| 21. |
- Carlberg, Patrick, et al.
(författare)
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Lift-off process for nanoimprint lithography
- 2003
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Ingår i: Microelectronic Engineering. - 0167-9317 .- 1873-5568. ; 67-8, s. 203-207
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Konferensbidrag (refereegranskat)abstract
- We report a novel a lift-off method for nanoimprint lithography. This is a bi-layer method, using a polymethyl methacrylate (PMMA) on lift-off layer (LOL) resist scheme. For the imprint step, direct evidence for good pattern transfer down to 20 nm is shown. Oxygen plasma ashing is required to remove residual PMMA. A liquid solvent, MF 319, is used to transfer the pattern down to the silicon. The LOL is dissolved isotropically while the PMMA is unaffected. Ashing time can kept to a minimum through the wet etch method. This reduces the line widening effect. After metal evaporation a two-step lift-off process prevents metal flakes from adhering to the surface electrostatically. At first warm acetone breakes apart the metal layer and dissolves the PMMA, then warm Remover S-1165 removes the LOL and remaining metal. Structures of lines down to 50 nm and dots with a diameter of sub 20 nm are presented.
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| 22. |
- Carlberg, Patrick, et al.
(författare)
-
Nanoimprint - a tool for realizing nano-bio research
- 2004
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Ingår i: 2004 4th IEEE Conference on Nanotechnology. - 0780385365 ; , s. 199-200
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Konferensbidrag (refereegranskat)abstract
- In this paper, we present a status report on how implementation of nanoimprint lithography has advanced our research. Contact guidance nerve growth experiments have so far primarily been done on micrometer-structured surfaces. We have made a stamp with 17 areas of different, submicron, line width and spacing covering a total 2.6 mm
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| 23. |
- Carlberg, Patrick, et al.
(författare)
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Nanoimprint in mr-L 6000.1 XP/PMMA resist system
- 2002
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Ingår i: 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science.
-
Konferensbidrag (refereegranskat)abstract
- Use of the new resist system mr-L 6000.1 XP in combination with PMMA is demonstrated to give sub-100 nm resolution in nanoimprint lithography. Low glass transition temperature in combination with high plasma stability makes this resist suitable for achieving desirable resist profiles after the imprint process. Imprint conditions for mr-L 6000.1 XP/PMMA resist system as well as imprint results are described and discussed
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| 24. |
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| 25. |
- Cholewa, Marian, et al.
(författare)
-
Investigating the Secondary Electron Emission of Nanomaterials Induced by a High-Resolution Proton Beam
- 2022
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Ingår i: Physica Status Solidi (B). - : Wiley. - 0370-1972 .- 1521-3951.
-
Tidskriftsartikel (refereegranskat)abstract
- Herein, the secondary electron emission (SEE) from 1D nanomaterials in the form of nanorods is investigated. The small beam of a 1.5 MeV +H2 hydrogen with a sub 70 nm in diameter allows studying the SEE with a very high resolution. A wide range of nanomaterials from various laboratories are studied, including thin ZnO and ZnO/GaN nanostructures grown on 1 μm thick Si3N4 membranes and thick InP, GaN and GaN/AlN nanorod structures grown on bulk Si substrates. By virtue of the small size of the exciting nanobeams, high-resolution maps could be created presenting an SEE yield from various parts of the structures. This allows us to show that the top parts of nanorods in ZnO, ZnO/GaN, GaN, InP, and GaN/AlN nanostructures emit secondary electrons much more efficiently than the valley areas between nanorods. These results indicate that by a proper design and growth of 1D nanostructures, SEE properties could be improved over those of the traditionally used Au and CsI thin films. This work has been undertaken to find materials with the highest achievable SEE emission, which is a figure of merit for the detection efficiency relevant for the development and application of novel radiation detectors.
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| 26. |
- Finder, C, et al.
(författare)
-
Fluorescence microscopy for quality control in nanoimprint lithography
- 2003
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Ingår i: Microelectronic Engineering (Proceedings of the 28th International Conference on Micro- and Nano-Engineering). - 0167-9317 .- 1873-5568. ; 67-8, s. 623-628
-
Konferensbidrag (refereegranskat)abstract
- Fluorescence microscopy is introduced as a low cost quality control process for nanoimprint lithography. To depict imprinted structures down to 1 mum lateral size and to detect residues down to 100 nm lateral size, the standard printable polymer mr-18000 is labelled with less than 0.1 wt.% fluorescent dye. Three different types of stamps are used to determine the dependence of the shape and size of stamp features in a series of imprints. The quality of a stamp is given by the sticking polymer residues per unit area. Fluorescence light images as well as visible light images are analysed. Changes in the area of the stamp covered with polymer as a function of the number of imprints is summarised in a statistical process chart. Adhesion was artificially induced in order to observe self cleaning of virgin stamps. They were detected and monitored, suggesting that this method is a suitable technique for quality control and that it could be easily adapted to the nanoimprint process. (C) 2003 Elsevier Science B.V. All rights reserved.
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| 27. |
- Frimmer, Martin, et al.
(författare)
-
Transport properties of three-terminal ballistic junctions realized by focused ion beam enhanced etching in InGaAs/InP
- 2008
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Ingår i: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 93:13
-
Tidskriftsartikel (refereegranskat)abstract
- Three-terminal junction devices are realized in an InGaAs/InP quantum well by focused ion beam (FIB) implantation and selective wet etching. Room temperature electrical measurements show that the fabricated devices exhibit strong nonlinear electrical properties. The results are discussed in terms of ballistic electron transport. It is demonstrated that FIB-enhanced etching processing can be exploited as a maskless, resist-free technique for fabrication of high-quality and functional nanoelectronic devices. (C) 2008 American Institute of Physics.
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| 28. |
- Gómez, Víctor J., et al.
(författare)
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Wafer-scale nanofabrication of sub-100 nm arrays by deep-UV displacement Talbot lithography
- 2020
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Ingår i: Nanotechnology. - : IOP Publishing. - 0957-4484 .- 1361-6528. ; 31:29
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Tidskriftsartikel (refereegranskat)abstract
- In this manuscript, we demonstrate the potential of replacing the standard bottom anti-reflective coating (BARC) with a polymethylglutarimide (PMGI) layer for wafer-scale nanofabrication by means of deep-UV displacement talbot lithography (DTL). PMGI is functioning as a developable non-UV sensitive bottom anti-reflective coating (DBARC). After introducing the fabrication process using a standard BARC-based coating and the novel PMGI-based one, the DTL nanopatterning capabilities for both coatings are compared by means of the fabrication of etched nanoholes in a dielectric layer and metal nanodots made by lift-off. Improvement of DTL capabilities are attributed to a reduction of process complexity by avoiding the use of O2 plasma etching of the BARC layer. We show the capacity of this approach to produce nanoholes or nanodots with diameters ranging from 95 to 200 nm at a wafer-scale using only one mask and a proper exposing dose. The minimum diameter of the nanoholes is reduced from 118 to 95 nm when using the PMGI-based coating instead of the BARC-based one. The possibilities opened by the PMGI-based coating are illustrated by the successful fabrication of an array of nanoholes with sub-100 nm diameter for GaAs nanowire growth on a 2″ GaAs wafer, a 2″ nanoimprint lithography (NIL) master stamp, and an array of Au nanodots made by lift-off on a 4″ silica wafer. Therefore, DTL possess the potential for wafer-scale manufacturing of nano-engineered materials.
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| 29. |
- Graczyk, Mariusz, et al.
(författare)
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Fabrication of bottle-shaped nanochannels in fused silica using a self-closing effect
- 2012
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Ingår i: Microelectronic Engineering. - : Elsevier BV. - 1873-5568 .- 0167-9317. ; 97, s. 173-176
-
Tidskriftsartikel (refereegranskat)abstract
- The spatial control of molecular motor function, using nanostructured surfaces, is of great interest for the development of commercial devices for diagnostics and high-throughput drug screening with molecular motors as targets. In the present study we have fabricated 100-300 nm wide nanochannels, completely subsurfaced on fused silica chips, with the aim to interface them with a microfluidic system. Such a system will allow for changes in the chemical environment surrounding molecular motors, with minimal influence on their directional motion. This will be achieved by changing the chemical environment in a perpendicular direction to the motor motion and allowing the chemical substances to diffuse in and out of the nanochannels via a small slit (5-10 nm) on the top of the nanochannels. To create this slit, and to control its width, we here demonstrate the use of a self-closing effect based on the volume increase (2.27 times) during oxidation of silicon. The details of the fabrication steps (EBL, RIE and oxidation) are discussed. (C) 2012 Elsevier B.V. All rights reserved.
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| 30. |
- Graczyk, Mariusz, et al.
(författare)
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Nanoimprint stamps with ultra-high resolution : Optimal fabrication techniques
- 2018
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Ingår i: Microelectronic Engineering. - : Elsevier BV. - 0167-9317. ; 190, s. 73-78
-
Tidskriftsartikel (refereegranskat)abstract
- Single-digit nanometer patterning by nanoimprint lithography is a challenging task, which requires optimum stamp fabrication technique. In the current work, we present different strategies for technology of hard master stamps to make intermediate working stamps with sub-10 nm features. Methods of both negative and positive master stamps fabrication, based on EBL, RIE and ALD are described and compared. A single-step copying of negative master stamps using a polymer material is a preferred strategy to reach the ultra high-resolution. Lines as small as 5.6 nm are demonstrated in a resist using a combined thermal and UV-imprint with OrmoStamp material as a working stamp.
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