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Retardation-enhance...
Retardation-enhanced van der Waals force between thin metal films
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- Boström, Mathias (författare)
- Linköpings universitet,Teoretisk Fysik,Tekniska högskolan
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- Sernelius, Bo (författare)
- Linköpings universitet,Teoretisk Fysik,Tekniska högskolan
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(creator_code:org_t)
- 2000
- 2000
- Engelska.
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Ingår i: Physical Review B. Condensed Matter and Materials Physics. - 1098-0121 .- 1550-235X. ; 62:11, s. 7523-7526
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https://liu.diva-por... (primary) (Raw object)
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- We recently investigated the van der Waals force between thin metal films. Under certain conditions this force decrease with separation to a fractional power. In the present work we use optical data of metals and the zero-temperature Lifshitz formalism to demonstrate a retardation effect. The retarded attraction between thin metal films may be larger than the nonretarded attraction. This property is related to a comparatively weak retardation dependence of the energy that originates from the transverse magnetic modes. At separations where the transverse electric modes give a significant contribution, the net effect can actually be an increased attraction. This effect vanishes with increasing film thickness and with increasing dissipation.
Nyckelord
- TECHNOLOGY
- TEKNIKVETENSKAP
Publikations- och innehållstyp
- ref (ämneskategori)
- art (ämneskategori)
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