| 1. |
- Song, Jun, et al.
(författare)
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Analysis method of the effect of fabrication errors on a planar waveguide demultiplexer
- 2006
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Ingår i: Optical and quantum electronics. - : Springer Science and Business Media LLC. - 0306-8919 .- 1572-817X. ; 38:15, s. 1203-1216
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Tidskriftsartikel (refereegranskat)abstract
- The impact of fabrication errors on a planar waveguide demultiplexer is analyzed based on an analytical method. The explicit expression of the transfer function taking into account phase and amplitude errors is presented in order to analyze the loss and crosstalk of the demultiplexer caused by fabrication errors. A basic requirement for the demultiplexer with a certain crosstalk criterion can be easily obtained. Using an etched diffraction grating demultiplexer as an example, it is shown that the analytical results have a good agreement with results from a numerical method.
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| 2. |
- Song, Jun, et al.
(författare)
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Design and fabrication of compact etched diffraction grating demultiplexers based on alpha-Si nanowire technology
- 2008
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Ingår i: Electronics Letters. - : Institution of Engineering and Technology (IET). - 0013-5194 .- 1350-911X. ; 44:13, s. 816-818
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Tidskriftsartikel (refereegranskat)abstract
- alpha-Silicon nanowire waveguides and related techniques are studied. An ultra-compact etched diffraction grating demultiplexer with 10 nm spacing is fabricated and characterised. The dimension of the device is around half a millimetre, which is one to two orders of magnitude smaller than conventional silica based devices.
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| 3. |
- Song, Jun, et al.
(författare)
-
Design and fabrication of compact etched diffraction grating demultiplexers based on α-Si nanowire technology
- 2008
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Ingår i: 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS. - 9781424419180 ; , s. 148-149
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Konferensbidrag (refereegranskat)abstract
- Silicon nanowire waveguides and related etched diffraction grating (EDG) demultiplexers are studied by α-Si-on-SiO2 technology. Compact EDG demultiplexers with 10 run spacing for both echelle and total-internal- reflection (TIR) facets have been fabricated and characterized.
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| 4. |
- Song, Jun, et al.
(författare)
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Echelle grating demultiplexers with reduced return loss by using chirped diffraction order design
- 2006
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Ingår i: IEEE Photonics Technology Letters. - 1041-1135 .- 1941-0174. ; 18:14, s. 1506-1508
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Tidskriftsartikel (refereegranskat)abstract
- A design for echelle grating demultiplexers is presented to reduce the return loss. The input waveguide is placed on the minimal intensity position of the diffraction envelope. Then, by further chirping the diffraction order for each facet, we minimize the envelope intensity for other adjacent diffraction orders, which can contribute to a negligible return loss for a large spectral width. The present design is appropriate for multifrequency laser or multistage demultiplexer applications.
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| 5. |
- Song, Jun, et al.
(författare)
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Effects of surface roughness on the performance of an etched diffraction grating demultiplexer
- 2006
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Ingår i: Journal of the Optical Society of America A: Optics and Image Science, and Vision. - 1084-7529. ; 23:3, s. 646-650
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Tidskriftsartikel (refereegranskat)abstract
- The fabrication tolerance of surface roughness on the performance [such as the insertion loss, the polarization-dependent loss (PDL), and the chromatic dispersion] of an etched diffraction grating demultiplexer is analyzed by using an accurate method of moments. The results show that both the insertion loss and the chromatic dispersion rapidly increase as the roughness of the grating facets increases. Appropriate residual roughness of the shaded facets can reduce the PDL of the demultiplexer, and the mechanism for the existence of an optimal residual roughness is explained.
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| 6. |
- Song, Jun, et al.
(författare)
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Etched diffraction grating demultiplexers with large free-spectral range and large grating facets
- 2006
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Ingår i: IEEE Photonics Technology Letters. - 1041-1135 .- 1941-0174. ; 18:24, s. 2695-2697
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Tidskriftsartikel (refereegranskat)abstract
- A design for etched diffraction grating demultiplexers is presented to obtain both large grating facets and a larger free-spectral range (FSR) using the optimal chirped diffraction orders for different facets. The large grating facets by using a large diffraction order contribute to lowering the manufacturing difficulty, and can provide lower polarization-dependent loss. However, usually the large diffraction order must lower the FSR of the device by all means. Based on the present design, the FSR can overlay the whole diffraction envelop for a special order, but avoid the influence of the adjacent diffraction envelops. Calculations indicate that the extinction ratio between the operated order and adjacent orders can attain a 35 dB or so, which makes the crosstalk from channels in adjacent envelops to those in the operated diffraction envelop acceptable.
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| 7. |
- Song, Jun, et al.
(författare)
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High Sensitive Gas Sensor Application Based on a Small Defect in Silicon Waveguide
- 2009
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Ingår i: IEEE Photonics Technology Letters. - 1041-1135 .- 1941-0174. ; 21:1-4, s. 82-84
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Tidskriftsartikel (refereegranskat)abstract
- A small defect in silicon nanowire waveguides is applied for gas sensors. Small defects with some special shapes and indexes can produce strong resonances with the incident light and induce large loss. Since the silicon waveguide has air cladding, the position of resonant peaks will be sensitive for the variation of the ambient air composition. The sensor based on the principle has a high sensitivity. As an example, we monitored the change of the position of the resonance peak as a function of alcohol concentrations in air. Results showed that a similar to 5-mg/L ethanol vapor in the air can result in a similar to 20-nm wavelength shift of the resonance.
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| 8. |
- Song, Jun, et al.
(författare)
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Sidelobe suppression design of etched diffraction grating demultiplexers using optimized air trenches in front of each output waveguide
- 2006
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Ingår i: Journal of the Optical Society of America A: Optics and Image Science, and Vision. - 1084-7529. ; 23:10, s. 2645-2649
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Tidskriftsartikel (refereegranskat)abstract
- An etched diffraction grating (EDG) demultiplexer with high sidelobe suppression is designed. Sidelobes resulting from two adjacent wavelengths are suppressed by etching two optimized rectangular air trenches in front of each output waveguide that can induce large resonance loss in the adjacent wavelength but have little influence on the operational wavelength. The designed EDG demultiplexer can suppress crosstalk to less than 50 dB in theory.
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| 9. |
- Zhu, Ning, et al.
(författare)
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Cross-Order Echelle Grating Triplexer Based on Amorphous Silicon Nanowire Platform
- 2008
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Ingår i: 2008 7TH INTERNATIONAL CONFERENCE ON THE OPTICAL INTERNET (COIN). - NEW YORK : IEEE. - 9784885522307 ; , s. 37-38
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Konferensbidrag (refereegranskat)abstract
- We present fabrication and measurement results of an ultracompact silicon-on-insulator-based echelle-grating triplexer, which uses different diffraction orders to cover a large spectral range from 1.3 mu m to 1.5 mu m, with a footprint of 150 mu m x 200 mu m.
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| 10. |
- Zhu, Ning, et al.
(författare)
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Design of a polarization-insensitive echelle grating demultiplexer based on silicon nanophotonic wires
- 2008
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Ingår i: IEEE Photonics Technology Letters. - : Institute of Electrical and Electronics Engineers (IEEE). - 1041-1135 .- 1941-0174. ; 20:9-12, s. 860-862
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Tidskriftsartikel (refereegranskat)abstract
- A polarization-insensitive design of an echelle grating (or etched diffraction grating) demultiplexer based on silicon nanowires is proposed in the present letter, by introducing a polarization compensation area in its free propagation region. The polarization-dependent wavelength shift of the present device has been compensated at the whole spectral range. For a design with nine channels and 10-nm channel spacing, when the wavelength shift at the central channel 1550 nm is. completely compensated, the wavelength shifts of the two edge channels are only 0.14 and 0.15 nm, which are acceptable.
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