Diagnostics of a N2/Ar direct current magnetron discharge for reactive sputter deposition of fullerene-like carbon nitride thin films

• Composition and energetic conditions of the ion flux of a direct current, N2/Ar, unbalanced magnetron sputtering plasma in front of ionized film-forming species were investigated. Plasma probe measurements and energy selective mass spectrometry were used. The results show that the total number of C-containing ions strongly depends on the N2 fraction in the discharge. It was also found that C and N atoms and ions are important during growth of fullerene-like (FL) carbon nitride (CNx) thin films.

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TECHNOLOGY

TEKNIKVETENSKAP

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