| 1. |
- Aijaz, Asim, et al.
(författare)
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Deposition of thermochromic vanadium dioxide thin films by reactive high power impulse magnetron sputtering
- 2014
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Konferensbidrag (övrigt vetenskapligt/konstnärligt)abstract
- Vanadium dioxide exhibits a reversible phase transition from semiconducting state (monoclinic structure) to a metallic state (tetragonal structure) at ~68 oC. This so-called metal-insulator transition (MIT) entails thermochromic behavior manifested by large changes in optical properties, such as high infrared transmittance modulation in thin films, thereby making VO2-based films a suitable candidate for optical switching applications such as self-tunable infrared filters. Thermochromic VO2 thin films have been widely investigated for optical applications, but high growth temperatures (> 400 oC) required for synthesizing crystalline VO2 thin films, high MIT temperature (68 oC) as well as low visible transmittance (typically ~50%) limit their applicability for example for energy efficient smart windows. Synthesis of metal-oxide thin films using highly ionized vapor fluxes has been shown to facilitate low-temperature film growth as well as control over phase formation and resulting film properties. In the present work, we synthesize VO2 thin films by use of highly ionized vapor fluxes that are generated by high power impulse magnetron sputtering (HiPIMS). In order to establish a correlation between the plasma and film properties, we investigate the discharge characteristics by analyzing the discharge current-voltage characteristics under varied process parameters such as peak-power, pulse-width and gas phase composition and grow VO2 thin films under suitable process conditions. We investigate the effect of growth temperature (room temperature to 500 oC), energy of the deposition flux (controlled by substrate bias potential) and type of substrate (Si, glass, ITO-coated glass) on crystallinity, phase formation and on optical properties (visible transmittance and infrared modulation) of the resulting thin films. For reference, the discharge characteristics and properties of films deposited by pulsed direct current magnetron sputtering are also studied.
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| 2. |
- Aroutiounian, V., et al.
(författare)
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Fluctuation-enhanced gas sensing
- 2009
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Ingår i: Procedia Chemistry. - : Elsevier BV. - 1876-6196.
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Konferensbidrag (refereegranskat)abstract
- The sensitivity of gas sensors was earlier measured by classical method-comparison the resistance of sensors in gas media and air. Here we reported results of the study of low-frequency noise characteristics of sensors. We compare data for different Figaro TGS sensors as well as our sol-gel H-2 tin dioxide and porous silicon sensors. The study was performed in dry air and in a mix of dry air with carbon monoxide, hydrogen and alcohol of different concentrations. Higher sensitivity of spectral dependence of noise (SDN) to gas concentration in comparison with classical method of the measurements of gas sensing by a change in the Ohmic resistance part of current-voltage characteristics of samples allows using such SND powerful method for determination of gas concentration in the air or environment.
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| 3. |
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| 4. |
- Arvizu, Miguel A., et al.
(författare)
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Electrochromic dc sputtered W1-x-y Moy Tix O3 thin films: : Optical properties and durability.
- 2016
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Konferensbidrag (refereegranskat)abstract
- The key component in an electrochromic (EC) device is its primary EC thin film. The outstanding intrinsic ECproperties of tungsten oxide (WO3) make this material the best option available for the cathodic layer in an ECdevice. Nevertheless much research remains in order to optimize WO3 with regard to optical properties, durability,etc. It is well known that addition of titanium (Ti) into the matrix of WO3 increases significantly the resistance of the film to electrochemical cycling both under norma loperation and during accelerated aging in extended voltage ranges [1]. On the other hand, using molybdenum (Mo) as an additive in small concentrations helps to improve the color rendering by shifting th eposition of the maximum of the coloration band to higher energies [2]. The present work reports our recent investigations on thin films of mixed oxides with a focus on ways to optimize tungsten oxide thin films regarding both their durability and color by the addition of Ti and Mo. The films were deposited by reactive DC cosputtering from Mo and W-Ti alloy targets. Cyclic voltammetry, in a three-electrode system consisting of the film and lithium foils, was performed in a solution 1 MLiClO4 in propylene carbonate (Li–PC) as electrolyte. Insitu and ex-situ optical characterization was done for the EC films, and the transmittance switching and coloration efficiency were determined. Durability was studied by analyzing how the charge density evolved and how rapidly the transmittance modulation deteriorated during cycling for the different concentrations of Mo and Ti .References[1] M.A. Arvizu, C.A. Triana, B.I. Stefanov, C.G.Granqvist , G.A. Niklasson, “Electrochromism in SputterdepositedW-Ti Oxide Films: Durability Enhancement dueto Ti”, Solar Energy Materials & Solar Cells 125 (2014)184-189 (and references therein).[2] M.A. Arvizu, C.G. Granqvist and G.A. Niklasson,“Electrochromism in sputter deposited W1–yMoyO3 thinfilms”, Journal of Physics: Conference Series 682 (2016)012005 (and references therein).
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| 5. |
- Arvizu, Miguel A., et al.
(författare)
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Electrochromism in DC sputtered W1-yMoyO3 thin films
- 2015
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Ingår i: INERA Conference 2015. - : Institute of Physics (IOP).
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Konferensbidrag (refereegranskat)abstract
- Electrochromic (EC) properties of tungsten–molybdenum oxide (W1–yMoyO3) thin films were investigated. The films were deposited on indium tin oxide covered glass by reactive DC sputtering from tungsten and molybdenum targets. Elemental compositions of the W1–yMoyO3 films were determined by Rutherford back scattering. Voltammetric cycling was performed in an electrolyte of 1 M LiClO4 in propylene carbonate. The increase in molybdenum content in the EC films caused both a shift towards higher energies and a quenching of the value of the maximum of the coloration band, as compared with WO3 EC films. Durability was also diminished for W1–yMoyO3 EC films.
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| 6. |
- Atak, Gamze, et al.
(författare)
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Durability studies of annealed electrochromic tungsten oxide films
- 2021
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Ingår i: EMRS Fall Meeting 2021.
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Konferensbidrag (övrigt vetenskapligt/konstnärligt)abstract
- In electrochromic (EC) applications, annealing is a crucial parameter not only for an individual layer but also for a full device. For the fabrication of a complete EC device, indium tin oxide (ITO) is often preferred as a transparent conductor layer. ITO films with high transparency and low electrical resistance are usually obtained by sputtering at high substrate temperatures. Consequently, the effect of high temperature on the EC layers can be very significant during sputtering of the ITO top layer for EC devices consisting of five sputtered layers on a single substrate. The role of annealing of a single layer of WO3 may also be important for EC performance. In the present work, we studied the effects of annealing on the durability of WO3 films. Thin films of WO3 were deposited by reactive DC magnetron sputtering in a mixture of Ar and O2 gases using an oxygen to argon ratio of 0.15. The total gas pressure was set to 4.0 Pa, and the sputtering power was 200 W. The WO3 films were deposited onto (i) unheated glass plates, (ii) such plates pre-coated with transparent and electrically conducting ITO with a sheet resistance of 60 Ω/square, and (iii) glass plates pre-coated with fluorine-doped tin oxide (FTO) with a sheet resistance of 14 Ω/square. Film thicknesses were 300±10 nm. After deposition of the films, the samples were annealed at 150, 300, 450, and 600 °C in ambient air for one h using a heating rate of 10 °C min-1. Cyclic voltammetry (CV) was performed for up to 500 cycles between 2.0 and 4.0 V vs. Li/Li+ at a scan rate of 20 mV s–1. Annealing at temperatures at and above 300 °C resulted in deteriorated electrochromic properties of the WO3 films i.e., a decreased transmittance variation. Charge density and coloration efficiency changes during extended electrochemical cycling were also observed as a function of cycle number and annealing temperature. It was found that the maximum optical transmittance modulation at a wavelength of 528 nm after 500 CV cycles was 69.3% for the film annealed at 150 °C.
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| 7. |
- Atak, Gamze, et al.
(författare)
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Nitrogen doped W oxide films for electrochromic applications
- 2019
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Ingår i: EMRS Spring Meeting 2019.
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Konferensbidrag (refereegranskat)abstract
- Electrochromic (EC) materials are able to change their optical properties such as transmission, absorption and reflection reversibly by application of an external voltage. EC metal oxides are divided into two groups: cathodic (coloring under ion insertion) and anodic (coloring under ion extraction). W oxide is a well-known cathodic EC material and its color changes from transparent to dark blue when ions are inserted.A desirable electrochromic material must have and maintain a high optical modulation, high coloration efficiency, fast coloration/bleaching switching kinetics and a stable charge/ discharge reversibility. In this study, W oxide films with different nitrogen levels were deposited by using reactive DC sputtering onto glass and ITO coated glass in Ar+O2+N2 atmosphere. For all films, the total gas pressure was set to 4.0 Pa, the Ar flow rate was kept at 50 ml/min, and the O2+N2 flow rate was kept at 7.5 ml/min. The optical, structural and electrochromic properties of undoped and N-doped W oxide films were investigated. The optical studies revealed that the average optical transmittance and band gap decreased (from 3.43 to 3.08 eV) due to N doping. It is shown that a small amount of nitrogen has promising effects on the EC performance (i.e. charge/discharge reversibility, optical modulation, coloration efficiency) of the WO3 films. It is observed that CE values increased by increasing N2 flow rate and its maximum value was 33.8 cm2/C. The maximum ΔT at 537 nm was 73.6% for an optimized N doped W oxide film.
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| 8. |
- Atak, Gamze, et al.
(författare)
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The role of oxygen to argon gas flow ratio on the durability of sputter-deposited electrochromic tungsten oxide films
- 2021
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Ingår i: EMRS Fall Meeting 2021.
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Konferensbidrag (övrigt vetenskapligt/konstnärligt)abstract
- Materials that are able to vary their transparency and coloration reversibly when they are subjected to an electrical current or voltage are referred to as “electrochromic” (EC). High optical transmittance modulation and long service lifetime are apparent requirements for EC materials used in smart windows technology. An extended service lifetime is provided by the long-term durability of the materials. One important aspect of durability is the ability to sustain charge transport between the EC film and electrolyte, or between the two EC films in a device, for many hundreds or thousands of cycles without any significant changes in the performance such as optical modulation and inserted-extracted charge. The purpose of this study is to clarify the effects of the oxygen-argon gas flow ratio during sputter deposition on the durability of WO3 films. In this study, the oxygen to argon gas-flow ratio was modulated by setting the O2 flow rate to 7.5, 15.0, 22.5, and 45.0 ml min-1 and using a fixed Ar flow rate of 50 ml min-1. Thus, the oxygen to argon gas-flow ratio was varied from 0.15 to 0.90. The pressure in the sputter plasma was set as 30 mTorr and the sputter power was maintained at 200 W. For durability studies, cyclic voltammetry data were recorded for up to 500 cycles between 2.0 and 4.0 V versus Li/Li+ at a scan rate of 20 mV s-1. High oxygen to argon gas ratio was found to have a positive effect on the EC properties of the films. When the long-term performance of the films was examined, it was seen that all the samples displayed a slow decline of the colored-state transmittance due to ion accumulation in the host material. After 500 color-bleach cycles, the maximum optical transmittance modulation between colored and bleached states at a wavelength of 528 nm was 63.6% when the oxygen to argon gas-flow ratio was 0.90.
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