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Cleaning graphene u...
Cleaning graphene using atomic force microscope
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- Lindvall, Niclas, 1985 (författare)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Kalaboukhov, Alexei, 1975 (författare)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Yurgens, Avgust, 1959 (författare)
- Chalmers tekniska högskola,Chalmers University of Technology
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(creator_code:org_t)
- AIP Publishing, 2012
- 2012
- Engelska.
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Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 111:6, s. Article Number: 064904-
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Abstract
Ämnesord
Stäng
- We mechanically clean graphene devices using an atomic force microscope (AFM). By scanning an AFM tip in contact mode in a broom-like way over the sample, resist residues are pushed away from the desired area. We obtain atomically flat graphene with a root mean square (rms) roughness as low as 0.12 nm after this procedure. The cleaning also results in a shift of the charge-neutrality point toward zero gate voltage, as well as an increase in charge carrier mobility.
Ämnesord
- NATURVETENSKAP -- Fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences (hsv//eng)
Nyckelord
- transport
- suspended graphene
- layer graphene
- sio2
- films
Publikations- och innehållstyp
- art (ämneskategori)
- ref (ämneskategori)
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