Sökning: id:"swepub:oai:research.chalmers.se:dc94452d-87f4-472c-8699-ab5d383f105e" >
Critical atomic-lev...
Critical atomic-level processing technologies: Remote plasma-enhanced atomic layer deposition and atomic layer etching
-
- Yuan, G. (författare)
- Shanghai University
-
- Li, Haohao (författare)
- Shanghai University
-
- Shan, B. (författare)
- Shanghai University
-
visa fler...
-
- Liu, Johan, 1960 (författare)
- Shanghai University,Chalmers tekniska högskola,Chalmers University of Technology
-
visa färre...
-
(creator_code:org_t)
- Bentham Science Publishers Ltd. 2018
- 2018
- Engelska.
-
Ingår i: Micro and Nanosystems. - : Bentham Science Publishers Ltd.. - 1876-4037 .- 1876-4029. ; 10:2, s. 76-83
- Relaterad länk:
-
https://doi.org/10.2...
-
visa fler...
-
https://research.cha...
-
visa färre...
Abstract
Ämnesord
Stäng
- As feature sizes of devices shrink every year, deposition and etching processes change to be very challenge, especially for sub-7 nm technology node. The acceptable variability of feature size is expected to be several atoms of silicon/germanium in the future. Therefore, Remote Plasma-Enhanced Atomic Layer Deposition (RPE-ALD) and Atomic Layer Etching (ALE) change to be more and more important in the semiconductor fabrication. Due to their self-limiting behavior, the atomic-scale fidelity could be realized for both of them in the processes. Compared with traditional Physical Vapor Deposition (PVD) and Chemical Vapor Deposition (CVD) methods, atomic-scale thickness controllability and good conformality can be achieved by RPE-ALD. Unlike conventional plasma etching, atomicscale precision and excellent depth uniformity can be achieved by ALE. The fundamentals and applications of RPE-ALD and ALE have been discussed in this paper. Using the combination of them, atomic-level deposition/etch-back method is also mentioned for achieving high quality ultra-thin films on three dimensional (3D) features.
Ämnesord
- NATURVETENSKAP -- Fysik -- Annan fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Other Physics Topics (hsv//eng)
- TEKNIK OCH TEKNOLOGIER -- Materialteknik -- Annan materialteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering -- Other Materials Engineering (hsv//eng)
- NATURVETENSKAP -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Condensed Matter Physics (hsv//eng)
Nyckelord
- Atomic layer etching
- Selflimiting behavior
- Ultra-large scale integration system
- Low deposition temperature
- Plasma-enhanced atomic layer deposition
- Atomic-level deposition/etch-back method
Publikations- och innehållstyp
- for (ämneskategori)
- ref (ämneskategori)
Hitta via bibliotek
Till lärosätets databas