| 1. |
- Maximov, Ivan, et al.
(författare)
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Nanoimprint technology for fabrication of three-terminal ballistic junction devices in GaInAs/InP
- 2003
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Ingår i: Microelectronic Engineering. - 1873-5568. ; 67-8, s. 196-202
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Tidskriftsartikel (refereegranskat)abstract
- We present processing technology based on nanoimprint lithography (NIL) and wet etching for fabrication of GaInAs/InP three-terminal ballistic junction (TBJ) devices. To transfer sub-100 nm features into a high-mobility InP-based 2DEG material, we used SiO2/Si stamps made with electron beam lithography and reactive ion etching. After the NIL, the resist residues are removed in oxygen plasma followed by wet etching of GaInAs/InP to define the M-structures. Fabricated TBJ-devices are characterized using scanning electron microscopy and electron transport measurements. Highly non-linear electrical characteristics of the TBJ structures are demonstrated and compared with E-beam defined devices. (C) 2003 Elsevier Science B.V. All rights reserved.
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| 2. |
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| 3. |
- Beck, Marc, et al.
(författare)
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Improving stamps for 10 nm level wafer scale nanoimprint lithography
- 2002
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Ingår i: Microelectronic Engineering. - 1873-5568. ; 61-2, s. 441-448
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Tidskriftsartikel (refereegranskat)abstract
- The smaller the features on the stamp the more important are the interactions between stamp and polymer layer. A stamp rich in small structures will effectively show a surface area enlargement, which generally leads to adhesion of the polymer to the stamp. This makes a subsequent imprint impossible without troublesome and time-consuming cleaning. The anti-adhesion properties of Si- or SiO2-based stamps can be improved by binding fluorinated silanes covalently to the surface. In this paper, we demonstrate that the deposition procedure as well as the environment during deposition are important with respect to the quality and performance of the molecular layer. (C) 2002 Published by Elsevier Science B.V.
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| 4. |
- Beck, Marc, et al.
(författare)
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Nanoelectrochemical transducers for (bio-) chemical sensor applications fabricated by nanoimprint lithography
- 2004
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Ingår i: Microelectronic Engineering. - 1873-5568. ; 73-74, s. 837-842
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Tidskriftsartikel (refereegranskat)abstract
- Nanometer-structured transducers for commercial use in pharmaceutical, medical or (bio-) chemical analysis have so far been hardly accessible since they could not be produced by parallel lithography techniques at reasonable costs. We introduce here a method on. how to fabricate nanometer-structured interdigitated array electrodes including interconnections and bond pads in the micrometer range in a single imprint step on 2-in. wafer scale. The method enables the mass production of those devices at lowest cost opening a new field for the commercial use of nanometer-structured sensor systems.
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| 5. |
- Carlberg, Patrick, et al.
(författare)
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Lift-off process for nanoimprint lithography
- 2003
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Ingår i: Microelectronic Engineering. - 1873-5568 .- 0167-9317. ; 67-8, s. 203-207
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Konferensbidrag (refereegranskat)abstract
- We report a novel a lift-off method for nanoimprint lithography. This is a bi-layer method, using a polymethyl methacrylate (PMMA) on lift-off layer (LOL) resist scheme. For the imprint step, direct evidence for good pattern transfer down to 20 nm is shown. Oxygen plasma ashing is required to remove residual PMMA. A liquid solvent, MF 319, is used to transfer the pattern down to the silicon. The LOL is dissolved isotropically while the PMMA is unaffected. Ashing time can kept to a minimum through the wet etch method. This reduces the line widening effect. After metal evaporation a two-step lift-off process prevents metal flakes from adhering to the surface electrostatically. At first warm acetone breakes apart the metal layer and dissolves the PMMA, then warm Remover S-1165 removes the LOL and remaining metal. Structures of lines down to 50 nm and dots with a diameter of sub 20 nm are presented.
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| 6. |
- Carlberg, Patrick, et al.
(författare)
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Nanoimprint in mr-L 6000.1 XP/PMMA resist system
- 2002
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Ingår i: 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science.
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Konferensbidrag (refereegranskat)abstract
- Use of the new resist system mr-L 6000.1 XP in combination with PMMA is demonstrated to give sub-100 nm resolution in nanoimprint lithography. Low glass transition temperature in combination with high plasma stability makes this resist suitable for achieving desirable resist profiles after the imprint process. Imprint conditions for mr-L 6000.1 XP/PMMA resist system as well as imprint results are described and discussed
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| 7. |
- Ehn, Andreas, et al.
(författare)
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Electrochemical Investigation of Nickel Pattern Electrodes in H-2/H2O and CO/CO2 Atmospheres
- 2010
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Ingår i: Journal of the Electrochemical Society. - : The Electrochemical Society. - 0013-4651. ; 157:11, s. 1588-1596
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Tidskriftsartikel (refereegranskat)abstract
- In this study, nickel pattern electrodes were electrochemically investigated in a three-electrode setup, operating both with H-2/H2O and CO/CO2 atmospheres. Heating introduced structural differences in the nickel layer among the pattern electrodes, which appear to affect the electrode performance. Both dense and porous nickel pattern electrodes were formed by heating. Holes appeared in the nickel layer of the porous pattern electrodes, where the open cavity triple phase boundaries exhibited different limiting processes than open triple phase boundary electrodes of the dense electrode. As the temperature was raised in the experiment, the electrodes stabilized, with a degraded behavior that seemed to be strongly coupled to the structural changes in the electrode. It was possible to compare literature results with high temperature impedance measurements in H-2/H2O presented here, while new results at lower temperatures in H-2/H2O are also presented. Impedance spectroscopy measurements were performed, and the gas dependence of the polarization resistance was observed as the mixture ratios and temperatures were varied in both atmospheres. A positive relation between the polarization resistance and the partial pressure of CO was determined for the dense nickel pattern electrode, which agrees with previous results using nickel point electrodes. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3484091] All rights reserved.
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| 8. |
- Keil, M, et al.
(författare)
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Development and characterization of silane antisticking layers on nickel-based stamps designed for nanoimprint lithography
- 2005
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Ingår i: Journal of Vacuum Science and Technology B. - : American Vacuum Society. - 1520-8567. ; 23:2, s. 575-584
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Tidskriftsartikel (refereegranskat)abstract
- In this study we will report on the development of a process to establish antisticking layers on nickel-based stamps, which are used in several industrial applications of nanoimprint lithography or related methods. The fluorinated alkyl silane films have been deposited onto different Ni-based stamp surfaces in order to minimize the adhesion tendency at the stamp/polymer interface. film thickness, chemical composition, purity, and binding mechanisms of the silane groups to different stamp surface materials have been determined by photoelectron spectroscopy (XPS). In the case of electroplated nickel stamps-where low imprint qualities are observed-multilayer thick films cover, the stamp surfaces, consisting of polymerized, cross-linked alkyl silanes, which are poorly bound to the surface. In order to overcome these restrictions a. 100 angstrom thick polycrystalline titanium layer has been established in a sandwich position between the nickel substrate and the silane film. Here, silane film thicknesses in the monomolecular region together with evidences for strong covalent linkage between the silane groups and the oxidized Ti surface can be concluded from the XPS results, leading to film properties and imprint qualities, which are comparable to those formerly observed for silicon stamps.
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| 10. |
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