Structural and mechanical properties of amorphous AlMgB14 thin films deposited by DC magnetron sputtering on Si, Al2O3 and MgO substrates

• AlMgB14 coatings have been deposited by DC magnetron sputtering from elemental targets on Si (001), Al2O3 (0001) and MgO (001) substrates at temperatures in the range of 25-350 degrees C. The structural and mechanical properties of AlMgB14 films were characterized by X-ray diffraction, scanning electron microscopy, nanoindentation, and analyzed as a function of deposition conditions and substrate materials. The results show that all films are X-ray amorphous, and the mechanical properties of the deposited films depend on the substrate and growth temperature. AlMgB14 thin films deposited at 350 degrees C are found to have smoother surfaces and containing more well-formed B-12 icosahedra than the films deposited at lower temperature, which consequently increase the hardness of the deposited films. The maximum hardness and Youngs modulus of the as-deposited films are about 32.3 GPa and 310 GPa, respectively, for films deposited on Al2O3 substrate at 350 degrees C.

Ämnesord

NATURVETENSKAP  -- Kemi -- Oorganisk kemi (hsv//swe)

NATURAL SCIENCES  -- Chemical Sciences -- Inorganic Chemistry (hsv//eng)

Nyckelord

Boride; Physical vapor deposition; Nanoindentation; Sputter-deposition; X-ray diffraction

Publikations- och innehållstyp

ref (ämneskategori)

art (ämneskategori)