Implantation of anatase thin film with 100 keV 56Fe ions : Damage formation and magnetic behaviour

• We have investigated the damage morphology and magnetic properties of titanium dioxide thin films following implantation with Fe ions. The titanium dioxide films, having a polycrystalline anatase structure, were implanted with 100 keV 56Fe+ ions to a total fluence of 1.3 × 1016 ions/cm2. The ion bombardment leads to an amorphized surface with no indication of the presence of secondary phases or Fe clusters. The ion-beam induced damage manifested itself by a marked change in surface morphology and film thickness. A room temperature ferromagnetic behaviour was observed by SQUID in the implanted sample. It is believed that the ion-beam induced damage and defects in the polycrystalline anatase film were partly responsible for the observed magnetic response.

Nyckelord

Ion implantation

Magnetic semiconductors

Fe-doping

Titanium dioxide

Anatase

Magnetron sputtering

TECHNOLOGY

TEKNIKVETENSKAP

Publikations- och innehållstyp

ref (ämneskategori)

art (ämneskategori)