |
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