SwePub
Sök i SwePub databas

  Utökad sökning

Träfflista för sökning "WFRF:(Alami E) "

Sökning: WFRF:(Alami E)

  • Resultat 1-8 av 8
Sortera/gruppera träfflistan
   
NumreringReferensOmslagsbildHitta
1.
  • Aad, G., et al. (författare)
  • 2013
  • Ingår i: The European Physical Journal C. - : Springer Science and Business Media LLC. - 1434-6052. ; 73:3
  • Tidskriftsartikel (refereegranskat)
  •  
2.
  • Abrahmsen-Alami, S, et al. (författare)
  • Effect of temperature on NMR self-diffusion in aqueous associative polymer solutions
  • 1996
  • Ingår i: Journal of Physical Chemistry. - : American Chemical Society (ACS). - 0022-3654 .- 1541-5740. ; 100:11, s. 4598-4605
  • Tidskriftsartikel (refereegranskat)abstract
    • The temperature dependence of polymer self-diffusion rates in aqueous solutions of C12EO200C12 (AP9, Mw = 9300) and C12EO90C12 (AP4, Mw = 4600) and nonmodified analogues PEO10 and PEO4 (Mw = 10 000 and 3400) has been studied. The effect of the hydrophobic end-groups on the self-diffusion of the associative polymer (AP) was found to be proportional to the polymer content and inversely related to the temperature. The variation of the AP self-diffusion coefficient follows an Arrhenius behavior. The resulting apparent activation energies, Ea, increase with polymer content from 15 to 55 kJ/mol in the range 0.5−50 wt % for AP9, whereas the parent PEO10 shows an almost constant Ea of about 25 kJ/mol in the same concentration range. Activation energies derived from self-diffusion and low shear viscosity measurements were found to be quite similar. The distribution of self-diffusion coefficients often observed in AP systems is discussed in terms of distribution of aggregate sizes at low AP content and homogeneity of the network at higher contents. The residence time of an AP monomer in a hydrophobic domain was estimated as 0.1 ms at 25 °C and decreases with temperature. Also included are turbidity measurements on the AP systems.
  •  
3.
  •  
4.
  •  
5.
  • Aqachmar, Z., et al. (författare)
  • Electrification of Africa through CPV installations in small-scale industrial applications : Energetic, economic, and environmental analysis
  • 2022
  • Ingår i: Renewable energy. - : Elsevier Ltd. - 0960-1481 .- 1879-0682. ; 197, s. 723-746
  • Tidskriftsartikel (refereegranskat)abstract
    • This paper aims to evaluate the energetic, economic, and environmental performances of small-scale concentrated photovoltaics (CPV) power systems under 107 African climatic and financial zones with different energy mixes. The proposed concept focuses on small-scale installations for small- or medium-scale industrial premises as such devices are involved in the international strategy about micro-grids. Yearly average electric productions, capacity factors, economic and environmental considerations, and sensitivity were all analysed. The mathematical methodology for calculating the power of a concentrated triple-junction solar cell, the annual energy conversion of a CPV plant, the costs, and the CO2 mitigation were assessed. The parametric study shows that the capacity factor becomes highest for a cell area of 5.5 cm2 or if the concentration ratio reaches the value of 2400. Furthermore, LCOE is lowest for Errachidia in Morocco with 15.88 c$/kWh followed by Fada in Chad with 16.82 c$/kWh, while it is highest in Wad Hajm in Sudan as 5.23 × 1016 c$/kWh. Moreover, South Africa allows the highest reduction of indirect CO2 emissions. Furthermore, energy produced is greatest in Errachidia in Morocco (606.27 GWh), Tiaret in Tunisia (601.11 GWh), and Upington in South Africa (598.11 GWh). Results are shown on innovative GIS maps of Africa. © 2022 Elsevier Ltd
  •  
6.
  •  
7.
  •  
8.
  • Ni, Wei-Xin, et al. (författare)
  • X-ray reciprocal space mapping studies of strain relaxation in thin SiGe layers (=100 nm) using a low temperature growth step
  • 2001
  • Ingår i: Journal of Crystal Growth. - 0022-0248 .- 1873-5002. ; 227-228, s. 756-760
  • Konferensbidrag (övrigt vetenskapligt/konstnärligt)abstract
    • Relaxation of thin SiGe layers (~90 nm) grown by molecular beam epitaxy using a low temperature growth step (120-200°C) has been investigated using two-dimensional reciprocal space mapping of X-ray diffraction. The samples studied have been divided in two groups, depending on the substrate cooling process during the growth of the low temperature layer. It has been found that a higher degree of relaxation was easily achieved for the sample group without growth interruption. A process window for full relaxation of the Si0.74Ge0.26 layer has been observed in the range of 140-150°C. © 2001 Elsevier Science B.V.
  •  
Skapa referenser, mejla, bekava och länka
  • Resultat 1-8 av 8

Kungliga biblioteket hanterar dina personuppgifter i enlighet med EU:s dataskyddsförordning (2018), GDPR. Läs mer om hur det funkar här.
Så här hanterar KB dina uppgifter vid användning av denna tjänst.

 
pil uppåt Stäng

Kopiera och spara länken för att återkomma till aktuell vy