Liquid-jet laser-plasma extreme ultraviolet sources : from droplets to filaments

• The laser plasma is one of the major contenders as a high-power source for future high-volume-manufacturing extreme ultraviolet lithography systems. Such laser-plasma sources require a target system that allows high-repetition-rate operation with low debris and manageable thermal load at the required high laser power. In this paper, we review the development of the liquid-jet target laser plasmas, from droplets to filaments, with special emphasis on its applicability for high-power extreme ultraviolet generation. We focus on two target systems, the liquid-xenon-jet and the liquid-tin-jet.

Ämnesord

NATURVETENSKAP  -- Fysik -- Fusion, plasma och rymdfysik (hsv//swe)

NATURAL SCIENCES  -- Physical Sciences -- Fusion, Plasma and Space Physics (hsv//eng)

Nyckelord

x-ray generation

gas puff targets

euv-lithography

debris

emission

radiation

hydrogen

elements

power

tin

Publikations- och innehållstyp

ref (ämneskategori)

art (ämneskategori)