A liquid-xenon-jet laser-plasma X-ray and EUV source

• We describe a laser-plasma soft-x-ray source based on a cryogenic-xenon liquid-jet target. The source is suitable for extreme ultraviolet (EUV) projection lithography and proximity x-ray lithography (PXL). Absolute calibrated spectra in the 1-2 nm range and uncalibrated spectra in the 9-15 nm range are obtained using a free-standing transmission grating and a CCD-detector.

Nyckelord

droplet-target

generation

debris

lithography

emission

program

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