Supercritical drying for high aspect-ratio HSQ nano-structures

• The benefits of supercritical resist drying (SRD) technique using carbon dioxide (CO2) are investigated with respect to the resolution of dense patterns and the aspect ratio (AR) of nano-structures in rather thick HSQ layers. For double lines separated by a distance of 50 nm the maximum achievable AR is trebled using SRD processes compared to conventional nitrogen blow. The mechanical stability of resist structures is significantly improved by using SRI).

Ämnesord

TEKNIK OCH TEKNOLOGIER  -- Nanoteknik (hsv//swe)

ENGINEERING AND TECHNOLOGY  -- Nano-technology (hsv//eng)

Nyckelord

supercritical resist drying

SRD

HSQ

electron beam lithography

aspect ratio

Publikations- och innehållstyp

ref (ämneskategori)

art (ämneskategori)