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Oxidation behaviour...
Oxidation behaviour of a (Mo, W)Si2-based composite in dry and wet oxygen atmospheres in the temperature range 350–950◦C
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- Hellström, Kristina M, 1971 (författare)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Tang, Jun Eu, 1974 (författare)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Jonsson, Torbjörn, 1970 (författare)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Halvarsson, Mats, 1965 (författare)
- Chalmers tekniska högskola,Chalmers University of Technology
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Pompe, Robert (författare)
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Sundberg, Mats, 1964 (författare)
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- Svensson, Jan-Erik, 1965 (författare)
- Chalmers tekniska högskola,Chalmers University of Technology
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(creator_code:org_t)
- Elsevier BV, 2009
- 2009
- Engelska.
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Ingår i: Journal of the European Ceramic Society. - : Elsevier BV. - 1873-619X .- 0955-2219. ; 29:10, s. 2105-2118
- Relaterad länk:
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http://dx.doi.org/10...
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https://doi.org/10.1...
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https://research.cha...
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Abstract
Ämnesord
Stäng
- The oxidation of a (Mo, W)Si2-based composite was investigated in the temperature range (350–950 °C). The influence of temperature and water vapour on the oxidation was examined. The kinetics was studied using a thermobalance whereas the morphology and composition of the oxides were examined using X-ray diffractometer (XRD), scanning electron microscope (SEM), transmission electron microscope (TEM) and energy dispersive X-ray (EDX). Focused ion beam (FIB) milling was performed on some of the oxide scales which allowed us to look at a non-mechanically disturbed scale/oxide in cross-section. Rapid oxidation was found to occur in the 550–750 °C temperature range. The mass gains were significantly larger in O2 than in O2 + 10%H2O. The different mass changes in the two exposure atmospheres were attributed to the higher vapour pressure of the volatile MoO2(OH)2 and WO2(OH)2 species in O2 + 10%H2O than that of (MoO3)3 and (WO3)3 in dry O2. The peak mass gain was found to occur at a temperature of about 750 °C in O2 and 650 °C in O2 + 10%H2O. At temperatures above 850 °C, especially when water vapour is present, the removal of Mo and W from the oxide scales is rapid enough to allow partial healing of the silica, causing the oxidation rate to drop. At 950 °C in O2 + 10%H2O, a protective SiO2 scale could be re-established quickly and maintained, causing the oxidation to essentially cease.
Ämnesord
- NATURVETENSKAP -- Kemi -- Oorganisk kemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences -- Inorganic Chemistry (hsv//eng)
Nyckelord
- oxidation
- W)Si2
- Refractories
- SiO2
- Corrosion
- (Mo
- Silicides
Publikations- och innehållstyp
- art (ämneskategori)
- ref (ämneskategori)
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