| 1. |
- Gueorguiev Ivanov, Ivan, et al.
(författare)
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Optical properties of the niobium centre in 4H, 6H, and 15R SiC
- 2013
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Ingår i: SILICON CARBIDE AND RELATED MATERIALS 2012. - : Trans Tech Publications. ; , s. 405-408
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Konferensbidrag (refereegranskat)abstract
- A set of lines in the photoluminescence spectra of 4H-, 6H-, and 15R-SiC in the near-infrared are attributed to Nb-related defects on the ground of doping experiments conducted with 4H-SiC. A model based on a an exciton bound at the Nb-centre in an asymmetric split vacancy configuration at a hexagonal site is proposed, which explains the structure of the luminescence spectrum and the observed Zeeman splitting of the lines.
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| 2. |
- Gällström, Andreas, et al.
(författare)
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Electronic Configuration of Tungsten in 4H-, 6H-, and 15R-SiC
- 2012
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Ingår i: Materials Science Forum Vols 717 - 720. - : Trans Tech Publications Inc.. - 9783037854198 ; , s. 211-216
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Konferensbidrag (refereegranskat)abstract
- A commonly observed unidentified photoluminescence center in SiC is UD-1. In this report, the UD-1 center is identified to be tungsten related. The identification is based on (i) a W-doping study, the confirmation of W in the samples was made using deep level transient spectroscopy (DLTS), (ii) the optical activation energy of the absorption of UD-1 in weakly n-type samples corresponds to the activation energy of the deep tungsten center observed using DLTS. The tungsten-related optical centers are reported in 4H-, 6H-, and 15R-SiC. Further, a crystal field model for a tungsten atom occupying a Si-site is suggested. This crystal field model is in agreement with the experimental data available: polarization, temperature dependence and magnetic field splitting.
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| 3. |
- Gällström, Andreas, et al.
(författare)
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Optical identification and electronic configuration of tungsten in 4H-and 6H-SiC
- 2012
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Ingår i: Physica. B, Condensed matter. - : Elsevier. - 0921-4526 .- 1873-2135. ; 407:10, s. 1462-1466
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Tidskriftsartikel (refereegranskat)abstract
- Several optically observed deep level defects in SiC are still unidentified and little is published on their behavior. One of the commonly observed deep level defects in semi-insulating SiC is UD-1. less thanbrgreater than less thanbrgreater thanThis report suggests that UD-1 is Tungsten related, based on a doping study and previously reported deep level transient spectroscopy data, as well as photo-induced absorption measurements. The electronic levels involved in the optical transitions of UD-1 are also deduced. The transitions observed in the photoluminescence of UD-1 are from a Gamma(C3v)(4), to two different final states, which transform according to Gamma(C3v)(5)circle plus Gamma(C3v)(6) and Gamma(C3v)(4), respectively.
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| 4. |
- Isoya, J, et al.
(författare)
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Pulsed EPR studies of phosphorus shallow donors in diamond and SiC
- 2006
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Ingår i: Physica B, Vols. 376-377. - : Elsevier BV. ; , s. 358-361
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Konferensbidrag (refereegranskat)abstract
- Phosphorus shallow donors having the symmetry lower than T-d are studied by pulsed EPR. In diamond:P and 3C-SiC:P, the symmetry is lowered to D-2d and the density of the donor wave function on the phosphorus atom exhibits a predominant p-character. In 4H-SiC:P with the site symmetry of C-3v, the A(1) ground state of the phosphorus donors substituting at the quasi-cubic site of silicon shows an axial character of the distribution of the donor wave function in the vicinity of the phosphorus atom. (c) 2005 Elsevier B.V. All rights reserved.
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| 5. |
- Janzén, Erik, 1954-, et al.
(författare)
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Defects in SiC
- 2008
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Ingår i: Defects in Microelectronic Materials and Devices. - : Taylor and Francis LLC. ; , s. 770-
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Bokkapitel (övrigt vetenskapligt/konstnärligt)abstract
- Uncover the Defects that Compromise Performance and Reliability As microelectronics features and devices become smaller and more complex, it is critical that engineers and technologists completely understand how components can be damaged during the increasingly complicated fabrication processes required to produce them.A comprehensive survey of defects that occur in silicon-based metal-oxide semiconductor field-effect transistor (MOSFET) technologies, this book also discusses flaws in linear bipolar technologies, silicon carbide-based devices, and gallium arsenide materials and devices. These defects can profoundly affect the yield, performance, long-term reliability, and radiation response of microelectronic devices and integrated circuits (ICs). Organizing the material to build understanding of the problems and provide a quick reference for scientists, engineers and technologists, this text reviews yield- and performance-limiting defects and impurities in the device silicon layer, in the gate insulator, and/or at the critical Si/SiO2 interface. It then examines defects that impact production yield and long-term reliability, including:Vacancies, interstitials, and impurities (especially hydrogen)Negative bias temperature instabilitiesDefects in ultrathin oxides (SiO2 and silicon oxynitride)Take A Proactive Approach The authors condense decades of experience and perspectives of noted experimentalists and theorists to characterize defect properties and their impact on microelectronic devices. They identify the defects, offering solutions to avoid them and methods to detect them. These include the use of 3-D imaging, as well as electrical, analytical, computational, spectroscopic, and state-of-the-art microscopic methods. This book is a valuable look at challenges to come from emerging materials, such as high-K gate dielectrics and high-mobility substrates being developed to replace Si02 as the preferred gate dielectric material, and high-mobility substrates
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