Structure and properties of phosphorus-carbide thin solid films

• Phosphorus-carbide (CPx) thin films have been deposited by unbalanced reactive magnetron sputtering and investigated by TEM, XPS, SEM, ERDA, Raman scattering spectroscopy, nanoindentation testing, and four-point electrical probe techniques. As-deposited films with x=0.1 are electron amorphous with elements of FL structure and high mechanical resiliency with hardness of 34.4 GPa and elastic recovery of 72%. The electrical resistivity of the films are in the range 0.4-1.7 Ωcm for CP0.027, 1.4-22.9 Ωcm for CP0.1, and lower than the minimal value the four-point probe is able to detect for CPx with x≥0.2.

Ämnesord

TEKNIK OCH TEKNOLOGIER  -- Annan teknik -- Övrig annan teknik (hsv//swe)

ENGINEERING AND TECHNOLOGY  -- Other Engineering and Technologies -- Other Engineering and Technologies not elsewhere specified (hsv//eng)

Nyckelord

Phosphorus carbide

thin films

magnetron sputtering

Material physics with surface physics

Materialfysik med ytfysik

Publikations- och innehållstyp

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