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Magnetron sputtered...
Magnetron sputtered Gadolina-doped Ceria Diffusion Barriers for Metal-supported Solid Oxide Fuel Cells
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- Sønderby, Steffen (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan
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- Klemensø, Trine (författare)
- Technical University of Denmark,Department of Energy Conversion and Storage
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- Christensen, Bjarke H. (författare)
- Danish Technological Institute,Tribology Centre
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- Almtoft, Klaus P. (författare)
- Danish Technological Institute,Tribology Centre
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- Lu, Jun (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan
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- Nielsen, Lars P. (författare)
- Danish Technological Institute,Tribology Centre
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- Eklund, Per (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan
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(creator_code:org_t)
- Elsevier, 2014
- 2014
- Engelska.
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Ingår i: Journal of Power Sources. - : Elsevier. - 0378-7753 .- 1873-2755. ; 267, s. 452-458
- Relaterad länk:
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https://liu.diva-por... (primary) (Raw object)
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http://liu.diva-port...
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- Gadolinia-doped ceria (GDC) thin films are deposited by reactive magnetron sputtering in an industrial-scale setup and implemented as barrier layers between the cathode and electrolyte in metal-based solid oxide fuel cells consisting of a metal support, an electrolyte of ZrO2 co-doped with Sc2O3 and Y2O3 (ScYSZ) and a Sr-doped lanthanum cobalt oxide cathode. In order to optimize the deposition of GDC to obtain high electrochemical performance of the cells, the influence of film thickness and adatom mobility is studied. The adatom mobility is varied by tuning the deposition temperature and substrate bias voltage.A GDC layer thickness of 0.6 µm is found to effectively block Sr diffusion when bias voltage and deposition temperature is tuned to promote dense coatings. The adatom mobility has a large influence on the film density. Low temperature and bias voltage result in underdense column boundaries which function as channels for Sr to diffuse to the GDC-ScYSZ interface. By tuning deposition temperature, bias voltage and film thickness area specific resistances down to 0.34 Ωcm2 are achieved at cell tests performed at an operating temperature of 650 °C.
Ämnesord
- NATURVETENSKAP -- Fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences (hsv//eng)
Nyckelord
- Physical Vapor deposition (PVD); Solid Oxide Fuel Cell (SOFC); GDC; CGO
Publikations- och innehållstyp
- ref (ämneskategori)
- art (ämneskategori)
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