Rapid sintering of silicon nitride foams decorated with one-dimensional nanostructures by intense thermal radiation

• Silicon nitride foams were prepared by direct foaming and subsequent rapid sintering at 1600 °C. The intense thermal radiation generated under the pressureless spark plasma sintering condition facilitated necking of Si3N4 grains. The prepared foams possessed a porosity of ~80 vol% and a compressive strength of ~10 MPa, which required only ~30 min for the entire sintering processes. Rapid growth of one-dimensional SiC nanowires from the cell walls was also observed. Thermodynamic calculations indicated that the vapor–liquid–solid model is applicable to the formation of SiC nanowires under vacuum.

Ämnesord

TEKNIK OCH TEKNOLOGIER  -- Materialteknik -- Keramteknik (hsv//swe)

ENGINEERING AND TECHNOLOGY  -- Materials Engineering -- Ceramics (hsv//eng)

Nyckelord

silicon nitride

foam

spark plasma sintering

nanowire

thermodynamics

Materials Chemistry

materialkemi

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