| 591. |
- Lauridsen, Jonas, et al.
(författare)
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Deposition of Ti-Si-C-Ag nanocomposite coatings as electrical contact material
- 2010
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Ingår i: Proceedings of the 56th IEEE Holm Conference on Electrical Contacts (HOLM). - : IEEE. - 9781424481743 ; , s. 288-294
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Konferensbidrag (övrigt vetenskapligt/konstnärligt)abstract
- This paper is a brief review of our recent work and a follow up study on nanocomposite coatings comprising nanocrystalline TiC embedded in an amorphous SiC matrix (nc-TiC/a-SiC) with and without Ag additions applied as electrical contacts. These coating materials are deposited at very high deposition rates (>10 μm/h), to meet industrial demands of high productivity. Here we consider Ti-Si-C-Ag nanocomposite coatings with Ag content in the range of 0-22 at.% deposited in a pilot-plant or an industrial deposition system by dc magnetron sputtering from compound targets onto Si(100) and SiO2(100) substrates. The microstructure, electrical, and mechanical properties of the coatings were studied with transmission electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy, electrical contact resistance, resistivity, and nanoindentation measurements. Varying the deposition parameters bias and pressure within ranges typical of coating processing had no effect on the structure. A variation was, however, observed for the contact resistance, that was determined to be in the range 400-900 mΩ at a contact force between 1.9-2.65 N. The coatings with highest Ag content had the lowest contactresistance.
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| 592. |
- Lauridsen, Jonas, et al.
(författare)
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Microstructural and Chemical Analysis of AgI Coatings Used as a Solid Lubricant in Electrical Sliding Contacts
- 2012
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Ingår i: Tribology letters. - : Springer Verlag (Germany). - 1023-8883 .- 1573-2711. ; 46:2, s. 187-193
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Tidskriftsartikel (refereegranskat)abstract
- AgI coatings have been deposited by electroplating on Ag-plated Cu coupons. Electron microscopy shows that the coatings consist of weakly agglomerated AgI grains. X-ray diffraction, differential scanning calorimetry, thermogravimetry, and mass spectrometry show that the AgI exhibits a reversible transformation from hexagonal to cubic phase at 150 A degrees C. AgI starts to decompose at 150 A degrees C with an accelerating rate up to the AgI melting temperature (555 A degrees C), where a complex-bonded hydroxide evaporates. Ag pin-on-disk testing shows that the iodine addition to Ag decreases the friction coefficient from 1.2 to similar to 0.4. The contact resistance between AgI and Ag becomes less than 100 mu I (c) after similar to 500 operations as the AgI deagglomerates, and Ag is exposed on the surface and remains low during at least 10,000 reciprocating operations. This makes AgI suitable as a solid lubricant in electrical contacts.
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| 593. |
- Lauridsen, Jonas, et al.
(författare)
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Ti-B-C nanocomposite coatings deposited by magnetron sputtering
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Annan publikation (övrigt vetenskapligt/konstnärligt)abstract
- Ti-B-C nanocomposite coatings with a B content of 7-16 at.%, have been deposited by magnetron sputtering from B4C, Ti, and C targets. X-ray diffraction, photoelectron spectroscopy, and electron microscopy show that the coatings consist of nanocrystalline (nc) TiC:B embedded in a matrix of amorphous (a) BCx and C. The fraction of amorphous phase scales with the Ti concentration, where the matrix predominantly consists of free C with some BCx in coatings with 8 at.% B, while the matrix predominantly consists of BCx with some free C in coatings with 16 at.% B. Nc-TiC:B/a-BCx/a-C coatings with low amount of free C exhibit a contact resistance comparable to the contact resistance of an Ag sputtered coating at loads of ~1 N against an Au probe.
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| 594. |
- Lauridsen, Jonas, 1983-
(författare)
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TiC-based nanocomposite coatings as electrical contacts
- 2011
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Doktorsavhandling (övrigt vetenskapligt/konstnärligt)abstract
- This Thesis concerns the advanced surface engineering of novel TiC-based nanocomposite and AgI electrical contact materials. The objective is to make industrially applicable coatings that are electrically conductive and wear-resistant, and have a low coefficient of friction. I have studied electrical contact systems consisting of a Cu substrate with a Ni diffusion barrier and loading support, and a conductive top coating. The contact systems were characterized by x-ray diffraction and photoelectron spectroscopy, analytical electron microscopy, ion beam analysis, nanoindentation, resistivity, and contact resistance measurements. Nc-TiC/a-C/SiC nanocomposite coatings consisting of nanocrystalline (nc) TiC embedded in an amorphous (a) matrix of C/SiC were deposited by magnetron sputtering with rates as high as 16 μm/h. These coatings have a contact resistance comparable with Ag at high loads (~800 N) and a resistivity of 160-770 μΩcm. The electrical properties of the contact can be improved by adding Ag to make nc-Ag/nc-TiC/a-SiC nanocomposites. It is possible to tailor the size and distribution of the Ag grains by varying the fraction of amorphous matrix, so as to achieve good conductivity in all directions in the coatings. Ti-Si-C-Ag coatings have a contact resistance that is one magnitude larger than Ag at lower loads (~1 N), and a resistivity of 77-142 μΩcm. The conductivity of the matrix phase can be increased by substituting Ge, Sn or Cu for Si, which also reduces the Ag grain growth. This yields coatings with a contact resistance twice as high as Ag at loads of 1 N, and a resistivity 274-1013 μΩcm. The application of a conductive top layer of Ag-Pd upon a Ti-Si-C-Ag:Pd coating can further reduce the contact resistance. For barrier materials against Cu interdiffusion, it is shown that conventional electroplating of Ni can be replaced with sputtering of Ni or Ti layers. This is an advantage since both contact and barrier layers can now be deposited in and by the same deposition process. For Ti-B-C coatings deposited by magnetron sputtering, I demonstrate promising electrical properties in a materials system otherwise known for its good mechanical properties. In coatings of low B concentration, the B is incorporated into the TiC phase, probably by enrichment on the TiC{111} planes. The corresponding disturbance of the cubic symmetry results in a rhombohedral TiC:B structure. Finally, it is shown that AgI coatings consisting of weakly agglomerated AgI grains function as solid lubricant on Ag contacts. In an Ag sliding electrical contact, AgI decreases the friction coefficient from ~1.2 to ~0.4. After a few hundred operations, AgI grains have deagglomerated and Ag from the underlying layer is exposed on the surface and the contact resistance decreases to < 100 μΩ.
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| 595. |
- Lawes, Simon D. A., et al.
(författare)
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Performance of fullerene-like CNx coatings for automotive valve-train applications
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Annan publikation (övrigt vetenskapligt/konstnärligt)abstract
- The design of internal combustion engines is evolving in order to provide greater efficiency and lower harmful emissions. There has been a move to lower component masses, higher engine temperatures, lower viscosity oils and low SAPS (sulphated ash, phosphor and sulphur) oils. With the transition to low density, low hardness materials and new lubrication conditions, come issues of component wear. Surface engineering techniques such as thin-film coating technologies present a possible solution. Thin-film coating development in recent years has often focused on achieving a high hardness, which often leads to high elastic modulus. However, there are potential benefits of less stiff and more elastic coatings. A number of wear mechanism are directly related to the ratio of hardness (H) and elastic modulus (E) and higher H/E ratios can be beneficial. This work therefore investigates the potential for using a highly elastic, experimental fullerene-like carbon nitride (FL-CNx) coating in a valve-train environment. Two FL-CNx coatings of differing nitrogen content were investigated using microscopy, wear testing, nanoindentation testing and in an experimental cam-tappet testing rig. The two FL-CNx coatings had similar adhesion to the substrate and hardness. The FL-CNx coating with the higher value of H/E also showed greater durability in the valve-train testing.
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| 596. |
- Li, Mian, et al.
(författare)
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Element Replacement Approach by Reaction with Lewis Acidic Molten Salts to Synthesize Nanolaminated MAX Phases and MXenes
- 2019
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Ingår i: Journal of the American Chemical Society. - : AMER CHEMICAL SOC. - 0002-7863 .- 1520-5126. ; 141:11, s. 4730-4737
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Tidskriftsartikel (refereegranskat)abstract
- Nanolaminated materials are important because of their exceptional properties and wide range of applications. Here, we demonstrate a general approach to synthesizing a series of Zn-based MAX phases and Cl-terminated MXenes originating from the replacement reaction between the MAX phase and the late transition-metal halides. The approach is a top-down route that enables the late transitional element atom (Zn in the present case) to occupy the A site in the pre-existing MAX phase structure. Using this replacement reaction between the Zn element from molten ZnCl2 and the Al element in MAX phase precursors (Ti3AlC2, Ti2AlC, Ti2AlN, and V2AlC), novel MAX phases Ti3ZnC2, Ti2ZnC, Ti2ZnN, and V2ZnC were synthesized. When employing excess ZnCl2, Cl-terminated MXenes (such as Ti3C2Cl2 and Ti2CCl2) were derived by a subsequent exfoliation of Ti3ZnC2 and Ti2ZnC due to the strong Lewis acidity of molten ZnCl2. These results indicate that A-site element replacement in traditional MAX phases by late transition-metal halides opens the door to explore MAX phases that are not thermodynamically stable at high temperature and would be difficult to synthesize through the commonly employed powder metallurgy approach. In addition, this is the first time that exclusively Cl-terminated MXenes were obtained, and the etching effect of Lewis acid in molten salts provides a green and viable route to preparing MXenes through an HF-free chemical approach.
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| 597. |
- Li, Mian, et al.
(författare)
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Halogenated Ti3C2 MXenes with Electrochemically Active Terminals for High-Performance Zinc Ion Batteries
- 2021
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Ingår i: ACS Nano. - : AMER CHEMICAL SOC. - 1936-0851 .- 1936-086X. ; 15:1, s. 1077-1085
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Tidskriftsartikel (refereegranskat)abstract
- The class of two-dimensional metal carbides and nitrides known as MXenes offer a distinct manner of property tailoring for a wide range of applications. The ability to tune the surface chemistry for expanding the property space of MXenes is thus an important topic, although experimental exploration of surface terminals remains a challenge. Here, we synthesized Ti3C2 MXene with unitary, binary, and ternary halogen terminals, e.g., -Cl, -Br, -I, -BrI, and -ClBrI, to investigate the effect of surface chemistry on the properties of MXenes. The electrochemical activity of Br and I elements results in the extraordinary electrochemical performance of the MXenes as cathodes for aqueous zinc ion batteries. The -Br- and -I-containing MXenes, e.g., Ti3C2Br2 and Ti3C2I2, exhibit distinct discharge platforms with considerable capacities of 97.6 and 135 mA.g(-1). Ti3C2 (BrI) and Ti3C2 (ClBrI) exhibit dual discharge platforms with capacities of 117.2 and 106.7 mAh.g(-1). In contrast, the previously discovered MXenes Ti3C2Cl2 and Ti3C2 (OF) exhibit no discharge platforms and only similar to 50% of capacities and energy densities of Ti3C2Br2. These results emphasize the effectiveness of the Lewis-acidic-melt etching route for tuning the surface chemistry of MXenes and also show promise for expanding the MXene family toward various applications.
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| 598. |
- Li, Xiao, et al.
(författare)
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Dense, single-phase, hard, and stress-free Ti0.32Al0.63W0.05N films grown by magnetron sputtering with dramatically reduced energy consumption
- 2022
-
Ingår i: Scientific Reports. - : Nature Portfolio. - 2045-2322. ; 12:1
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Tidskriftsartikel (refereegranskat)abstract
- The quest for lowering energy consumption during thin film growth, as by magnetron sputtering, becomes of particular importance in view of sustainable development goals. A recently proposed solution combining high power impulse and direct current magnetron sputtering (HiPIMS/DCMS) relies on the use of heavy metal-ion irradiation, instead of conventionally employed resistive heating, to provide sufficient adatom mobility, in order to obtain high-quality dense films. The major fraction of process energy is used at the sputtering sources rather than for heating the entire vacuum vessel. The present study aims to investigate the W+ densification effects as a function of increasing Al content in (Ti1-yAly)(1-x)WxN films covering the entire range up to the practical solubility limits (y similar to 0.67). Layers with high Al content are attractive to industrial applications as the high temperature oxidation resistance increases with increasing Al concentration. The challenge is, however, to avoid precipitation of the hexagonal wurtzite AIN phase, which is softer. We report here that (T1-yAly)(1-x)WxN layers with y= 0.66 and x= 0.05 grown by a combination ofW-HiPIMS and TiAI-DCMS with the substrate bias V-s synchronized to the W+-rich fluxes (to provide mobility in the absence of substrate heating) possess single-phase NaCl-structure, as confirmed by XRD and SAED patterns. The evidence provided by XTEM images and the residual oxygen content obtained from ERDA analyses reveals that the alloy films are dense without discernable porosity. The nanoindentation hardness is comparable to that of TiAlN films grown at 400-500 degrees C, while the residual stresses are very low. We established that the adatom mobility due to the heavy ion W+ irradiation (in place of resistive heating) enables the growth of high-quality coatings at substrate temperatures not exceeding 130 degrees C provided that the W+ momentum transfer per deposited metal atom is sufficiently high. The benefit of this novel film growth approach is not only the reduction of the process energy consumption by 83%, but also the possibility to coat temperature-sensitive substrates.
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| 599. |
- Li, Xiao, et al.
(författare)
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Determining role of W+ ions in the densification of TiAlWN thin films grown by hybrid HiPIMS/DCMS technique with no external heating
- 2023
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Ingår i: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films. - : A V S AMER INST PHYSICS. - 0734-2101 .- 1520-8559. ; 41:1
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Tidskriftsartikel (refereegranskat)abstract
- Hybrid high-power impulse and dc magnetron co-sputtering (HiPIMS/DCMS) with substrate bias synchronized to the high mass metal-ion fluxes was previously proposed as a solution to reduce energy consumption during physical vapor deposition processing and enable coatings on temperature-sensitive substrates. In this approach, no substrate heating is used (substrate temperature is lower than 150 C-o) and the thermally activated adatom mobility, necessary to grow dense films, is substituted by overlapping collision cascades induced by heavy ion bombardment and consisting predominantly of low-energy recoils. Here, we present direct evidence for the crucial role of W+ ion irradiation in the densification of Ti0.31Al0.60W0.09N films grown by the hybrid W-HiPIMS/TiAl-DCMS co-sputtering. The peak target current density J(max) on the W target is varied from 0.06 to 0.78 A/cm(2) resulting in more than fivefold increase in the number of W+ ions per deposited metal atom, eta = W+/(W + Al + Ti) determined by time-resolved ion mass spectrometry analyses performed at the substrate plane under conditions identical to those during film growth. The DCMS is adjusted appropriately to maintain the W content in the films constant at Ti0.31Al0.60W0.09N. The degree of porosity, assessed qualitatively from cross-sectional SEM images and quantitatively from oxygen concentration profiles as well as nanoindentation hardness, is a strong function of eta ( J m a x ). Layers grown with low eta values are porous and soft, while those deposited under conditions of high eta are dense and hard. Nanoindentation hardness of Ti0.31Al0.60W0.09N films with the highest density is & SIM;33 GPa, which is very similar to values reported for layers deposited at much higher temperatures (420-500 C-o) by conventional metal-ion-based techniques. These results prove that the hybrid HiPIMS/DCMS co-sputtering with bias pulses synchronized to high mass metal ion irradiation can be successfully used to replace conventional solutions. The large energy losses associated with heating of the entire vacuum chamber are avoided, by focusing the energy input to where it is in fact needed, i.e., the workpiece to be coated.
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| 600. |
- Li, Xiao, et al.
(författare)
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Toward energy-efficient physical vapor deposition : Routes for replacing substrate heating during magnetron sputter deposition by employing metal ion irradiation
- 2021
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Ingår i: Surface & Coatings Technology. - : Elsevier Science SA. - 0257-8972 .- 1879-3347. ; 415
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Tidskriftsartikel (refereegranskat)abstract
- In view of the increasing demand for achieving sustainable development, the quest for lowering energy consumption during thin film growth by magnetron sputtering becomes of particular importance. In addition, there is a demand for low-temperature growth of dense, hard coatings for protecting temperature-sensitive substrates. Here, we explore a method, in which thermally-driven adatom mobility, necessary to obtain high-quality fully-dense films, is replaced with that supplied by effective low-energy recoil creation resulting from high-mass metal ion irradiation of the growing film surface. This approach allows the growth of dense and hard films with no external heating at substrate temperatures T-s not exceeding 130 degrees C in a hybrid high-power impulse and de magnetron co-sputtering (HiPIMS/DCMS) setup involving a high mass (m > 180 amu) HiPIMS target and metal- ion-synchronized bias pulses. We specifically investigate the effect of the metal ion mass on the extent of densification, phase content, nanostructure, and mechanical properties of metastable cubic Ti0.50Al0.50N based thin films, which present outstanding challenges for phase stability control. Ti0.50Al0.50N based thin films are irradiated by group VIB transition metal (TM) target ions generated by Me-HiPIMS discharge, in which Me = Cr (m(Cr)= 52.0 amu), Mo (m(Mo) = 96.0 amu), and W (m(W) = 183.8 amu). Three series of (Ti1-yAly)(1-x)MexN films are grown with x = Me/(Me+Al+Ti) varied intentionally by adjusting the DCMS powers, while y = Al/(Al+Ti) also varies as a result of Me+ ion irradiation. Results reveal a strong dependence of film properties on the mass of the HiPIMS-generated metal ions. All layers deposited with Cr+ irradiation exhibit porous nanostructure, high ox- ygen content, and poor mechanical properties. In contrast, (Ti1-yAly)(1-x)WxN films are fully-dense even with the lowest W concentration, x = 0.09, show no evidence of hexagonal AlN precipitation, and exhibit state-of the-art mechanical properties typical of Ti0.50Al0.50N grown at 500 degrees C. The process energy consumption is lowered by 64% with no negative impact on the coating quality. TRIM simulations provide an insight into the densification mechanisms.
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