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Manufacturing of Su...
Manufacturing of Sub-20 NM Wide Single Nanowire Devices using Conventional Stepper Lithography
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- Enrico, Alessandro (författare)
- KTH,Mikro- och nanosystemteknik
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- Dubois, Valentin J. (författare)
- KTH,Mikro- och nanosystemteknik
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- Niklaus, Frank, 1971- (författare)
- KTH,Mikro- och nanosystemteknik
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- Stemme, Göran, 1958- (författare)
- KTH,Mikro- och nanosystemteknik
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(creator_code:org_t)
- IEEE conference proceedings, 2019
- 2019
- Engelska.
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Ingår i: Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS). - : IEEE conference proceedings. - 9781728116105 ; , s. 244-247
- Relaterad länk:
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https://ieeexplore.i...
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- Single nanowires have a broad range of applications in chemical and bio-sensing, photonics, and material science, but realizing individual nanowire devices in a scalable manner remains extremely challenging. This work presents a scalable and flexible method to realize single gold nanowire devices. We use conventional optical stepper lithography to generate notched beam structures, and crack lithography to obtain sub-20-nm-wide nanogaps at the notches, thereby obtaining a suitable shadow mask to define a single nanowire device. Then a gold evaporation step through the shadow mask forms the individual gold nanowires with positional and dimensional accuracy and with electrical contacts to probing pads.
Ämnesord
- TEKNIK OCH TEKNOLOGIER -- Nanoteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Nano-technology (hsv//eng)
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- kon (ämneskategori)
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