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Morphology induced ...
Morphology induced large magnetic anisotropy in obliquely grown nanostructured thin film on nanopatterned substrate
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- Bera, Anup Kumar (författare)
- UGC DAE Consortium Sci Res, Khandwa Rd, Indore 452001, India.
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- Dev, Arun Singh (författare)
- UGC DAE Consortium Sci Res, Khandwa Rd, Indore 452001, India.
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- Kuila, Manik (författare)
- UGC DAE Consortium Sci Res, Khandwa Rd, Indore 452001, India.
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- Ranjan, Mukesh (författare)
- Inst Plasma Res, FCIPT, Bhat 382428, Gandhinagar, India.
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- Pandit, Pallavi (författare)
- Deutsch Elektronen Synchrotron DESY, D-22607 Hamburg, Germany.
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- Schwartzkopf, Matthias (författare)
- Deutsch Elektronen Synchrotron DESY, D-22607 Hamburg, Germany.
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- Roth, Stephan V. (författare)
- KTH,Biokompositer,Deutsch Elektronen Synchrotron DESY, D-22607 Hamburg, Germany.;KTH Royal Inst Technol, S-10044 Stockholm, Sweden.
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- Reddy, Varimalla R. (författare)
- UGC DAE Consortium Sci Res, Khandwa Rd, Indore 452001, India.
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- Kumar, Dileep (författare)
- UGC DAE Consortium Sci Res, Khandwa Rd, Indore 452001, India.
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UGC DAE Consortium Sci Res, Khandwa Rd, Indore 452001, India Inst Plasma Res, FCIPT, Bhat 382428, Gandhinagar, India. (creator_code:org_t)
- Elsevier BV, 2022
- 2022
- Engelska.
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Ingår i: Applied Surface Science. - : Elsevier BV. - 0169-4332 .- 1873-5584. ; 581
- Relaterad länk:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- The artificial tailoring of magnetic anisotropy by manipulating surface and interface morphology is attracting widespread interest for its application in spintronic and magnetic memory devices. Here oblique angle deposition on a nanopatterned rippled substrate is presented as a novel route of inducing large in-plane uniaxial magnetic anisotropy (UMA) in magnetic thin films. For this purpose, Cobalt films and rippled SiO2 substrates have been taken as a model system for the present study. Here, nanopatterned substrates are prepared by low energy ion beam erosion (IBE), above which films are deposited obliquely along and normal to the ripple directions. A clear anisotropy in the growth behavior has been observed due to the inhomogeneous in-plane organization of adatoms in the form of columns. The increased shadowing effect in the films deposited obliquely normal to the direction of the ripple patterns causes preferential coalescence of the columns along the substrate ripples, resulting in stronger in-plane UMA in the film. This peculiarity in magnetic behavior is addressed by considering the morphological anisotropy governed by enhanced shadowing effect, the shape anisotropy and the dipolar interactions among the magnetostatically coupled ripple structure.
Ämnesord
- NATURVETENSKAP -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Condensed Matter Physics (hsv//eng)
Nyckelord
- Magnetic thin film
- Ion beam patterning
- Rippled substrate
- Interfacial morphology
- Oblique angle deposition
- Uniaxial magnetic anisotropy
Publikations- och innehållstyp
- ref (ämneskategori)
- art (ämneskategori)
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