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Träfflista för sökning "WFRF:(Xie Gang) srt2:(2006-2009)"

Sökning: WFRF:(Xie Gang) > (2006-2009)

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1.
  • Iwnicki, Simon, et al. (författare)
  • Advances in vehicle-track interaction tools
  • 2009
  • Ingår i: Railway Gazette International. - 0373-5346. ; 165:9, s. 47-52
  • Forskningsöversikt (övrigt vetenskapligt/konstnärligt)abstract
    • In this article, the authors discuss how computer modeling is enabling researchers to improve their understanding of vehicle-track interaction. This in turn allows for more accurate predictions to be made regarding rail damage on plain lines as well as turn-outs. The authors discuss track interaction models, multi-body system modeling, surface roughness models, and train-turnout interactions. The article concludes with the authors noting that numerous parameters related to design and conditions influence dynamic train-turnout interactions.
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2.
  • Luo, Gang, et al. (författare)
  • Scanning probe lithography for nanoimprinting mould fabrication
  • 2006
  • Ingår i: Nanotechnology. - : IOP Publishing. - 0957-4484 .- 1361-6528. ; 17:12, s. 3018-3022
  • Tidskriftsartikel (refereegranskat)abstract
    • We propose a rational fabrication method for nanoimprinting moulds by scanning probe lithography. By wet chemical etching, different kinds of moulds are realized on Si( 110) and Si( 100) surfaces according to the Si crystalline orientation. The structures have line widths of about 200 nm with a high aspect ratio. By reactive ion etching, moulds with patterns free from the limitation of Si crystalline orientation are also obtained. With closed-loop scan control of a scanning probe microscope, the length of patterned lines is more than 100 mu m by integrating several steps of patterning. The fabrication process is optimized in order to produce a mould pattern with a line width about 10 nm. The structures on the mould are further duplicated into PMMA resists through the nanoimprinting process. The method of combining scanning probe lithography with wet chemical etching or reactive ion etching (RIE) provides a resistless route for the fabrication of nanoimprinting moulds.
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