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Sökning: id:"swepub:oai:research.chalmers.se:bfb28e67-4ebb-4811-aa3e-ab66e50450e5" > Oxidation behaviour...

Oxidation behaviour of a (Mo, W)Si2-based composite in dry and wet oxygen atmospheres in the temperature range 350–950◦C

Hellström, Kristina M, 1971 (författare)
Chalmers tekniska högskola,Chalmers University of Technology
Tang, Jun Eu, 1974 (författare)
Chalmers tekniska högskola,Chalmers University of Technology
Jonsson, Torbjörn, 1970 (författare)
Chalmers tekniska högskola,Chalmers University of Technology
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Halvarsson, Mats, 1965 (författare)
Chalmers tekniska högskola,Chalmers University of Technology
Pompe, Robert (författare)
Sundberg, Mats, 1964 (författare)
Svensson, Jan-Erik, 1965 (författare)
Chalmers tekniska högskola,Chalmers University of Technology
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 (creator_code:org_t)
Elsevier BV, 2009
2009
Engelska.
Ingår i: Journal of the European Ceramic Society. - : Elsevier BV. - 1873-619X .- 0955-2219. ; 29:10, s. 2105-2118
  • Tidskriftsartikel (refereegranskat)
Abstract Ämnesord
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  • The oxidation of a (Mo, W)Si2-based composite was investigated in the temperature range (350–950 °C). The influence of temperature and water vapour on the oxidation was examined. The kinetics was studied using a thermobalance whereas the morphology and composition of the oxides were examined using X-ray diffractometer (XRD), scanning electron microscope (SEM), transmission electron microscope (TEM) and energy dispersive X-ray (EDX). Focused ion beam (FIB) milling was performed on some of the oxide scales which allowed us to look at a non-mechanically disturbed scale/oxide in cross-section. Rapid oxidation was found to occur in the 550–750 °C temperature range. The mass gains were significantly larger in O2 than in O2 + 10%H2O. The different mass changes in the two exposure atmospheres were attributed to the higher vapour pressure of the volatile MoO2(OH)2 and WO2(OH)2 species in O2 + 10%H2O than that of (MoO3)3 and (WO3)3 in dry O2. The peak mass gain was found to occur at a temperature of about 750 °C in O2 and 650 °C in O2 + 10%H2O. At temperatures above 850 °C, especially when water vapour is present, the removal of Mo and W from the oxide scales is rapid enough to allow partial healing of the silica, causing the oxidation rate to drop. At 950 °C in O2 + 10%H2O, a protective SiO2 scale could be re-established quickly and maintained, causing the oxidation to essentially cease.

Ämnesord

NATURVETENSKAP  -- Kemi -- Oorganisk kemi (hsv//swe)
NATURAL SCIENCES  -- Chemical Sciences -- Inorganic Chemistry (hsv//eng)

Nyckelord

oxidation
W)Si2
Refractories
SiO2
Corrosion
(Mo
Silicides

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