| 1. |
- Bruzzi, M, et al.
(författare)
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Radiation-hard semiconductor detectors for SuperLHC
- 2005
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Ingår i: Nuclear Instruments & Methods in Physics Research. Section A: Accelerators, Spectrometers, Detectors, and Associated Equipment. - : Elsevier BV. - 0167-5087 .- 0168-9002. ; 541:1-2, s. 189-201
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Tidskriftsartikel (refereegranskat)abstract
- An option of increasing the luminosity of the Large Hadron Collider (LHC) at CERN to 1035 cm-2 s-1 has been envisaged to extend the physics reach of the machine. An efficient tracking down to a few centimetres from the interaction point will be required to exploit the physics potential of the upgraded LHC. As a consequence, the semiconductor detectors close to the interaction region will receive severe doses of fast hadron irradiation and the inner tracker detectors will need to survive fast hadron fluences of up to above 1016cm-2. The CERN-RD50 project "Development of Radiation Hard Semiconductor Devices for Very High Luminosity Colliders" has been established in 2002 to explore detector materials and technologies that will allow to operate devices up to, or beyond, this limit. The strategies followed by RD50 to enhance the radiation tolerance include the development of new or defect engineered detector materials (SiC, GaN, Czochralski and epitaxial silicon, oxygen enriched Float Zone silicon), the improvement of present detector designs and the understanding of the microscopic defects causing the degradation of the irradiated detectors. The latest advancements within the RD50 collaboration on radiation hard semiconductor detectors will be reviewed and discussed in this work.
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| 2. |
- Buyanova, Irina, 1960-, et al.
(författare)
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Optical and electrical characterization of (Ga,Mn)N/InGaN multiquantum well light-emitting diodes
- 2004
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Ingår i: Journal of Electronic Materials. - : Springer Science and Business Media LLC. - 0361-5235 .- 1543-186X. ; 33:5, s. 467-471
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Tidskriftsartikel (refereegranskat)abstract
- (Ga,Mn)/N/InGaN multiquantum well (MQW) diodes were grown by molecular beam epitaxy (MBE). The current-voltage characteristics of the diodes show the presence of a parasitic junction between the (Ga,Mn)N and the n-GaN in the top contact layer due to the low conductivity of the former layer. Both the (Ga,Mn)N/InGaN diodes and control samples without Mn doping show no or very low (up to 10% at the lowest temperatures) optical (spin) polarization at zero field or 5 T, respectively. The observed polarization is shown to correspond to the intrinsic optical polarization of the InGaN MQW, due to population distribution between spin sublevels at low temperature, as separately studied by resonant optical excitation with a photon energy lower than the bandgap of both the GaN and (Ga,Mn)N. This indicates efficient losses in the studied structures of any spin polarization generated by optical spin orientation or electrical spin injection. The observed vanishing spin injection efficiency of the spin light-emitting diode (LED) is tentatively attributed to spin losses during the energy relaxation process to the ground state of the excitons giving rise to the light emission.
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| 3. |
- Storasta, Liutauras, et al.
(författare)
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Deep levels created by low energy electron Irradiation in 4H-SiC
- 2004
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Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 96:9, s. 4909-4915
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Tidskriftsartikel (refereegranskat)abstract
- With low energy electron irradiation in the 80-250 keV range, we were able to create only those intrinsic defects related to the initial displacements of carbon atoms in the silicon carbide lattice. Radiation induced majority and minority carrier traps were analyzed using capacitance transient techniques. Four electron traps (EH1, Z1/Z2, EH3, and EH7) and one hole trap (HS2) were detected in the measured temperature range. Their concentrations show linear increase with the irradiation dose, indicating that no divacancies or di-interstitials are generated. None of the observed defects was found to be an intrinsic defect-impurity complex. The energy dependence of the defect introduction rates and annealing behavior are presented and possible microscopic models for the defects are discussed. No further defects were detected for electron energies above the previously assigned threshold for the displacement of the silicon atom at 250 keV. © 2004 American Institute of Physics. 10.1063/1.1778819.
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| 4. |
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| 5. |
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| 6. |
- Forsberg, Urban, 1971-, et al.
(författare)
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Growth and characterisation 4H-SiC MESFET structures grown by Hot-Wall CVD
- 2001
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Ingår i: Proc. of the MRS 2000 Fall Meeting. ; , s. H2.3.2-
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Konferensbidrag (refereegranskat)abstract
- Metal semiconductor field effect transistor structures have been grown in a hot-wall CVD reactor. Using trimethylaluminium and nitrogen, p- and n-type epitaxial layers were grown on semi insulating substrates. A comprehensive characterization study of thickness and doping of these multi structures has been performed by using scanning electron microscopy , secondary ion mass spectrometry, capacitance-voltage and low temperature photoluminescence. Optimisation of growth parameters has resulted in very abrupt doping profiles. The grown metal semiconductor field effect transistor structures have been processed and parts of the transistor properties are presented.
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| 7. |
- Forsberg, U., et al.
(författare)
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Growth and characterisation of 4H-SiC MESFET structures grown by hot-wall CVD
- 2001
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Ingår i: Materials Research Society Symposium - Proceedings. - Boston, MA. ; , s. H2.3.1-H2.3.6
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Konferensbidrag (refereegranskat)abstract
- Metal semiconductor field effect transistor, MESFET, structures have been grown in a hot-wall CVD reactor. Using trimethylaluminium and nitrogen as dopant sources, p- and n-type epitaxial layers were grown on semi insulating substrates. A comprehensive characterization study of thickness and doping of these structures has been performed by using scanning electron microscopy, secondary ion mass spectrometry, capacitance-voltage measurements. Each technique is discussed concerning its advantage and disadvantage. Some transistor properties of MESFETs processed on the grown material are presented.
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| 8. |
- Ivanov, Ivan Gueorguiev, et al.
(författare)
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Photoconductivity of lightly-doped and semi-insulating 4H-SiC and the free exciton binding energy
- 2002
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Ingår i: Materials Science Forum, Vols. 389-393. ; , s. 613-616
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Konferensbidrag (refereegranskat)abstract
- The paper presents a study of the structure of the photoconductivity spectra of various 4H-SiC samples near the absorption edge. By means of comparison of the spectra of low doped (mid 10(14) cm(-3)), very low doped (in 10(13) cm(-3) range), and semi-insulating moderately doped samples, features in the photocurrent due to contribution from creation of free carriers (i.e., excitons in the continuum) can be recognised. This is used for determination of the free exciton binding energy, 20.5 +/- 1 meV, in agreement with a previous study. The second lowest conduction band and the spin-orbit split off valence band are also detected.
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| 9. |
- Kakanakova-Georgieva, Anelia, 1970-, et al.
(författare)
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Characteristics of boron in 4H-SiC layers produced by high-temperature techniques
- 2002
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Ingår i: Materials Science Forum, Vols. 389-393. ; , s. 259-262
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Konferensbidrag (refereegranskat)abstract
- Characteristics of boron in as-grown 4H-SiC layers produced by fast epitaxy, i.e. sublimation and vertical hot-wall CVD, were studied by electrical and optical measurements. The boron-related contribution to the net acceptor concentration in the layers (as determined by CV on p-type residual doped sublimation epitaxy layers), the presence of deep boron centers (as indicated by DLTS) and boron-related "green" emission at similar to 505 nm (as observed by CL) are detected for various growth temperatures and C/Si ratios. The results are discussed in relation with the C vacancies in the lattice that may be affected by growth rate and input C/Si ratio in the CVD process.
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| 10. |
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