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Scale-up Analysis o...
Scale-up Analysis of Continuous Cross-flow Atomic Layer Deposition Reactor Designs
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- Holmqvist, Anders (författare)
- Lund University,Lunds universitet,Avdelningen för kemiteknik,Institutionen för processteknik och tillämpad biovetenskap,Institutioner vid LTH,Lunds Tekniska Högskola,Division of Chemical Engineering,Department of Process and Life Science Engineering,Departments at LTH,Faculty of Engineering, LTH
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- Magnusson, Fredrik (författare)
- Lund University,Lunds universitet,Institutionen för reglerteknik,Institutioner vid LTH,Lunds Tekniska Högskola,Department of Automatic Control,Departments at LTH,Faculty of Engineering, LTH
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- Stenström, Stig (författare)
- Lund University,Lunds universitet,Avdelningen för kemiteknik,Institutionen för processteknik och tillämpad biovetenskap,Institutioner vid LTH,Lunds Tekniska Högskola,Division of Chemical Engineering,Department of Process and Life Science Engineering,Departments at LTH,Faculty of Engineering, LTH
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(creator_code:org_t)
- Elsevier BV, 2014
- 2014
- Engelska.
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Ingår i: Chemical Engineering Science. - : Elsevier BV. - 0009-2509. ; 117, s. 301-317
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Abstract
Ämnesord
Stäng
- This paper presents the development of a non-dimensional model of a continuous cross-flow atomic layer deposition (ALD) reactor with temporally separated precursor pulsing and a structured model-based methodology for scaling up the substrate dimensions. The model incorporates an ALD gas–surface reaction kinetic mechanism for the deposition of thin ZnO films from Zn(C2H5)2 and H2O precursors that was experimentally validated in our previous work (Holmqvist et al., 2012, 2013a). In order to maintain dynamic similarity, a scaling analysis was applied based on the dimensionless numbers, appearing in non-dimensionalized momentum and species mass conservation equations, that describe the convective laminar flow, mass transfer and heterogeneous reaction. The impact on these dimensionless numbers and, more importantly, the impact on the limit-cycle deposition rate and its relative uniformity was thoroughly investigated when linearly scaling up the substrate dimensions. In the scale-up procedure, the limit-cycle precursor utilization was maximized by means of dynamic optimization, while ensuring that identical deposition profiles were obtained in the scaled-up system. The results presented here demonstrated that the maximum precursor yields were promoted at higher substrate dimensions. Limit-cycle dynamic solutions to the non-dimensionalized model, computed with a collocation discretization in time, revealed that it is a combination of the degree of precursor depletion in the flow direction and the magnitude of the pressure drop across the reactor chamber that governs the extent of the deposition profile non-uniformity. A key finding of this study is the identification of optimal scaling rules for maximizing precursor utilization in the scaled-up system while maintaining fixed absolute growth rate and its relative uniformity.
Ämnesord
- TEKNIK OCH TEKNOLOGIER -- Kemiteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Chemical Engineering (hsv//eng)
- TEKNIK OCH TEKNOLOGIER -- Elektroteknik och elektronik -- Reglerteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Electrical Engineering, Electronic Engineering, Information Engineering -- Control Engineering (hsv//eng)
Nyckelord
- Atomic layer deposition
- Mathematical modeling
- Dynamic optimization
- Scale-up analysis
- Limit-cycle kinetics
- Numerical analysis
Publikations- och innehållstyp
- art (ämneskategori)
- ref (ämneskategori)
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