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Sökning: WFRF:(Magnus Fridrik) > Teknik

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1.
  • Meshkian, Rahele, et al. (författare)
  • A magnetic atomic laminate from thin film synthesis: (Mo0.5Mn0.5)2GaC
  • 2015
  • Ingår i: APL Materials. - : American Institute of Physics (AIP): Open Access Journals / AIP Publishing LLC. - 2166-532X. ; 3:7
  • Tidskriftsartikel (refereegranskat)abstract
    • We present synthesis and characterization of a new magnetic atomic laminate: (Mo0.5Mn0.5)(2)GaC. High quality crystalline films were synthesized on MgO(111) substrates at a temperature of similar to 530 degrees C. The films display a magnetic response, evaluated by vibrating sample magnetometry, in a temperature range 3-300 K and in a field up to 5 T. The response ranges from ferromagnetic to paramagnetic with change in temperature, with an acquired 5T-moment and remanent moment at 3 K of 0.66 and 0.35 mu(B) per metal atom (Mo and Mn), respectively. The remanent moment and the coercive field (0.06 T) exceed all values reported to date for the family of magnetic laminates based on so called MAX phases.
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4.
  • Magnus, Fridrik, et al. (författare)
  • Current-voltage-time characteristics of the reactive Ar/N2 high power impulse magnetron sputtering discharge
  • 2011
  • Ingår i: Journal of Applied Physics. - : American Institute of Physics (AIP). - 0021-8979 .- 1089-7550. ; 110:8
  • Tidskriftsartikel (refereegranskat)abstract
    • The discharge current and voltage waveforms have been measured in a reactive high power impulse magnetron sputtering (HiPIMS) Ar/N2" role="presentation">N2 discharge with a Ti target for 400 μs" role="presentation">μs long pulses. We observe that the current waveform in the reactive Ar/N2" role="presentation">N2 HiPIMS discharge is highly dependent on the pulse repetition frequency, unlike the non-reactive Ar discharge. The current is found to increase significantly as the frequency is lowered. This is attributed to an increase in the secondary electron emission yield during the self-sputtering phase, when the nitride forms on the target at low frequencies. In addition, self-sputtering runaway occurs at lower discharge voltages when nitrogen is added to the discharge. This illustrates the crucial role of self-sputtering in the behavior of the reactive HiPIMS discharge.
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  • Resultat 1-4 av 4

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