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Sökning: WFRF:(Iyer V) > Chalmers tekniska högskola

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1.
  • 2019
  • Tidskriftsartikel (refereegranskat)
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2.
  • Beal, Jacob, et al. (författare)
  • Robust estimation of bacterial cell count from optical density
  • 2020
  • Ingår i: Communications Biology. - : Springer Science and Business Media LLC. - 2399-3642. ; 3:1
  • Tidskriftsartikel (refereegranskat)abstract
    • Optical density (OD) is widely used to estimate the density of cells in liquid culture, but cannot be compared between instruments without a standardized calibration protocol and is challenging to relate to actual cell count. We address this with an interlaboratory study comparing three simple, low-cost, and highly accessible OD calibration protocols across 244 laboratories, applied to eight strains of constitutive GFP-expressing E. coli. Based on our results, we recommend calibrating OD to estimated cell count using serial dilution of silica microspheres, which produces highly precise calibration (95.5% of residuals <1.2-fold), is easily assessed for quality control, also assesses instrument effective linear range, and can be combined with fluorescence calibration to obtain units of Molecules of Equivalent Fluorescein (MEFL) per cell, allowing direct comparison and data fusion with flow cytometry measurements: in our study, fluorescence per cell measurements showed only a 1.07-fold mean difference between plate reader and flow cytometry data.
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3.
  • Qiu, Ren, 1993, et al. (författare)
  • Effects of gas flow on detailed microstructure inhomogeneities in LPCVD TiAlN nanolamella coatings
  • 2020
  • Ingår i: Materialia. - : Elsevier BV. - 2589-1529. ; 9
  • Tidskriftsartikel (refereegranskat)abstract
    • Depositing homogeneous TiAlN coatings with a high Al content on cutting tool inserts is a challenging task. In this work, high-Al cubic Ti1-xAlxN coatings (average x = 0.8) with periodic Ti(Al)N (x = 0.5) and Al(Ti)N (x = 0.9) nanolamellae structure were synthesized by low pressure chemical vapour deposition (LPCVD) with different gas flow velocities, and the detailed microstructure was investigated by electron microscopy and simulations. Using a high gas flow rate, the columnar TiAlN grains with regular periodic nanolamella structures disappeared, the coating became enriched in Ti and hexagonal AlN (h-AlN) formed in the coating. The high Ti content is suggested to be caused by the high gas flow rate that increases the mass transport of the reactants. However, this does not influence the Al-deposition much as it is mainly limited by the surface kinetics due to the relatively low deposition temperature. Density functional theory (DFT) modelling and electron microscopy showed that h-AlN tends to form on the Ti(Al)N phase with a specific crystallographic orientation relationship. The Ti enrichment due to high gas flow rate promotes the formation of h-AlN, which therefore deteriorates the nanolamella structure and causes the disappearance of the columnar TiAlN grains. Thus, by designing the CVD process conditions to avoid too high gas flow rates, homogenous TiAlN coatings with high Al content and nanolamella structures can be deposited, which should yield superior cutting performance.
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  • Resultat 1-3 av 3

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