Dose-rate influence on the defect production in MeV proton-implanted float-zone and epitaxial n-type silicon

• The production of stable vacancy-related point defects in proton-implanted float-zone and epitaxial silicon has been studied in the low dose range ( less than or equal to 10(10)/cm(2)) as a function of dose-rate. The well-known inverse dose-rate effect has been observed in both types of materials with a decrease in the concentration of vacancy-related defects as the dose-rate increases. The effect is less pronounced in oxygen lean epitaxial silicon. Moreover, a continuous decrease of the vacancy-related defect concentration as a function of the flux was measured while a threshold was expected according to previous studies. Both or these results can be explained by a simple calculation, taking into account the influence of the oxygen concentration as well as the influence of the diffusion coefficient of point defects on the inverse dose-rate effect.

Nyckelord

silicon

proton-implantation

dose-rate

DLTS

transient spectroscopy

electron traps

irradiation

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