| 1. |
- Ahuja, Rajeev, et al.
(författare)
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Optical properties of 4H-SiC
- 2002
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Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 91:4, s. 2099-2103
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Tidskriftsartikel (refereegranskat)abstract
- The optical band gap energy and the dielectric functions of n-type 4H-SiC have been investigated experimentally by transmission spectroscopy and spectroscopic ellipsometry and theoretically by an ab initio full-potential linear muffin-tin-orbital method. We present the real and imaginary parts of the dielectric functions, resolved into the transverse and longitudinal photon moment a, and we show that the anisotropy is small in 4H-SiC. The measurements and the calculations fall closely together in a wide range of energies.
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| 2. |
- Broitman, E., et al.
(författare)
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Electrical and optical properties of CNx(0=x=0.25) films deposited by reactive magnetron sputtering
- 2001
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Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 89:2, s. 1184-1190
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Tidskriftsartikel (refereegranskat)abstract
- The electrical and optical properties of carbon-nitride CNx films (O=x=0.25) deposited by unbalanced reactive magnetron sputtering from a graphite target in mixed Ar/N2 discharges at a substrate temperature of 350°C have been investigated. Pure C films exhibit a dark conductivity at room temperature of 250 O-1 cm-1, which grows up to 250 O-1 cm-1 for CNx films with N content of 20%. For CNx films, temperature-dependent conductivity measurements suggest that two electron conduction processes exist in the investigated temperature range 130
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| 3. |
- Johansson, Å. A., et al.
(författare)
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Intrinsic, n- and p-doped a-Si:H thin films grown by DC magnetron sputtering with doped targets
- 1999
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Ingår i: Materials Research Society Symposium Proceedings. - 0272-9172 .- 1946-4274. ; 557, s. 31-36
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Tidskriftsartikel (refereegranskat)abstract
- Intrinsic, n- and p-type a-Si:H films were deposited by dc magnetron sputtering and analyzed with several techniques. The films were synthesized in a reactive Ar-Ha atmosphere giving H contents in the range of 3-20 at %. The films were sputtered from pure silicon targets and doped silicon targets with 1 at % B or P. Doping by co-sputtering from composite Si/B4C targets was also explored. The doping concentrations were 3 × 1020 - 2 × 1021 cm-3 for the p-type films and 2.6-2.9 × 1019cm-3 for the n-type films. The conductivity was in the range lO'MO"4 cm-1 for p-doped films and 10-5 Cl cm-1 for the best n-doped films. Band gap estimations were obtained from dielectric function data and showed an increase with hydrogen content. A comparison to device quality PECVD-samples was also made.
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