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Memory efficient co...
Memory efficient constrained optimization of scanning-beam lithography
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- Jidling, Carl (författare)
- Uppsala universitet,Avdelningen för systemteknik,Artificiell intelligens
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- Fleming, Andrew J. (författare)
- University of Newcastle, School of Engineering, Callaghan NSW, Australia.
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- Wills, Adrian G. (författare)
- University of Newcastle, School of Engineering, Callaghan NSW, Australia.
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- Schön, Thomas B., Professor, 1977- (författare)
- Uppsala universitet,Avdelningen för systemteknik,Artificiell intelligens
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(creator_code:org_t)
- Optica Publishing Group, 2022
- 2022
- Engelska.
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Ingår i: Optics Express. - : Optica Publishing Group. - 1094-4087. ; 30:12, s. 20564-20579
- Relaterad länk:
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https://doi.org/10.1...
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https://uu.diva-port... (primary) (Raw object)
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- This article describes a memory efficient method for solving large-scale optimizationproblems that arise when planning scanning-beam lithography processes. These processes require the identification of an exposure pattern that minimizes the difference between a desired and predicted output image, subject to constraints. The number of free variables is equal to the number of pixels, which can be on the order of millions or billions in practical applications. The proposed method splits the problem domain into a number of smaller overlapping subdomains with constrained boundary conditions, which are then solved sequentially using a constrained gradient search method (L-BFGS-B). Computational time is reduced by exploiting natural sparsity in the problem and employing the fast Fourier transform for efficient gradient calculation. When it comes to the trade-off between memory usage and computational time we can make a different trade-off compared to previous methods, where the required memory is reduced by approximately the number of subdomains at the cost of more computations. In an example problem with 30 million variables, the proposed method reduces memory requirements by 67% but increases computation time by 27%. Variations of the proposed method are expected to find applications in the planning of processes such as scanning laser lithography, scanning electron beam lithography, and focused ion beam deposition, for example.
Ämnesord
- TEKNIK OCH TEKNOLOGIER -- Elektroteknik och elektronik -- Annan elektroteknik och elektronik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Electrical Engineering, Electronic Engineering, Information Engineering -- Other Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)
Nyckelord
- Scanning-beam lithography
- Constrained optimization
Publikations- och innehållstyp
- ref (ämneskategori)
- art (ämneskategori)
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