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Sökning: L773:1092 8669

  • Resultat 1-10 av 29
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1.
  • Astromskas, Gvidas, et al. (författare)
  • Temperature dependence of GaSb overgrowth of tungsten on GaSb (001) substrates using MOVPE
  • 2008
  • Ingår i: 20th International Conference on Indium Phosphide and Related Materials, 2008. IPRM 2008. - 1092-8669. ; , s. 354-356
  • Konferensbidrag (refereegranskat)abstract
    • We demonstrate GaSb overgrowth over tungsten patterns and that selective area epitaxy is achievable in the W/GaSb system. By controlling the facet growth at low temperatures, it is possible to embed a metal grating in a thin layer.
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2.
  • Berg, Martin, et al. (författare)
  • Single Balanced Down-Conversion Mixer Utilizing Indium Arsenide Nanowire MOSFETs
  • 2014
  • Ingår i: 26th International Conference on Indium Phosphideand Related Materials (IPRM). - 1092-8669.
  • Konferensbidrag (refereegranskat)abstract
    • We have fabricated single balanced down-conversion mixer circuits using InAs nanowire MOSFETs as both active and passive devices. This is achieved by a combination of electron beam lithography and UV-lithography with a line width of 12 mu m. The circuits exhibit a low frequency voltage conversion gain of 6 dB, a -3 dB cutoff frequency of 2 GHz and a power consumption of 3.8 mW, while operating at a supply voltage of 1.5 V. The circuits retain circuit functionality even for a supply voltage of 1 V.
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3.
  • Borg, Mattias, et al. (författare)
  • MOVPE Growth and Structural Characterization of Extremely Lattice-Mismatched InP-InSB Nanowire Heterostructures
  • 2009
  • Ingår i: 2009 IEEE 21st International Conference On Indium Phosphide & Related Materials (IPRM). - 1092-8669. ; , s. 249-252
  • Konferensbidrag (refereegranskat)abstract
    • We present a growth study and structural characterization of InP-InSb nanowire heterostructures. In contrast to planar epitaxy, this heterostructure can be realized in nanowires without the formation of dislocations, despite an extreme lattice-mismatch (10.4%). We obtain high crystal quality in the InSb nanowires, confirmed by a narrow 111 reflection peak measured by XRD. Additionally, the diameter dependence of the nanowire growth rate was investigated. An original competition between surface growth and nanowire growth is found, which can be controlled by varying the nanowire surface coverage. Finally, HRTEM and X-EDS investigations reveal that the InSb nanowire is always defect-free zinc-blende, and that the InP-InSb heterointerface is free from misfit dislocations, although single twin planes are common.
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4.
  • Drakinskiy, Vladimir, 1977, et al. (författare)
  • Terahertz GaAs Schottky diode mixer and multiplier MIC’s based on e-beam technology
  • 2013
  • Ingår i: Conference Proceedings - International Conference on Indium Phosphide and Related Materials. - 1092-8669. - 9781467361316
  • Konferensbidrag (refereegranskat)abstract
    • We present the progress of the technological development of a full e-beam based monolithically integrated Schottky diode process applicable for sub-millimetre wave multipliers and mixers. Evaluation of the process has been done in a number of demonstrators showing state-of-the-art performance, including various multiplier circuits up to 200 GHz with a measured flange efficiency of above 35%, as well as heterodyne receiver front-end modules operating at 340 GHz and 557 GHz with a measured receiver DSB noise temperature of below 700 K and 1300 K respectively.
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5.
  • Egard, Mikael, et al. (författare)
  • Frequency Modulation in mm-Wave InGaAs MOSFET/RTD Wavelet Generators
  • 2013
  • Ingår i: 2013 International Conference on Indium Phosphide and Related Materials (IPRM). - 1092-8669. ; , s. 1-2
  • Konferensbidrag (refereegranskat)abstract
    • Co-integration of an InGaAs MOSFET and an RTD is performed to realize a wavelet generator. The large transconductance of the MOSFET (1.9 mS/mu m) is used to switch the current in an oscillator circuit and coherent wavelets down to 41 ps are generated in the frequency domain of 50 to 100 GHz. The lowest power consumption measured is 1.9 pJ/pulse. It is found that the supply bias can be used to modulate the center frequency of the wavelets.
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6.
  • Johansson, Sofia, et al. (författare)
  • RF Characterization of Vertical InAs Nanowire MOSFETs with f(t) and f(max) above 140 GHz
  • 2014
  • Ingår i: 26th International Conference on Indium Phosphideand Related Materials (IPRM). - 1092-8669.
  • Konferensbidrag (refereegranskat)abstract
    • We present RF characterization of vertical gateall- around InAs nanowire MOSFETs integrated on Si substrates with peak f(t) = 142 GHz and f(max) = 155 GHz, representing the record for vertical nanowire transistors. The devices has an L-g approximate to 150 nm with a g(m)=700 mS/mm for a nanowire diameter of 38 nm and an EOT = 1.4 nm. The high values of f(t) is achieved through electron beam lithography patterning of the gate and drain contact which substantially decreases the parasitic capacitances through reduction of the overlay capacitance, which is in good agreement with TCAD modeling.
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7.
  • Larsson, Anders, 1957, et al. (författare)
  • High speed VCSELs for optical interconnects
  • 2012
  • Ingår i: Conference Proceedings - International Conference on Indium Phosphide and Related Materials. - 1092-8669. - 9781467317252 ; , s. 269-272
  • Konferensbidrag (refereegranskat)abstract
    • This paper presents an overview of our recent work on high speed, oxide confined, 850 nm vertical cavity surface emitting lasers (VCSELs). With proper active region and cavity designs, and techniques for reducing capacitance and thermal impedance, we have reached a modulation bandwidth of 23 GHz and demonstrated 40 Gbps transmission. Using an integrated mode filter for reducing the spectral width we have extended the reach on multimode fiber at 25 Gbps from 100 to 500 m. Improved link capacity was also demonstrated using a more spectrally efficient multi-level modulation format (4-PAM). Finally, a MEMS-technology for wafer scale integration of tunable high speed VCSELs was developed, enabling a tuning range of 24 nm, a 6 GHz modulation bandwidth, and 5 Gbps transmission.
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8.
  • Leuther, A., et al. (författare)
  • Metamorphic HEMT technology for low-noise applications
  • 2009
  • Ingår i: Conference Proceedings - International Conference on Indium Phosphide and Related Materials. - 1092-8669. - 9781424434336 ; , s. 188-191
  • Konferensbidrag (refereegranskat)abstract
    • Different noise sources in HEMTs are discussed, and state-of-the-art low-noise amplifiers based on the Fraunhofer IAF 100 nm and 50 nm gate length metamorphic HEMT (mHEMT) process are presented. These mHEMT technology feature an extrinsic f T of 220 / 375 GHz and an extrinsic transconduction g m , max , of 1300 / 1800 mS/mm. By using the 50 nm technology several low-noise amplifier MMICs were realized. A small signal gain of 21 dB and a noise figure of 1.9 dB was measured in the frequency range between 80 and 100 GHz at ambient temperature. To investigate the low temperature behaviour of the 100 nm technology, single 4 * 40 μm mHEMTs were integrated in hybrid 4 - 8 GHz (Chalmers) and 16 - 26 GHz (Yebes) amplifiers. At cryogenic temperatures noise temperatures of 3 K at 5 GHz and 12 K at 22 GHz were achieved.
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9.
  • Lind, Erik, et al. (författare)
  • High Frequency Performance of Vertical InAs Nanowire MOSFET
  • 2010
  • Ingår i: 2010 22Nd International Conference On Indium Phosphide And Related Materials (Iprm). - 1092-8669. - 9781424459193
  • Konferensbidrag (refereegranskat)abstract
    • We report on RF characterization of vertical, 100-nm-gate length InAs nanowire MOSFETs, utilizing wrap-gate technology and Al2O3 high-kappa gate oxide. The transistors show f(t)=5.6 GHz and f(max)=22 GHz, mainly limited by parasitic capacitances. The RF device performance is described using a hybrid-pi model taking hole generation at the drain into account. Electrostatic modeling of the parasitic capacitances for arrays of vertical nanowires indicates that a strong reduction in extrinsic capacitances can be achieved for devices with a small inter-wire separation.
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10.
  • Lind, Erik, et al. (författare)
  • Improved breakdown voltages for type I InP/InGaAs DHBTs
  • 2008
  • Ingår i: 20th International Conference on Indium Phosphide and Related Materials, 2008. IPRM 2008. - 1092-8669. ; , s. 504-507
  • Konferensbidrag (refereegranskat)abstract
    • We have investigated the base-collector breakdown voltage of type I InGaAs/InP DHBTs, which is shown to be dominated by band-to-band tunneling in the base-collector grade. By optimizing the grade we obtain a 20% increase in the breakdown voltage compared with traditional grades.
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  • Resultat 1-10 av 29

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