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Träfflista för sökning "WFRF:(Achenbach Jan Ole) "

Sökning: WFRF:(Achenbach Jan Ole)

  • Resultat 1-7 av 7
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1.
  • Achenbach, Jan-Ole, et al. (författare)
  • Correlative Experimental and Theoretical Investigation of the Angle-Resolved Composition Evolution of Thin Films Sputtered from a Compound Mo2BC Targe
  • 2019
  • Ingår i: Coatings. - : MDPI AG. - 2079-6412. ; 9:3
  • Tidskriftsartikel (refereegranskat)abstract
    • The angle-resolved composition evolution of Mo-B-C thin films deposited from a Mo2BC compound target was investigated experimentally and theoretically. Depositions were carried out by direct current magnetron sputtering (DCMS) in a pressure range from 0.09 to 0.98 Pa in Ar and Kr. The substrates were placed at specific angles α with respect to the target normal from 0 to ±67.5°. A model based on TRIDYN and SIMTRA was used to calculate the influence of the sputtering gas on the angular distribution function of the sputtered species at the target, their transport through the gas phase, and film composition. Experimental pressure- and sputtering gas-dependent thin film chemical composition data are in good agreement with simulated angle-resolved film composition data. In Ar, the pressure-induced film composition variations at a particular α are within the error of the EDX measurements. On the contrary, an order of magnitude increase in Kr pressure results in an increase of the Mo concentration measured at α = 0° from 36 at.% to 43 at.%. It is shown that the mass ratio between sputtering gas and sputtered species defines the scattering angle within the collision cascades in the target, as well as for the collisions in the gas phase, which in turn defines the angle- and pressure-dependent film compositions.
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2.
  • Achenbach, Jan-Ole, et al. (författare)
  • Low temperature oxidation behavior of Mo2BC coatings
  • 2020
  • Ingår i: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films. - : A V S AMER INST PHYSICS. - 0734-2101 .- 1520-8559. ; 38:2
  • Tidskriftsartikel (refereegranskat)abstract
    • Mo2BC exhibits a unique combination of high stiffness and moderate ductility, enabling the application as a protective and wear resistant coating. As the low temperature oxidation behavior of Mo2BC coatings is unexplored, direct current magnetron sputtered Mo2BC coatings were oxidized at temperatures ranging from 500 to 100 degrees C for up to 28 days. Time-of-flight elastic recoil detection analysis reveals that the onset of oxidation takes place at approximately 300 degrees C as a significant increase in the O content was observed. Crystalline oxide scales containing orthorhombic MoO3 were identified after oxidation for 15 min at 500 degrees C and 10 days at 200 degrees C. Isothermal oxidation at 200 and 100 degrees C exhibits oxide scale thicknesses of 401 +/- 33 and 22 +/- 10 nm after 14 days. Oxidation for 28 days at 100 degrees C exhibits an oxide scale thickness of 13 +/- 3 nm, which is comparable to the aforementioned oxide scale thickness after oxidation for 14 days at 100 degrees C. Based on the combination of mechanical properties and the here reported low temperature oxidation behavior, Mo2BC coatings qualify for applications in solid wood machining and low temperature forming processes at temperatures close to 100 degrees C or below.
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3.
  • Achenbach, Jan-Ole, et al. (författare)
  • Synthesis and Properties of Orthorhombic MoAlB Coatings
  • 2019
  • Ingår i: Coatings. - : MDPI. - 2079-6412. ; 9:8
  • Tidskriftsartikel (refereegranskat)abstract
    • MoAlB is a potential candidate for high-temperature application since a dense, adherent alumina scale is formed. While, based on X-ray diffraction investigations, the formation of phase pure orthorhombic MoAlB coatings is observed, energy dispersive X-ray spectroscopy carried out in a scanning transmission electron microscope reveals the presence of Al-rich and O-rich regions within the MoAlB matrix. The oxidation kinetics of coatings and bulk is similar to the scale thickness formed on the MoAlB coating after oxidation at 1200 degrees C for 30 min is similar to the one extrapolated for bulk MoAlB. Furthermore, the oxidation kinetics of MoAlB coatings is significantly lower than the one reported for bulk Ti2AlC. Finally, the elastic properties measured for the as-deposited coatings are consistent ab initio predictions.
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4.
  • Gleich, Stephan, et al. (författare)
  • Modifying the nanostructure and the mechanical properties of Mo2BC hard coatings : Influence of substrate temperature during magnetron sputtering
  • 2018
  • Ingår i: Materials & design. - : ELSEVIER SCI LTD. - 0264-1275 .- 1873-4197. ; 142, s. 203-211
  • Tidskriftsartikel (refereegranskat)abstract
    • A reduction in synthesis temperature is favorable for hard coatings, which are designed for industrial applications, as manufacturing costs can be saved and technologically relevant substrate materials are often temperature-sensitive. In this study, we analyzed Mo2BC hard coatings deposited by direct current magnetron sputtering at different substrate temperatures, ranging from 380 degrees C to 630 degrees C. Transmission electron microscopy investigations revealed that a dense structure of columnar grains, which formed at a substrate temperature of 630 degrees C, continuously diminishes with decreasing substrate temperature. It almost vanishes in the coating deposited at 380 degrees C, which shows nanocrystals of similar to 1 nm in diameter embedded in an amorphous matrix. Moreover, Argon from the deposition process is incorporated in the film and its amount increases with decreasing substrate temperature. Nanoindentation experiments provided evidence that hardness and Young's modulus are modified by the nanostructure of the analyzed Mo2BC coatings. A substrate temperature rise from 380 degrees C to 630 degrees C resulted in an increase in hardness (21 GPa to 28 GPa) and Young's modulus (259 GPa to 462 GPa). We conclude that the substrate temperature determines the nanostructure and the associated changes in bond strength and stiffness and thus, influences hardness and Young's modulus of the coatings.
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5.
  • Hunold, Oliver, et al. (författare)
  • Correlative theoretical and experimental investigation of the formation of AIYB(14) and competing phases
  • 2016
  • Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 119:8
  • Tidskriftsartikel (refereegranskat)abstract
    • The phase formation in the boron-rich section of the Al-Y-B system has been explored by a correlative theoretical and experimental research approach. The structure of coatings deposited via high power pulsed magnetron sputtering from a compound target was studied using elastic recoil detection analysis, electron energy loss spectroscopy spectrum imaging, as well as X-ray and electron diffraction data. The formation of AlYB14 together with the (Y,Al)B-6 impurity phase, containing 1.8 at. % less B than AlYB14, was observed at a growth temperature of 800 degrees C and hence 600 degrees C below the bulk synthesis temperature. Based on quantum mechanical calculations, we infer that minute compositional variations within the film may be responsible for the formation of both icosahedrally bonded AlYB14 and cubic (Y,Al)B-6 phases. These findings are relevant for synthesis attempts of all boron rich icosahedrally bonded compounds with the space group: Imma that form ternary phases at similar compositions.
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6.
  • Sahu, Rajib, et al. (författare)
  • Compositional defects in a MoAlB MAB phase thin film grown by high-power pulsed magnetron sputtering
  • 2023
  • Ingår i: Nanoscale. - : Royal Society of Chemistry. - 2040-3364 .- 2040-3372. ; 15:43, s. 17356-17363
  • Tidskriftsartikel (refereegranskat)abstract
    • Various compositional defects such as Mo3Al2B4, Mo4Al3B4, Mo6Al5B6 and Al3Mo, together with MoB MBene, are observed to be coexisting in a MoAlB MAB phase thin film grown at 800 °C by high-power pulsed magnetron sputtering. An overall film composition of Mo0.29Al0.33B0.38 is measured by time-of-flight elastic recoil detection analysis. The concurrent formation of these compositional defects in the MoAlB matrix occurs during the synthesis without using any chemical reagent, and their coexistence with the MAB phase is thermodynamically possible, as elucidated by density functional theory simulations. These defect phases are imaged at the atomic scale by aberration-corrected scanning transmission electron microscopy. A rough estimation of defect populations of 0.073, 0.037, 0.042 and 0.039 nm−1 for Mo3Al2B4, Mo4Al3B4, Mo6Al5B6 and Al3Mo compositional defects, respectively, is performed within the MoAlB matrix. The calculated energies of formation reveal that the Mo4Al3B4 and Mo6Al5B6 defect phases form spontaneously in the MoAlB host matrix, while the energy barrier towards the formation of the metastable Mo3Al2B4 phase is approx. 20 meV per atom. The small magnitude of this barrier is easily overcome during vapor phase condensation, and the surface diffusion of adatoms during deposition leads to local compositional variations and the coexistence of the defect phases in the host matrix. Additionally, at grain boundaries, the presence of MoB MBene is observed, with an interlayer spacing between two Mo2B2 units increasing up to ∼50% compared to the pristine MoAlB phase.
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7.
  • Sahu, Rajib, et al. (författare)
  • Direct MoB MBene domain formation in magnetron sputtered MoAlB thin films
  • 2021
  • Ingår i: Nanoscale. - : Royal Society of Chemistry. - 2040-3364 .- 2040-3372. ; 13:43, s. 18077-18083
  • Tidskriftsartikel (refereegranskat)abstract
    • Two-dimensional (2D) inorganic transition metal boride nanosheets are emerging as promising post-graphene materials in energy research due to their unique properties. State-of-the-art processing strategies are based on chemical etching of bulk material synthesized via solid-state reaction at temperatures above 1000 degrees C. Here, we report the direct formation of MoB MBene domains in a MoAlB thin film by Al deintercalation from MoAlB in the vicinity of AlOx regions. Hence, based on these results a straightforward processing pathway for the direct formation of MoB MBene-AlOx heterostructures without employing chemical etching is proposed here.
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  • Resultat 1-7 av 7

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