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Sökning: id:"swepub:oai:DiVA.org:kth-21295" > Retention of neon i...

Retention of neon in graphite after ion beam implantation or exposures to the scrape-off layer plasma in the TEXTOR tokamak

Kim, Y. M. (författare)
Philipps, V. (författare)
Rubel, Marek J. (författare)
KTH,Alfvénlaboratoriet
 (creator_code:org_t)
American Vacuum Society, 2002
2002
Engelska.
Ingår i: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films. - : American Vacuum Society. - 0734-2101 .- 1520-8559. ; 20:1, s. 138-145
  • Tidskriftsartikel (refereegranskat)
Abstract Ämnesord
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  • The interaction of neon ions with graphite was investigated for targets either irradiated with ion beams (2-10 keV range) or exposed to the scrape-off layer plasma in the TEXTOR tokamak during discharges with neon edge cooling. The emphasis was on the influence of the target temperature (300-1200 K) and the implantation dose on the neon retention and reemission. The influence of deuterium impact on the retention of neon implanted into graphite has also been addressed. In ion beam experiments saturation is observed above a certain ion dose with a saturation level, which decreases with increasing target temperature. The temperature dependence of the thermal desorption cot-responds to an apparent binding energy of about 2.06 eV. The retention of neon (C-Ne/C-C) decreases with increasing ion energy with values from 0.55 to 0.15 following irradiation with 2 and 10 keV ions, respectively. The reemission yield during the irradiation increases with target temperature and above 1200 K all impinging ions are reemitted instantaneously. The retention densities measured using the sniffer probe at the TEXTOR tokamak are less than 1% of the total neon fluence and are over one order of magnitude smaller than those observed in ion beam experiments. The results are discussed in terms of different process decisive for ion deposition and release under the two experimental conditions.

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pyrolytic-graphite
high-density
energy
desorption
radiation
carbon

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Kim, Y. M.
Philipps, V.
Rubel, Marek J.
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