Development of Nanoimprint Lithography for Fabrication of Electrochemical Transducers

• This thesis gives an overview about the current status of nanoimprint lithography, a relatively new nanofabrication tool. The technology is capable for parallel mass production of nm-structured features having a resolution below 10 nm and is usable with high throughput on full wafer scale. The thesis is mainly divided into two parts dealing with nanoimprint lithography and electrochemistry. The work concerns the development of reliable and reproducible imprint processes, e.g. for fabrication of nm-structured interdigitated array electrodes usable in (bio-) electrochemical sensor applications. Such electrodes can be used for measuring electrochemical processes such as redox cycling, which become addressable when the electrode distance becomes smaller than the diffusion layer thickness at the electrode/electrolyte interface. The process development addresses several issues such as: (i) Production of nanoimprint stamps/molds with electron beam and UV-lithography. (ii) Evaluation of new polymers especially developed for nanoimprint lithography. (iii) Anti-adhesion treatment of different imprint molds with molecular layers and (iv) their characterization with photoelectron spectroscopy. (v) Development of post-imprint processes for substrate etching or metal lift-off. (vi) Deposition of non-corroding alternative organic adhesion promoters for gold on silicon dioxide. (vii) Evaluation of fluorescence microscopy as a tool for quality control in industrial nanoimprint processes. The electrochemistry part deals mainly with theoretical electrochemistry as we teach it in the biophysics course given at the department and is supposed to be used as course literature. Parallel to the NIL process development electrochemical equipment was built and evaluated with some standard measurements presented in this thesis. The outcome of this development was used to build a more advanced instrument suitable for redox cycling with nm-structured electrodes. First results with nm-structured electrodes are compared with mm-structured ones.

• Popular Abstract in Swedish Avhandlingen ger en överblick över dagens status inom nanoimprintlitografi. Teknologin ger möjlighet att framställa nm-strukturer med en upplösning bättre än 10 nm och kan användas för massproduktion av hela wafers. Avhandlingen beskriver utvecklingen av reproducerbara imprintprocesser som t.ex. kan användas för framställning av nm-strukturerade fingerelektroder. Dessa har ett stort användningsområde för tillverkning av framtida (bio-)elektrokemiska sensorer. Processutvecklingen beskriver framställning av imprintstämplar, utvärdering av nya imprintpolymerer, "anti-stick"-behandling med molekylära monolager samt karakterisering av desamma med fotoelektronspektroskopi, utveckling av processer för mönsteröverföring efter tryckningen, deponering av ett molekylärt lager som adhesionsskikt mellan guld och kiseldioxid och utvärdering av fluorescensmikroskopi som verktyg för kvalitetskontroll inom nanoimprintlitografi. Elektrokemidelen i avhandlingen syftar till använding såsom kurslitteratur för biofysikkursen som ges på avdelningen. Initiala mätresultat med nm-strukturerade fingerelektroder redovisas för.

Ämnesord

NATURVETENSKAP  -- Fysik -- Den kondenserade materiens fysik (hsv//swe)

NATURAL SCIENCES  -- Physical Sciences -- Condensed Matter Physics (hsv//eng)

Nyckelord

electrochemistry

interdigitated array

anti-adhesion

anti-sticking

stamp

mold

monolayer deposition

Fysik

post-imprint processes

Physics

transducer

nanoimprint lithography

sensor

Fysicumarkivet A:2003:Beck

Publikations- och innehållstyp

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