SwePub
Tyck till om SwePub Sök här!
Sök i SwePub databas

  Extended search

Träfflista för sökning "WFRF:(Engström Olof 1943 ) "

Search: WFRF:(Engström Olof 1943 )

  • Result 61-70 of 136
Sort/group result
   
EnumerationReferenceCoverFind
61.
  •  
62.
  •  
63.
  •  
64.
  •  
65.
  • Engström, Olof, 1943 (author)
  • The MOS System
  • 2014
  • Book (other academic/artistic)abstract
    • This detailed and up-to-date guide to modern MOS structures describes important tools, cutting-edge models, novel phenomena and current challenges in measuring and improving the control of future MOS systems for transistor channels. Building up from basic electrostatics, it introduces the ideal MOS system, physical and electrical properties of high-k oxides, their dielectric constants, and energy offsets to semiconductors and metals, before moving on to electrical and physical characterization methods for high-k dielectric materials. Finally, real MOS systems are introduced: high-k dielectrics and interlayers, the influence of phonon dynamics, interface states and bulk traps, effective metal work functions, gate leakage phenomena and high mobility channel materials. Abstract concepts are supported by practical examples and critical comparison, encouraging an intuitive understanding of the principles at work, and presented alongside recent theoretical and experimental results, making this the ideal companion for researchers, graduate students and industrial development engineers working in nanoelectronics.
  •  
66.
  •  
67.
  •  
68.
  • Engström, Olof, 1943, et al. (author)
  • Vibronic nature of hafnium oxide/silicon interface states investigated by capacitance frequency spectroscopy
  • 2008
  • In: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 103:10, s. Art. no. 104101-
  • Journal article (peer-reviewed)abstract
    • Using a method based on the frequency dependence of capacitance, cross sections for electron capture into energy states at the interlayer/silicon interface have been investigated for HfO2 that is deposited on silicon by reactive sputtering. We find that the capture cross sections are thermally activated and steeply increase with increasing energy depth. Both features can be attributed to the same physical origin, indicating vibronic trap properties, where the capture mechanism is governed by multiphonon processes.
  •  
69.
  •  
70.
  •  
Skapa referenser, mejla, bekava och länka
  • Result 61-70 of 136
Type of publication
journal article (77)
conference paper (53)
book chapter (3)
editorial collection (1)
book (1)
doctoral thesis (1)
show more...
show less...
Type of content
peer-reviewed (124)
other academic/artistic (12)
Author/Editor
Engström, Olof, 1943 (130)
Raeissi, Bahman, 197 ... (33)
Bengtsson, Stefan, 1 ... (19)
Hall, S. (19)
Kaczmarczyk, M (19)
Gottlob, H. D. B. (18)
show more...
Cherkaoui, K. (15)
Hurley, P. K. (14)
Lemme, M. C. (10)
Schmidt, M. (9)
Jauhiainen, Anders, ... (8)
Jung, W. (6)
Lemme, Max C., 1970- (6)
Kasper, E. (6)
Karmous, A. (6)
Surma, B (6)
Buiu, O. (6)
Fu, Ying, 1964- (6)
Persson, Lars-Olof, ... (5)
Larsson, Sven, 1943 (5)
Sullivan, Marianne, ... (5)
Davey, W.M. (5)
Lu, Y (4)
Schubert, J (4)
Sanz-Velasco, Anke, ... (4)
Lopes, J. M. J. (4)
Lemme, Max (3)
O’Connor, E. (3)
Peaker, A.R. (3)
Barcz, A. (3)
Kurz, H. (3)
Malmkvist, Mikael, 1 ... (3)
Buiu, Octavian (3)
Hurley, Paul (3)
Cherkaoui, Karim (3)
Andersson, G (2)
Stake, Jan, 1971 (2)
Lin, S (2)
Andersson, Mats O., ... (2)
Olafsson, Halldor, 1 ... (2)
Sveinbjörnsson, Eina ... (2)
Habibpour, Omid, 197 ... (2)
Rydén, Anna, 1957 (2)
Bakowski, M. (2)
Ghibaudo, G. (2)
Stefani, A (2)
Petersson, Göran, 19 ... (2)
Esteve, R (2)
Osten, H. J. (2)
Ducroquet, F. (2)
show less...
University
Chalmers University of Technology (130)
Royal Institute of Technology (7)
University of Gothenburg (5)
Stockholm University (1)
Language
English (135)
Swedish (1)
Research subject (UKÄ/SCB)
Engineering and Technology (106)
Natural sciences (32)
Medical and Health Sciences (5)
Social Sciences (1)

Year

Kungliga biblioteket hanterar dina personuppgifter i enlighet med EU:s dataskyddsförordning (2018), GDPR. Läs mer om hur det funkar här.
Så här hanterar KB dina uppgifter vid användning av denna tjänst.

 
pil uppåt Close

Copy and save the link in order to return to this view