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Träfflista för sökning "AMNE:(NATURVETENSKAP Matematik) ;pers:(Jones R.)"

Sökning: AMNE:(NATURVETENSKAP Matematik) > Jones R.

  • Resultat 1-10 av 204
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1.
  • Murin, L.I., et al. (författare)
  • Isotopic effects on vibrational modes of thermal double donors in Si and Ge
  • 2001
  • Ingår i: Physica. B, Condensed matter. - 0921-4526 .- 1873-2135. ; 308-310, s. 290-293
  • Tidskriftsartikel (refereegranskat)abstract
    • The local vibrational modes of thermal double donors in Si and Ge are investigated by FTIR and ab initio modelling. At most, two oxygen modes are detected from each donor, which exhibit regular shifts with increasing donor number. By using mixtures of 16O and 18O, it is found that in Si the upper band does not yield any new modes suggesting that any oxygen atom is decoupled from any other. However, the lower frequency bands exhibit unique mixed modes proving for the first time that oxygen atoms are coupled together and in close spatial proximity. Ab initio calculations demonstrate that the modes and their isotopic shifts are consistent with a model involving two parallel chains of oxygen atoms linking second neighbour Si atoms, terminated by O-atoms close to the normal position for interstitial O. © 2001 Elsevier Science B.V. All rights reserved.
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2.
  • Adey, J., et al. (författare)
  • Degradation of boron-doped Czochralski-grown silicon solar cells
  • 2004
  • Ingår i: Physical Review Letters. - 0031-9007 .- 1079-7114. ; 93:5, s. 055504-1
  • Tidskriftsartikel (refereegranskat)abstract
    • The formation mechanism and properties of the boron-oxygen center responsible for the degradation of Czochralski-grown Si(B) solar cells during operation is investigated using density functional calculations. We find that boron traps an oxygen dimer to form a bistable defect with a donor level in the upper half of the band gap. The activation energy for its dissociation is found to be 1.2 eV. The formation of the defect from mobile oxygen dimers, which are shown to migrate by a Bourgoin mechanism under minority carrier injection, has a calculated activation energy of 0.3 eV. These energies and the dependence of the generation rate of the recombination center on boron concentration are in good agreement with observations.
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3.
  • Adey, J., et al. (författare)
  • Theory of boron-vacancy complexes in silicon
  • 2005
  • Ingår i: Physical Review B. Condensed Matter and Materials Physics. - 1098-0121 .- 1550-235X. ; 71:16, s. 165211-
  • Tidskriftsartikel (refereegranskat)abstract
    • The substitutional boron-vacancy BsV complex in silicon is investigated using the local density functional theory. These theoretical results give an explanation of the experimentally reported, well established metastability of the boron-related defect observed in p-type silicon irradiated at low temperature and of the two hole transitions that are observed to be associated with one of the configurations of the metastable defect. BsV is found to have several stable configurations, depending on charge state. In the positive charge state the second nearest neighbor configuration with C1 symmetry is almost degenerate with the second nearest neighbor configuration that has C1h symmetry since the bond reconstruction is weakened by the removal of electrons from the center. A third nearest neighbor configuration of BsV has the lowest energy in the negative charge state. An assignment of the three energy levels associated with BsV is made. The experimentally observed Ev+0.31 eV and Ev+0.37 eV levels are related to the donor levels of second nearest neighbor BsV with C1 and C1h symmetry respectively. The observed Ev+0.11 eV level is assigned to the vertical donor level of the third nearest neighbor configuration. The boron-divacancy complex BsV2 is also studied and is found to be stable with a binding energy between V2 and Bs of around 0.2 eV. Its energy levels lie close to those of the V2. However, the defect is likely to be an important defect only in heavily doped material.
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4.
  • Andersen, O., et al. (författare)
  • Electrical activity of carbon-hydrogen centers in Si
  • 2002
  • Ingår i: Physical Review B. Condensed Matter and Materials Physics. - 1098-0121 .- 1550-235X. ; 66:23, s. 235205-1
  • Tidskriftsartikel (refereegranskat)abstract
    • The electrical activity of Cs-H defects in Si has been investigated in a combined modeling and experimental study. High-resolution Laplace capacitance spectroscopy with the uniaxial stress technique has been used to measure the stress-energy tensor and the results are compared with theoretical modeling. At low temperatures, implanted H is trapped as a negative-U center with a donor level in the upper half of the gap. However, at higher temperatures, H migrates closer to the carbon impurity and the donor level falls, crossing the gap. At the same time, an acceptor level is introduced into the upper gap making the defect a positive-U center.
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5.
  • Andersen, O., et al. (författare)
  • Piezospectroscopic analysis of the hydrogen-carbon complexes in silicon
  • 2001
  • Ingår i: Physica. B, Condensed matter. - 0921-4526 .- 1873-2135. ; 308, s. 139-142
  • Tidskriftsartikel (refereegranskat)abstract
    • We have observed the donor (Ec-0.22 eV) and acceptor (Ec-0.16 eV) levels related to hydrogen-carbon complexes in silicon. The donor level is only detected at low temperatures after proton implantation. This hydrogen-carbon complex irreversibly reconfigures at temperatures above 225 K to a configuration characterized by the acceptor level, which is stable up to room temperature. The same acceptor level is also observed after atomic hydrogen diffusion. We have used Laplace transform deep level transient spectroscopy (DLTS) to show the influence of uniaxial stress on the electron emission process and the effect of the stress-induced alignment for the acceptor state. The pattern of the Laplace DLTS peak splittings indicate a trigonal symmetry of the defect. First principles calculations were carried out on the hydrogen-carbon defects with a view of determining their electrical levels and stress response for comparison with the experimental results.
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6.
  • Ashwin, M.J., et al. (författare)
  • The bonding of CAs acceptors in InxGa1-xAs grown by chemical beam epitaxy using carbon tetrabromide as the source of carbon
  • 1996
  • Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 80:12, s. 6754-6760
  • Tidskriftsartikel (refereegranskat)abstract
    • InxGa1-xAs layers (0≤x≤0.37) doped with carbon (>1020 cm-3) were grown on semi-insulating GaAs substrates by chemical beam epitaxy using carbon tetrabromide (CBr4) as the dopant source. Hall measurements imply that all of the carbon was present as CAs for values x up to 0.15. The C acceptors were passivated by exposing samples to a radio frequency hydrogen plasma for periods of up to 6 h. The nearest-neighbor bonding configurations of CAs were investigated by studying the nondegenerate antisymmetric hydrogen stretch mode (A-1 symmetry) and the symmetric XH mode (A+1 symmetry) of the H-CAs pairs using IR absorption and Raman scattering, respectively. Observed modes at 2635 and 450 cm-1 had been assigned to passivated Ga4CAs clusters. New modes at 2550 and 430 cm-1 increased in strength with increasing values of x and are assigned to passivated InGa3CAs clusters. These results were compared with ab initio local density functional theory. Modes due to AlInGaCAs clusters were detected in samples containing grown in Al and In. These results demonstrate that for InGaAs, CBr4 is an efficient C doping source since both In-CAs bonds as well as Ga-CAs bonds are formed, whereas there is no evidence for the formation of In-CAs bonds in samples doped with C derived from trimethylgallium or solid sources
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7.
  • Bangert, U., et al. (författare)
  • Electron energy loss spectroscopic studies of brown diamonds
  • 2006
  • Ingår i: Philosophical Magazine. - : Informa UK Limited. - 1478-6435 .- 1478-6443. ; 86:29-31, s. 4757-4779
  • Tidskriftsartikel (refereegranskat)abstract
    • We investigate both experimentally and theoretically, low-loss electron energy losses in brown type IIa monocrystalline diamonds both before and after high-temperature, high-pressure anneals which remove the brown colouration. We find additional losses within and near the band edge for brown diamond which are significantly reduced after treatment. The additional losses are not associated with dislocations. Graphitic inclusions are detected by EELS as well as TEM studies for some brown diamonds before treatment. These lead to pronounced subgap absorption. However, all brown diamonds exhibit additional losses which are due to point defects lying in the regions between dislocations. First principles theoretical modelling shows that common dislocations are not responsible for the brown colouration but a -bonded vacancy disk lying on {111} planes gives broad bands lying in the diamond band gap, possesses an optical absorption spectrum similar to that of brown diamond, and leads to additional electron energy losses in the band edge region. These and similar defects are suggested to be responsible for the brown colouration. Mechanisms are proposed for their formation and removal.
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8.
  • Blumenau, A.T., et al. (författare)
  • Basal plane partial dislocations in silicon carbide
  • 2003
  • Ingår i: Physica. B, Condensed matter. - : Elsevier BV. - 0921-4526 .- 1873-2135. ; 340, s. 160-164
  • Tidskriftsartikel (refereegranskat)abstract
    • Under operating conditions (forward bias) bipolar 4H- and 6H-SiC devices are known to degrade rapidly through stacking fault formation and expansion in the basal plane. It has been suggested that a recombination-enhanced dislocation glide (REDG) mechanism allows the bordering Shockley partial dislocations to overcome their barrier to glide motion and thus results in the observed stacking fault growth. In this work, we investigate the structure and properties of the participating Shockley partials by means of density functional-based atomistic calculations. Their glide motion is modelled in a process involving the formation and subsequent migration of kinks. This in combination with an analysis of the electronic structure of the partials allows an identification of those types which will be affected by the REDG mechanism.
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9.
  • Blumenau, A.T., et al. (författare)
  • Density functional based modelling of 30° partial dislocations in SiC
  • 2004
  • Ingår i: Proceedings of the 10th International Conference on Silicon Carbide and Related Materials, ICSCRM 2003. - Stafa-Zuerich : Trans Tech Publications Inc.. - 0878499431 ; , s. 453-456
  • Konferensbidrag (refereegranskat)abstract
    • Experiment has shown that 4H- and 6H-SiC pin diodes degrade rapidly during forward biased operation. This degradation is accompanied by the formation and expansion of stacking faults in the basal plane. It is believed that the observed rapid stacking fault growth is due to a recombination-enhanced dislocation glide (REDG) mechanism at the bordering partial dislocations. In our work we investigate the structure and properties of basal plane 30° Shockley partials in SiC by means of density functional based calculations. Barriers to their glide motion, and thus the expansion of the accompanying stacking fault is modelled in a process involving the formation and subsequent migration of kinks in the dislocation. In combination with an analysis of the electronic structure of the partials and stacking faults, this allows an identification of those types of partials which will be affected by the REDG mechanism in this model.
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10.
  • Blumenau, A. T., et al. (författare)
  • Dislocation related photoluminescence in silicon
  • 2001
  • Ingår i: Physical Review Letters. - 0031-9007 .- 1079-7114. ; 87:18
  • Tidskriftsartikel (refereegranskat)abstract
    • Dislocation related photoluminescence in Si and SiGe is attributed to stable interstitial clusters bound to 60° dislocations. Density functional based total energy calculations in Si give binding energies between 1.5 and 3.6 eV for I3 and I4 clusters with 90° and 30° partials. They possess donor levels around Ev+0.4 eV which are consistent with deep level transient spectroscopic studies on p-Si. It is further suggested that the clusters would act as the obstacles to the movement of dislocations which may have been observed in recent transmission electron microscopy studies.
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  • Resultat 1-10 av 204

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