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| 2. |
- Ayedh, H. M., et al.
(författare)
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Controlling the carbon vacancy in 4H-SiC by thermal processing
- 2018
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Ingår i: ECS Transactions. - : Electrochemical Society Inc.. - 1938-6737 .- 1938-5862. ; , s. 91-97
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Konferensbidrag (refereegranskat)abstract
- The carbon vacancy (Vc) is perhaps the most prominent point defect in silicon carbide (SiC) and it is an efficient charge carrier lifetime killer in high-purity epitaxial layers of 4H-SÌC. The Vc concentration needs to be controlled and minimized for optimum materials and device performance, and an approach based on post-growth thermal processing under C-rich ambient conditions is presented. It utilizes thermodynamic equilibration and after heat treatment at 1500 °C for 1 h, the Vc concentration is shown to be reduced by a factor-25 relative to that in as-grown state-of-the-art epi-layers. Concurrently, a considerable enhancement of the carrier lifetime occurs throughout the whole of >40 urn thick epi-layers.
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| 3. |
- Bergman, Peder, 1961-, et al.
(författare)
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Improved SiC Epitaxial Material for Bipolar Applications
- 2008
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Ingår i: Proc. of MRS Spring Meeting 2008. ; , s. D05-
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Konferensbidrag (refereegranskat)abstract
- Epitaxial growth on Si-face nominally on-axis 4H-SiC substrates has been performed using horizontal Hot-wall chemical vapor deposition system. The formation of 3C inclusions is one of the main problem with growth on on-axis Si-face substrates. In situ surface preparation, starting growth parameters and growth temperature are found to play a vital role in the epilayer polytype stability. High quality epilayers with 100% 4H-SiC were obtained on full 2″ substrates. Different optical and structural techniques were used to characterize the material and to understand the growth mechanisms. It was found that the replication of the basal plane dislocation from the substrate into the epilayer can be eliminated through growth on on-axis substrates. Also, no other kind of structural defects were found in the grown epilayers. These layers have also been processed for simple PiN structures to observe any bipolar degradation. More than 70% of the diodes showed no forward voltage drift during 30 min operation at 100 A/cm2.
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| 4. |
- Bernardin, Evans, et al.
(författare)
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Development of an all-SiC neuronal interface device
- 2016
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Ingår i: MRS Advances. - : Cambridge University Press. - 2059-8521. ; 1:55, s. 3679-3684
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Tidskriftsartikel (refereegranskat)abstract
- The intracortical neural interface (INI) is a key component of brain machine interfaces (BMI) which offer the possibility to restore functions lost by patients due to severe trauma to the central or peripheral nervous system. Unfortunately today’s neural electrodes suffer from a variety of design flaws, mainly the use of non-biocompatible materials based on Si or W with polymer coatings to mask the underlying material. Silicon carbide (SiC) is a semiconductor that has been proven to be highly biocompatible, and this chemically inert, physically robust material system may provide the longevity and reliability needed for the INI community. The design, fabrication, and preliminary testing of a prototype all-SiC planar microelectrode array based on 4H-SiC with an amorphous silicon carbide (a-SiC) insulator is described. The fabrication of the planar microelectrode was performed utilizing a series of conventional micromachining steps. Preliminary data is presented which shows a proof of concept for an all-SiC microelectrode device.
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| 5. |
- Brosselard, P., et al.
(författare)
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3.3 kV-10A 4H-SiC PiN diodes
- 2009
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Ingår i: Materials Science Forum, Vols. 600-603. - : Trans Tech Publ.. ; , s. 991-994
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Konferensbidrag (refereegranskat)abstract
- An innovative process has been developed by Linköping University to prepare the 4HSiC substrate surface before epitaxial growth. The processed PiN diodes have been characterized in forward and reverse mode at different temperature. The larger diodes (2.56 mm2) have a very low leakage current around 20 nA @ 500V for temperatures up to 300°C. A performant yield (68%) was obtained on these larger diodes have a breakdown voltage superior to 500V. Electroluminescence characteristics have been done on these devices and they show that there is no generation of Stacking Faults during the bipolar conduction.
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| 6. |
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| 7. |
- Ghezellou, Misagh, 1988-, et al.
(författare)
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Influence of Different Hydrocarbons on Chemical Vapor Deposition Growth and Surface Morphological Defects in 4H‐SiC Epitaxial Layers
- 2024
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Ingår i: Physica status solidi. B, Basic research. - : WILEY-V C H VERLAG GMBH. - 0370-1972 .- 1521-3951.
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Tidskriftsartikel (refereegranskat)abstract
- Controlled epitaxial growth of 4H-SiC is essential for advancing both power electronics and quantum technologies. This study explores how different carbon sources—methane and propane—affect the surface morphology of these epitaxial layers. By varying C/Si ratios and using the two mentioned hydrocarbons as the carbon source in chloride-based epitaxial growth of 4H-SiC layers, it is unveiled that methane results in an exceptionally smooth surface. However, it pronounces surface irregularities such as short step bunching and dislocation-related etch pits. Moreover, methane amplifies the overgrowth of triangular defects with the 4H polytype. In contrast, the introduction of propane causes a step-bunched surface together with inclined line-like surface morphological defects. Notably, a majority of the triangular defects exhibit a pure 3C character without an overgrown 4H polytype. It is shown that these outcomes could be attributed to different sticking coefficients and diffusivity of the molecular species resulting from different carbon sources on the 4H-SiC surface during the epitaxial growth. This research also uncovers the underlying origins and mechanisms responsible for various surface morphological defects.
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| 8. |
- Ghezellou, Misagh, 1988-, et al.
(författare)
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The role of boron related defects in limiting charge carrier lifetime in 4H–SiC epitaxial layers
- 2023
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Ingår i: APL Materials. - : American Institute of Physics (AIP). - 2166-532X. ; 11:3
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Tidskriftsartikel (refereegranskat)abstract
- One of the main challenges in realizing 4H–SiC (silicon carbide)-based bipolar devices is the improvement of minority carrier lifetime in as-grown epitaxial layers. Although Z1/2 has been identified as the dominant carrier lifetime limiting defect, we report on B-related centers being another dominant source of recombination and acting as lifetime limiting defects in 4H–SiC epitaxial layers. Combining time-resolved photoluminescence (TRPL) measurement in near band edge emission and 530 nm, deep level transient spectroscopy, and minority carrier transient spectroscopy (MCTS), it was found that B related deep levels in the lower half of the bandgap are responsible for killing the minority carriers in n-type, 4H–SiC epitaxial layers when the concentration of Z1/2 is already low. The impact of these centers on the charge carrier dynamics is investigated by correlating the MCTS results with temperature-dependent TRPL decay measurements. It is shown that the influence of shallow B acceptors on the minority carrier lifetime becomes neutralized at temperatures above ∼422 K. Instead, the deep B related acceptor level, known as the D-center, remains active until temperatures above ∼570 K. Moreover, a correlation between the deep level concentrations, minority carrier lifetimes, and growth parameters indicates that intentional nitrogen doping hinders the formation of deep B acceptor levels. Furthermore, tuning growth parameters, including growth temperature and C/Si ratio, is shown to be crucial for improving the minority carrier lifetime in as-grown 4H–SiC epitaxial layers.
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| 9. |
- Gogova, Daniela, 1967-, et al.
(författare)
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Epitaxial growth of β-Ga2O3 by hot-wall MOCVD
- 2022
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Ingår i: AIP Advances. - : AIP Publishing. - 2158-3226. ; 12:5
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Tidskriftsartikel (refereegranskat)abstract
- The hot-wall metalorganic chemical vapor deposition (MOCVD) concept, previously shown to enable superior material quality and high performance devices based on wide bandgap semiconductors, such as Ga(Al)N and SiC, has been applied to the epitaxial growth of beta-Ga2O3. Epitaxial beta-Ga2O3 layers at high growth rates (above 1 mu m/h), at low reagent flows, and at reduced growth temperatures (740 degrees C) are demonstrated. A high crystalline quality epitaxial material on a c-plane sapphire substrate is attained as corroborated by a combination of x-ray diffraction, high-resolution scanning transmission electron microscopy, and spectroscopic ellipsometry measurements. The hot-wall MOCVD process is transferred to homoepitaxy, and single-crystalline homoepitaxial beta-Ga2O3 layers are demonstrated with a 201 rocking curve width of 118 arc sec, which is comparable to those of the edge-defined film-fed grown (201) beta-Ga2O3 substrates, indicative of similar dislocation densities for epilayers and substrates. Hence, hot-wall MOCVD is proposed as a prospective growth method to be further explored for the fabrication of beta-Ga2O3.
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| 10. |
- Henry, Anne, 1959-, et al.
(författare)
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Thick epilayers for power devices
- 2007
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Ingår i: Materials Science Forum, vol. 556-557. - : Trans Tech Publications. ; , s. 47-
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Konferensbidrag (refereegranskat)abstract
- Growth of thick epitaxial SiC layers needed for high power devices is presented for horizontal hot-wall CVD (HWCVD) reactors. We demonstrate thickness of epilayer of 100 μm and more with good morphology, low-doping with no doping variation through the whole thick layer and reasonable carrier lifetime which mainly depends on the substrate quality. Typical epidefects are described and their density can dramatically be reduced when choosing correctly the growth conditions as well as the polishing of the surface prior to the growth. The control of the doping and thickness uniformities as well as the run-to-run reproducibility is also presented. Various characterization techniques such as optical microscopy, AFM, reflectance, CV, PL and minority carrier lifetime have been used. Results of high-voltage SiC Schottky power devices are presented.
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