Effect of varying N(2)pressure on DC arc plasma properties and microstructure of TiAlN coatings

• Detailed knowledge of correlations between direct current (DC) cathodic arc deposition process parameters, plasma properties, and the microstructure of deposited coatings are essential for a comprehensive understanding of the DC cathodic arc deposition process. In this study we have probed the plasma, generated by DC arc on a Ti-50 at.% Al cathode in a N(2)ambience, at the growth front of the TiAlN coating. Several consequences of an increasing N(2)pressure are observed, including a decreased electron temperature, an increased electron density, and a loss of energetic ions. As a result, the preferred growth texture switches from 220 to 111. It is also observed that neutrals in the plasma can significantly contribute to the growth of TiAlN coatings.

Ämnesord

NATURVETENSKAP  -- Fysik -- Fusion, plasma och rymdfysik (hsv//swe)

NATURAL SCIENCES  -- Physical Sciences -- Fusion, Plasma and Space Physics (hsv//eng)

Nyckelord

arc plasma; TiAlN; microstructure

Publikations- och innehållstyp

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