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Epitaxial NaCl structure d-TaNx(001) : Electronic transport properties, elastic modulus, and hardness versus N/Ta ratio

Shin, C.-S. (författare)
Materials Science Department, Frederick Seitz Mat. Res. Laboratory, University of Illinois, 104 South Goodwin Avenue, Urbana, IL 61801, United States
Gall, D. (författare)
Materials Science Department, Frederick Seitz Mat. Res. Laboratory, University of Illinois, 104 South Goodwin Avenue, Urbana, IL 61801, United States
Kim, Y.-W. (författare)
Materials Science Department, Frederick Seitz Mat. Res. Laboratory, University of Illinois, 104 South Goodwin Avenue, Urbana, IL 61801, United States
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Desjardins, P. (författare)
Materials Science Department, Frederick Seitz Mat. Res. Laboratory, University of Illinois, 104 South Goodwin Avenue, Urbana, IL 61801, United States
Petrov, I. (författare)
Materials Science Department, Frederick Seitz Mat. Res. Laboratory, University of Illinois, 104 South Goodwin Avenue, Urbana, IL 61801, United States
Greene, J.E. (författare)
Materials Science Department, Frederick Seitz Mat. Res. Laboratory, University of Illinois, 104 South Goodwin Avenue, Urbana, IL 61801, United States
Odén, Magnus (författare)
Linköpings universitet,Tekniska högskolan,Nanostrukturerade material
Hultman, Lars (författare)
Linköpings universitet,Tekniska högskolan,Tunnfilmsfysik
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Materials Science Department, Frederick Seitz Mat Res. Laboratory, University of Illinois, 104 South Goodwin Avenue, Urbana, IL 61801, United States Tekniska högskolan (creator_code:org_t)
AIP Publishing, 2001
2001
Engelska.
Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 90:6, s. 2879-2885
  • Tidskriftsartikel (refereegranskat)
Abstract Ämnesord
Stäng  
  • While metastable Bl-NaCl-structure d-TaNx. is presently used in a variety of hard coating, wear-resistant, and diffusion barrier applications, it is a complex material exhibiting a wide single-phase field, x?0.94-1.37, and little is known about its fundamental properties. Here, we report physical properties of epitaxial d-TaNx. layers grown as a function of x on MgO(00) by ultrahigh vacuum reactive magnetron sputter deposition. The room-temperature resistivity (? = 225 µO cm), hardness (H = 30.9 GPa), and elastic modulus (E = 455 GPa) of d-TaNx(001) are independent of x over the range 0.94-1.22. However, changes in the electronic structure associated with increasing x>1.22 lead to an increase in ? with a decrease in H and E. All d-TaNx(001) layers exhibit negative temperature coefficients of resistivity between 20 and 400 K due to weak carrier localization. d-TaNx is superconducting with the highest critical temperature, 8.45 K, obtained for layers with the lowest N/Ta ratio, x=0.94. Based upon the above results, combined with the fact that the relaxed lattice constant a0 shows only a very weak dependence on x, we propose that the wide phase field in d-TaNx is due primarily to antisite substitutions of Ta on N (and N on Ta) sites, rather than to cation and anion vacancies. To first order, antisite substitutions in TaNx are isoelectronic and hence have little effect on charge carrier density. At sufficiently high N/Ta ratios, however, simple electron-counting arguments are no longer valid since large deviations from stoichiometry alter the character of the band structure itself. © 2001 American Institute of Physics.

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