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Sökning: onr:"swepub:oai:DiVA.org:uu-316208" > Recommended reading...

Recommended reading list of early publications on atomic layer deposition-Outcome of the "Virtual Project on the History of ALD"

Ahvenniemi, Esko (författare)
Aalto Univ, Dept Chem, POB 16100, FI-00076 Espoo, Finland.,Aalto University, Finland
Akbashev, Andrew R. (författare)
Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA.,Aalto University, Espoo, Finland,Stanford University, CA 94305 USA
Ali, Saima (författare)
Aalto Univ, Sch Chem Technol, Dept Mat Sci & Engn, POB 16200, FI-00076 Aalto, Finland.,Aalto University, Finland
visa fler...
Bechelany, Mikhael (författare)
Univ Montpellier, ENSCM, CNRS, IEM,UMR 5635, Pl Eugene Bataillon, F-34095 Montpellier 5, France.,University of Montpellier, France
Berdova, Maria (författare)
Univ Twente, Ind Focus Grp XUV Opt, NL-7522 ND Enschede, Netherlands.,University of Twente, Netherlands
Boyadjiev, Stefan (författare)
Bulgarian Acad Sci, Inst Solid State Phys, 72 Tzarigradsko Chaussee Blvd, Sofia 1784, Bulgaria.,Bulgarian Academic Science, Bulgaria
Cameron, David C. (författare)
Masaryk Univ, CEPLANT, Kotlarska 267-2, CS-61137 Brno, Czech Republic.,Masaryk University, Czech Republic
Chen, Rong (författare)
Huazhong Univ Sci & Technol, Sch Mech Sci & Engn, Sch Opt & Elect Informat, 1037 Luoyu Rd, Wuhan 430074, Hubei, Peoples R China.,Huazhong University of Science and Technology, Peoples R China
Chubarov, Mikhail (författare)
Univ Grenoble Alpes, CNRS, SIMAP, F-38000 Grenoble, France.,University of Grenoble Alpes, France
Cremers, Veronique (författare)
Univ Ghent, CoCooN, Dept Solid State Sci, Krijgslaan 281-S1, B-9000 Ghent, Belgium.,University of Ghent, Belgium
Devi, Anjana (författare)
Ruhr Univ Bochum, Inorgan Mat Chem, D-44801 Bochum, Germany.,Ruhr University of Bochum, Germany
Drozd, Viktor (författare)
St Petersburg State Univ, Inst Chem, Univ Skaya Emb 7-9, St Petersburg 199034, Russia.,St Petersburg State University, Russia
Elnikova, Liliya (författare)
Inst Theoret & Expt Phys, Bolshaya Cheremushkinskaya 25, Moscow 117218, Russia.,Institute Theoret and Expt Phys, Russia
Gottardi, Gloria (författare)
Fdn Bruno Kessler, Ctr Mat & Microsyst, I-38123 Trento, Italy.
Grigoras, Kestutis (författare)
VTT Tech Res Ctr Finland, POB 1000,Tietotie 3, FI-02044 Espoo, Vtt, Finland.,VTT Technical Research Centre Finland, Finland
Hausmann, Dennis M. (författare)
Lam Res Corp, Tualatin, OR 97062 USA.,Lam Research Corp, OR 97062 USA
Hwang, Cheol Seong (författare)
Seoul Natl Univ, Dept Mat Sci & Engn, Coll Engn, Seoul 08826, South Korea.;Seoul Natl Univ, Interuniv Semicond Res Ctr, Coll Engn, Seoul 08826, South Korea.,Seoul National University, South Korea; Seoul National University, South Korea
Jen, Shih-Hui (författare)
Globalfoundries, Albany, NY 12203 USA.
Kallio, Tanja (författare)
Aalto Univ, Sch Chem Engn, Dept Chem, POB 16100, FI-00076 Aalto, Finland.,Aalto University, Finland
Kanervo, Jaana (författare)
Aalto Univ, Sch Chem Engn, Dept Chem, POB 16100, FI-00076 Aalto, Finland.;Abo Akad Univ, FI-20500 Turku, Finland.,Åbo Akademi University,Aalto University, Finland; Abo Akad University, Finland
Khmelnitskiy, Ivan (författare)
St Petersburg Electrotech Univ LETI, Res & Educ Ctr Nanotechnol, Ul Prof Popova 5, St Petersburg 197376, Russia.,St Petersburg Electrotech University of LETI, Russia
Kim, Do Han (författare)
MIT, Dept Chem Engn, 77 Massachusetts Ave, Cambridge, MA 02139 USA.,Massachusetts Institute of Technology
Klibanov, Lev (författare)
Techinsights, 3000 Solandt Rd, Ottawa, ON K2K2X2, Canada.
Koshtyal, Yury (författare)
Ioffe Inst, Lab Lithium Ion Technol, 26 Politekhnicheskaya, St Petersburg 194021, Russia.,Ioffe Institute, Russia
Krause, A. Outi I. (författare)
Aalto Univ, Sch Chem Technol, Dept Mat Sci & Engn, POB 16200, FI-00076 Aalto, Finland.,Aalto University, Finland
Kuhs, Jakob (författare)
Univ Ghent, CoCooN, Dept Solid State Sci, Krijgslaan 281-S1, B-9000 Ghent, Belgium.,University of Ghent, Belgium
Kaerkkaenen, Irina (författare)
Sentech Instruments GmbH, Schwarzschildstr 2, D-12489 Berlin, Germany.
Kaariainen, Marja-Leena (författare)
NovaldMed Ltd Oy, Telkantie 5, FI-82500 Kitee, Finland.,NovaldMedical Ltd Oy, Finland
Kaariainen, Tommi (författare)
NovaldMed Ltd Oy, Telkantie 5, FI-82500 Kitee, Finland.;Univ Helsinki, Inorgan Chem Lab, POB 55,AI Virtasen Aukio 1, FI-00014 Helsinki, Finland.,NovaldMedical Ltd Oy, Finland; University of Helsinki, Finland
Lamagna, Luca (författare)
STMicroelectronics, Via C Olivetti 2, I-20864 Agrate Brianza, MB, Italy.,VTT Technical Research Centre Finland, Finland
Lapicki, Adam A. (författare)
Seagate Technol Ireland, 1 Disc Dr, Derry BT48 7BD, North Ireland.,Seagate Technology Ireland, North Ireland
Leskela, Markku (författare)
Univ Helsinki, Dept Chem, POB 55, FI-00014 Helsinki, Finland.,University of Helsinki, Finland
Lipsanen, Harri (författare)
Aalto Univ, Dept Micro & Nanosci, Tietotie 3, Espoo 02150, Finland.,Aalto University, Finland
Lyytinen, Jussi (författare)
Aalto Univ, Sch Chem Technol, Dept Mat Sci & Engn, POB 16200, FI-00076 Aalto, Finland.,Aalto University, Finland
Malkov, Anatoly (författare)
Tech Univ, St Petersburg State Inst Technol, Dept Chem Nanotechnol & Mat Elect, 26 Moskovsky Prosp, St Petersburg 190013, Russia.,Technical University, Russia
Malygin, Anatoly (författare)
Tech Univ, St Petersburg State Inst Technol, Dept Chem Nanotechnol & Mat Elect, 26 Moskovsky Prosp, St Petersburg 190013, Russia.,Technical University, Russia
Mennad, Abdelkader (författare)
CDER, UDES, RN 11 BP 386 Bou Ismail, Tipasa 42415, Algeria.
Militzer, Christian (författare)
Tech Univ Chemnitz, Inst Chem, Phys Chem, Str Nationen 62, D-09111 Chemnitz, Germany.,Chemnitz University of Technology,Technical University of Chemnitz, Germany
Molarius, Jyrki (författare)
Summa Semicond Oy, PL 11, Espoo 02131, Finland.
Norek, Malgorzata (författare)
Mil Univ Technol, Fac Adv Technol & Chem, Dept Adv Mat & Technol, Str Kaliskiego 2, PL-00908 Warsaw, Poland.,Mil University of Technology, Poland
Ozgit-Akgun, Cagla (författare)
ASELSAN Inc, Microelect Guidance & Electroopt Business Sect, TR-06750 Ankara, Turkey.
Panov, Mikhail (författare)
St Petersburg Electrotech Univ LETI, Ctr Microtechnol & Diagnost, Ul Prof Popova 5, St Petersburg 197376, Russia.,St Petersburg Electrotech University of LETI, Russia
Pedersen, Henrik (författare)
Linköpings universitet,Linköping University,Kemi,Tekniska fakulteten
Piallat, Fabien (författare)
KOBUS, F-38330 Montbonnot St Martin, France.
Popov, Georgi (författare)
Univ Helsinki, Dept Chem, POB 55, FI-00014 Helsinki, Finland.,University of Helsinki, Finland
Puurunen, Riikka L. (författare)
VTT Tech Res Ctr Finland, POB 1000,Tietotie 3, FI-02044 Espoo, Vtt, Finland.
Rampelberg, Geert (författare)
Univ Ghent, CoCooN, Dept Solid State Sci, Krijgslaan 281-S1, B-9000 Ghent, Belgium.,University of Ghent, Belgium
Ras, Robin H. A. (författare)
Rauwel, Erwan (författare)
Tallinn Univ Technol, Tartu Coll, Puiestee 78, EE-51008 Tartu, Estonia.,Tallinn University of Technology, Estonia
Roozeboom, Fred (författare)
Eindhoven Univ Technol, Dept Appl Phys, Grp Plasma & Mat Proc, POB 513, NL-5600 MB Eindhoven, Netherlands.;TNO, High Tech Campus 21, NL-5656 AE Eindhoven, Netherlands.,Netherlands Organisation for Applied Scientific Research (Utrecht),Eindhoven University of Technology, Netherlands; TNO, Netherlands
Sajavaara, Timo (författare)
Univ Jyvaskyla, Dept Phys, POB 35, Jyvaskyla 40014, Finland.,University of Jyvaskyla, Finland
Salami, Hossein (författare)
Univ Maryland, Dept Chem & Biomol Engn, College Pk, MD 20742 USA.,University of Maryland, MD 20742 USA
Savin, Hele (författare)
Aalto Univ, Dept Micro & Nanosci, Tietotie 3, Espoo 02150, Finland.,Aalto University, Finland
Schneider, Nathanaelle (författare)
IRDEP CNRS, 6 Quai Watier, F-78401 Chatou, France.;IPVF, 8 Rue Renaissance, F-92160 Antony, France.
Seidel, Thomas E. (författare)
Seitek50, POB 350238, Palm Coast, FL 32135 USA.
Sundqvist, Jonas (författare)
Fraunhofer Inst Ceram Technol & Syst IKTS, Syst Integrat & Technol Transfer, Winterbergstr 28, D-01277 Dresden, Germany.,Fraunhofer Institute for Ceramic Technologies and Systems IKTS,Fraunhofer Institute Ceram Technology and Syst IKTS, Germany
Suyatin, Dmitry B. (författare)
Lund University,Lunds universitet,NanoLund: Centre for Nanoscience,Annan verksamhet, LTH,Lunds Tekniska Högskola,Fasta tillståndets fysik,Fysiska institutionen,Institutioner vid LTH,Other operations, LTH,Faculty of Engineering, LTH,Solid State Physics,Department of Physics,Departments at LTH,Faculty of Engineering, LTH,Lund University, Sweden; Lund University, Sweden
Törndahl, Tobias (författare)
Uppsala University,Uppsala universitet,Fasta tillståndets elektronik,Uppsala University, Sweden
van Ommen, J. Ruud (författare)
Delft Univ Technol, Dept Chem Engn, Van der Maasweg 9, NL-2629 HZ Delft, Netherlands.,Delft University of Technology, Netherlands
Wiemer, Claudia (författare)
CNR, IMM, Lab MDM, Via C Olivetti 2, I-20864 Agrate Brianza, MB, Italy.
Ylivaara, Oili M. E. (författare)
VTT Tech Res Ctr Finland, POB 1000,Tietotie 3, FI-02044 Espoo, Vtt, Finland.,VTT Technical Research Centre Finland, Finland
Yurkevich, Oksana (författare)
Immanuel Kant Balt Fed Univ, Res & Educ Ctr Funct Nanomat, A Nevskogo 14, Kaliningrad 236041, Russia.,Immanuel Kant Balt Federal University, Russia
visa färre...
Aalto Univ, Dept Chem, POB 16100, FI-00076 Espoo, Finland Aalto University, Finland (creator_code:org_t)
American Vacuum Society, 2017
2017
Engelska.
Ingår i: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films. - : American Vacuum Society. - 0734-2101 .- 1520-8559. ; 35:1
  • Forskningsöversikt (refereegranskat)
Abstract Ämnesord
Stäng  
  • Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.

Ämnesord

NATURVETENSKAP  -- Fysik -- Atom- och molekylfysik och optik (hsv//swe)
NATURAL SCIENCES  -- Physical Sciences -- Atom and Molecular Physics and Optics (hsv//eng)
NATURVETENSKAP  -- Kemi -- Materialkemi (hsv//swe)
NATURAL SCIENCES  -- Chemical Sciences -- Materials Chemistry (hsv//eng)
NATURVETENSKAP  -- Kemi -- Oorganisk kemi (hsv//swe)
NATURAL SCIENCES  -- Chemical Sciences -- Inorganic Chemistry (hsv//eng)

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